Abstract: An antireflection film includes an uneven structure layer that has an uneven structure and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 8.5 ?m?1 or greater and has a film thickness of 200-250 nm, and the intermediate layer comprises a plurality of layers including at least a first layer, a second layer, a third layer, and a fourth layer.

Abstract: An optical thin film formed by laminating, from the substrate side, an interlayer, a silver-containing metal layer that contains silver, and a dielectric layer, in which an anchor metal diffusion control layer provided between the interlayer and the silver-containing metal layer, an anchor region which includes an oxide of the anchor metal and has a surface energy that is less than the surface energy of the silver-containing metal layer and larger than the surface energy of the anchor metal diffusion control layer is provided between the anchor metal diffusion control layer and the silver-containing metal layer, a cap region which includes an oxide of the anchor metal is provided between the silver-containing metal layer and the dielectric layer, and the total film thickness of the silver-containing metal layer, the anchor region, and the cap region is 6 nm or less.

Abstract: This method for producing a transparent optical film includes a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer formed of a high standard electrode potential metal having a higher standard electrode potential than that of silver by vacuum deposition, and an alloying step of forming a silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower.

Abstract: An antireflection film includes an uneven structure layer that has an uneven structure in which a distance between protrusions is shorter than a wavelength of light of which reflection is to be suppressed and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 6.5 ?m?1 or greater and a film thickness of 250 nm or more, and the intermediate layer is constituted of a plurality of layers including at least a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, and an eighth layer in this order from the uneven structure layer side to the substrate side.

Abstract: In a measurement support device according to an aspect, in a case where an indicator figure (marker) is displayed in the vicinity of a spot position, since the indicator figure is displayed in different aspects between a case where measurement of a specific region by the displayed indicator figure is effective and a case where measurement of a specific region by the displayed indicator figure is not effective, it is possible to easily grasp effectiveness of measurement by the display aspect of the indicator figure, and thus effective measurement can be easily performed. In addition, in the above-described aspect, since the indicator figure having a size set according to the position of the spot is displayed, distance measurement is not necessary, the configuration is simple, and the processing load is low.

Abstract: In a measurement support device according to an aspect, since information indicating a movement trajectory of a spot when an imaging distance is changed is displayed, it is easy to move the spot to be in the vicinity of a measurement target by changing the imaging distance by operating a head and an imaging unit forward or backward, and the measurement can be swiftly and easily performed. In addition, since an indicator figure (circular marker) having a size set according to the position of the spot is displayed, distance measurement is not necessary, the configuration is simple, and the processing load is low. Further, since the indicator figure and the information indicating the trajectory are displayed in the vicinity of the spot, the difference between the spot position and the position of the indicator figure is small and thus the indicator figure is accurate as an indicator, and since the indicator figure is not displayed in a wide range, the processing load is low.

Abstract: A first light-shied-coating formation step that forms a light shield coating only in a part of an area of a transparent-substrate in which a light shield coating is to be formed, a step that deposits an optical thin film including, as its outermost layer, a layer to be hydrothermally treated, which will become a fine uneven pattern coating by being hydrothermally treated, in an area in which an antireflection coating is to be formed, a second light-shield-coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light-shield-coating formation step, and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated are performed in this order.

Abstract: The invention aims at providing a measurement support device, an endoscope system, and a processor for an endoscope system capable of displaying an accurate indicator with a simple configuration. In a measurement support device related to one aspect of the invention, the coordinates of a spot, and coordinates of points indicating an actual size of a measurement target in a subject and indicating a circular marker distorted in accordance with distortion aberration of an imaging optical system are stored in association with each other in a storage unit, the coordinates of the points indicating the circular marker are acquired with reference to the storage unit on the basis of the measured coordinates of the spot, and the circular marker is displayed on the basis of the acquired coordinates. Thus, the distance measurement is unnecessary, the configuration is simple, and the processing load is low.

Abstract: Provided are a measurement support device, an endoscope system, a processor for an endoscope system, and a measurement support method capable of easily and highly accurately measuring the size of a subject. In the measurement support device related to one aspect of the invention, the position of a spot by measurement auxiliary light is measured, and information indicating the actual size of a subject is acquired on the basis of the measurement result to create and display a marker. This, there is no need for distance measurement and the measurement is easy. Additionally, by appropriately setting the inclination angle of the measurement auxiliary light, even in a case where an observation distance is short, the measurement auxiliary light can be prevented from deviating from the visual field of the imaging optical system, and the range of the observation distance can be extended.

Abstract: An object of the invention is to provide an endoscope system capable of easily measuring the size of a subject. In an endoscope system related to one aspect of the invention, since an index figure indicating an actual size of a specific region of a test object is displayed together with an image of the subject, a user can measure the specific region easily by comparing the specific region with a marker. Since the size of the index figure is set in accordance with a spot position, there is no need for distance measurement, a device configuration is simple, and measurement can be quickly and easily performed. In addition, a specific value of the “actual size” can be set in accordance with conditions, such as the type of test object and the purposes of measurement. Additionally, an affected region can be the specific region in a case where the test object is a living body.

Abstract: Provided is an antireflection film that is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, in this order, on a substrate, in which the interlayer is a multilayer film having two or more layers, in which a layer of high refractive index having a relatively high refractive index and a layer of low refractive index having a relatively low refractive index are alternately laminated, and the dielectric layer has a surface to be exposed to air and is a multilayer film having two or more layers including an oxide layer and a fluorocarbon layer which is a self-assembled film that is formed by a silane coupling reaction to the oxide layer in this order.

Abstract: The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.

Abstract: A dielectric multilayer film is formed on one surface of a lens main body, a film including aluminum is formed on the other surface of the lens main body, the film including aluminum is immersed in hot water without immersing the dielectric multilayer film in the hot water, thereby changing the film including aluminum to a fine uneven structure film including an alumina hydrate as a main component, whereby a lens provided with antireflection functions on both surfaces is manufactured.

Abstract: Provided is a method of manufacturing a structure having a transparent fine uneven structural body formed by hot water treatment, in which a finer uneven structure is formed. Provided is a method of manufacturing a structure, the method being for manufacturing a structure including a substrate, and a transparent fine uneven structural body which is formed on a surface of the substrate by hot water treatment, including: a first step of forming a precursor film of the transparent fine uneven structural body on the substrate; a second step of forming a fine uneven structure on a surface of the precursor film; and a third step of subjecting, to hot water treatment, the precursor film on which the fine uneven structure is formed to form the transparent fine uneven structural body in which a peak value ?0 of space frequency of the unevenness of the fine uneven structure formed in the second step satisfies ? <?0 (Expression I).

Abstract: This antireflection film includes a dielectric layer having a surface exposed to air and having a refractive index of 1.35 or more and 1.51 or less, a metal layer having an interface with the dielectric layer, containing silver, and having a thickness of 5 nm or less, and an interlayer having an interface with the metal layer and constituted by a laminate formed by alternately laminating total four layers or more of a layer of high refractive index having a relatively high refractive index and a layer of low refractive index having a relatively low refractive index and is laminated on a substrate having a refractive index of 1.61 or more in the order of the interlayer, the metal layer, and the dielectric layer.

Abstract: Provided is a method of manufacturing a structure having a transparent fine uneven structural body formed by hot water treatment, in which a finer uneven structure is formed. Provided is a method of manufacturing a structure, the method being for manufacturing a structure including a substrate, and a transparent fine uneven structural body which is formed on a surface of the substrate by hot water treatment, including: a first step of forming a precursor film of the transparent fine uneven structural body on the substrate; a second step of forming a fine uneven structure on a surface of the precursor film; and a third step of subjecting, to hot water treatment, the precursor film on which the fine uneven structure is formed to form the transparent fine uneven structural body in which a peak value v0 of space frequency of the unevenness of the fine uneven structure formed in the second step satisfies v <v0 (Expression I).

Abstract: The endoscope includes an imaging device that is provided in a tip portion of an insertion part capable of being inserted into a body cavity. The imaging device includes an image sensor that photoelectrically converts imaging light incident on an image receiving surface thereof through an imaging lens provided in a lens barrel, and a circuit substrate including a connecting surface facing a terminal face that is a surface opposite to the image receiving surface of the image sensor. A plurality of terminals are uniformly arranged longitudinally and laterally in a two-dimensional matrix form on the terminal face of the image sensor, and the connecting surface of the circuit substrate and the terminal face of the image sensor are connected to each other through the plurality of terminals. The total area of the plurality of terminals on the terminal face occupies 10% or more of the area of an imaging area of the image receiving surface.

Abstract: An antireflection film includes an uneven structure layer that has an uneven structure in which a distance between protrusions is shorter than a wavelength of light of which reflection is to be suppressed and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 6.5 ?m?1 or greater and a film thickness of 250 nm or more, and the intermediate layer is constituted of a plurality of layers including at least a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, and an eighth layer in this order from the uneven structure layer side to the substrate side.

Abstract: An antireflection film includes an uneven structure layer that has an uneven structure and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 8.5 or greater and has a film thickness of 200-250 nm, and the intermediate layer comprises a plurality of layers including at least a first layer, a second layer, a third layer, and a fourth layer.

Abstract: An infrared ray cutoff filter including two or more high refractive index layers with a refractive index ranging from 1.65 to 2.00 and two or more low refractive index layers with a refractive index ranging from 1.20 to 1.45. At least one layer of the two or more high refractive index layers and the two or more low refractive index layers contains a dye having a maximum absorption wavelength in a range of 600 nm to 820 nm, and the two or more low refractive index layers are a plurality of kinds of layers which have different film thickness within a range of 50 nm to 250 nm.