Abstract: In apparatus for vapor phase growing N or P type semiconductor layers on semiconductor substrates supported by a rotary support disposed in a reaction furnace, and various types of gases are admitted into the furnace through a pipe line network and valves, there is provided a control device for ON-OFF controlling the valves according to a predetermined program. The control device comprises a memory region for storing a process program group including a group of process programs including informations regarding a time for designating a process of vapor phase growth in the reaction furnace, gases utilized, flow quantity thereof and furnace temperature, and a system program that decodes the program group for producing control signals for the valves.

Abstract: The automatic sewing machine comprises a sewing head mounted on a table, cloth clamping plates driven by pulse motors in X and Y axis directions of rectangular coordinates on the table, and a pulse generator for applying driving pulses to the pulse motors.

Abstract: In an automatic sewing machine of the type comprising a memory device storing a predetermined sewing pattern, a movable head including a cloth clamping member for clamping a piece of cloth to be sewed to a movable head, a pulse motor controlled by an electric signal read out from the memory device for moving the movable head at a predetermined speed thereby sewing the piece of cloth according to the sewing pattern, a working tool is mounted on the sewing machine, and a blank of a cloth clamping member is mounted on the movable head at a position to be worked by the working tool. At this time the pulse motor is driven at a speed lower than the predetermined speed, thereby working the blank to have a profile corresponding to the sewing pattern.

Abstract: In apparatus for vapor phase growing N or P type semiconductor layers on semiconductor substrates supported by a rotary support disposed in a reaction furnace, and various types of gases are admitted into the furnace through a pipe line network and valves, there is provided a control device for ON-OFF controlling the valves according to a predetermined program. The control device comprises a memory region for storing a process program group including a group of process programs including information regarding a time for designating a process of vapor phase growth in the reaction furnace, gases utilized, flow quantity thereof and furnace temperature, and a system program that decodes the program group for producing control signals for the valves.