Abstract: A mask includes a base plate having aperture parts, and chips having aperture patterns and positioned in the aperture parts of the base plate. The mask is arranged on a bottom surface of a bed plate with a substrate on which a film is to be formed sandwiched therebetween. Magnets are arranged on the bed plate, and plugs which are attracted to the magnets are arranged in the base plate.

Abstract: A mask for forming a thin film having a first pattern against a film formation substrate, including: a nonmagnetic substrate having an aperture corresponding to the first pattern; and a magnetic film having a second pattern and arranged on the nonmagnetic substrate.

Abstract: A mask, which is used to form predetermined patterns on a substrate, includes a pattern forming member that is provided with openings corresponding to the predetermined patterns; and a pattern holding member that overlaps one surface of the pattern forming member.

Abstract: A film forming device includes a mask member that is made of silicon and has first openings of predetermined patterns; a magnetic member that is made of a magnetic material and has a second opening, and that is aligned with the mask member so that the first openings are arranged in the second opening in plan view of the second opening; and a substrate holding member that generates magnetic force between the magnetic member and itself in order to adhere the mask member and a substrate to each other. The mask member and the substrate are interposed between the magnetic member and the substrate holding member in this order from the magnetic member.

Abstract: To provide a high-precision deposition mask capable of vapor deposition on a large-sized deposition substrate in a vacuum deposition process, a method for readily manufacturing the deposition mask at low cost, an electroluminescent display unit, a method for manufacturing the unit, and an electronic apparatus including the electroluminescent display unit. A deposition mask has a configuration in which one or more mask chips each including a single crystal silicon substrate are joined to a mask support. The one or more mask chips are joined to respective predetermined sections of the mask support, the orientations of the one or more mask chips are arranged in such a manner that the crystal orientation of the single crystal silicon substrate is aligned in a predetermined direction, and the single crystal silicon substrate of each mask chip has openings.

Abstract: A method of forming a mask, in which a film pattern is formed on a substrate by using a mask, includes sequentially arranging the mask, the substrate and a first member having a flat surface contacting with the substrate in this order from a supply source of film forming material; and attracting the mask and the first member by means of a magnetic force.

Abstract: To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of doulbe convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.

Abstract: A precision mask for deposition is provided that includes a first brace having a plurlaity of sections placed in parallel to each other at given intervals. The first brace forms portions that define a plurality of first openings. The precision mask for deposition also includes at least one second brace that is placed on the first brace so as to intersect with the first brace. The second brace forms portions that define a plurality of second openings. The second brace is joined to the first brace at a point where the second brace intersects with the first brace.

Abstract: To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of doulbe convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.

Abstract: A film forming method for forming a thin film pattern on a substrate, comprising a) forming the pattern of a metal base layer on the substrate by vapor-phase deposition with a mask; and b) forming a second metal film on the pattern of the metal base layer by plating the substrate.

Abstract: To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of double convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.

Abstract: A mask includes a first portion having an opening, a second portion disposed in the opening and surrounded by the opening, and a beam connecting the first portion to the second portion.

Abstract: A mask includes a silicon member, and a portion defining an opening penetrating the silicon member; and the corner of the opening is rounded.

Abstract: A mask is provided including a supporting substrate, and a plurality of chips attached to the supporting substrate. Each chip has an opening corresponding to at least a part of a shape of a thin film pattern formed on a given surface. The area occupied by each chip is smaller than an area of the thin film pattern using the plurality of chips.

Abstract: A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.

Abstract: A thin film formation method is provided which can carry out various kinds of patterning deposition correctly and with high precision, and a thin film formation equipment. The thin film formation method arranges a mask between a substrate and a material source and forms the material of the material source as a thin film on the substrate. The method further includes: a substrate contacting process to contact the mask and the substrate; a gap measurement process to measure a gap between the mask and the substrate; and a thin film formation process to form the thin film according to the measurement result in the gap measurement process.

Abstract: A mask is provided including a plurality of through-holes penetrating a silicon substrate with (100) orientation. The walls defining the through-holes include a vertical part and an inclined part. The vertical part extends in a vertical direction relative to a principal plane of the substrate, and the inclined part extends in a predetermined oblique angle from the vertical part.

Abstract: A method of manufacturing an organic electro luminescence panel in which a part or all of an electro luminescence layer formed of a plurality of layers is formed by vapor-deposition using a vapor-deposition mask is provided. The method comprises disposing the vapor-deposition mask on a given position on a vapor-deposited substrate (a glass substrate), and dynamically pressing the vapor-deposited substrate so as to make the vapor-deposition mask closely contact the vapor-deposited substrate.

Abstract: A mask includes a substrate which includes a front side and a back side and is provided with through-holes; and a film which adjusts a shape of the substrate provided above at least one of the front side and the back side of the substrate. A method of manufacturing a mask includes the steps of: providing a substrate having a front side and a back side; forming a film which adjusts a shape of the substrate above at least one of the front side and the back side of the substrate; and drilling through-holes in the substrate.

Abstract: A mask is provided for forming a desired high-precision layer pattern on a glass substrate or the like used as a layer-formation object material. The mask includes a first substrate having a first aperture and a second substrate having a plurality of second apertures serving as mask apertures, wherein the second apertures are placed inboard of the first aperture and the second substrate is partially bonded to the first substrate.