Abstract: A plasma processing apparatus includes a chamber, substrate support, radio-frequency (RF) power supply, bias power supply, measuring device, and controller. The RF power supply provides RF power to a lower electrode included in the substrate support in the chamber or to an upper electrode. The bias power supply provides RF bias power to the lower electrode. The measuring device measures a frequency of a reflected wave of the RF power returned toward the RF power supply. The controller controls the bias power supply to adjust a power level of the RF bias power to a peak value of absolute values of negative shifts in frequency of the reflected wave from a frequency of the RF power, or controls the RF power supply to modulate the RF power in a cycle obtained based on an occurrence time of the peak of absolute values.

Abstract: A method of controlling a display system includes a first generation step of projecting a test pattern in a reference state in which a projection condition of a first projector is adjusted so that a color of a first projection image when viewed from the front becomes a desired color, and taking the first projection image corresponding to the test pattern by a first camera to generate a first reference image, a second generation step of projecting the test pattern and then taking the projection image corresponding to the test pattern by the first camera to generate a first comparative image, a third generation step of generating first correction data for correcting the projection condition so that the first comparative image coincides with the first reference image, and a correction step of correcting the projection condition based on the first correction data.

Abstract: A projector includes a projection section, a spectral imaging section, and a control section, wherein the control section makes the projection section project an adjusting image corresponding to a color and a gray level of an image to be projected by the projection section while changing the color and the gray level to a first color and a first gray level, the first color and a second gray level, a second color and a third gray level, and the second color and a fourth gray level, sets a measurement condition corresponding to the color to the spectral imaging section, and makes the spectral imaging section take the adjusting images projected by the projection section to obtain spectral imaging data.

Abstract: A plasma processing method includes performing a first plasma processing in a processing chamber in a first period, and performing a second plasma processing in the chamber in a second period which is after the first period or following the first period. The first plasma processing and the second plasma processing are performed in a state where a substrate is disposed on a substrate support stage provided in the processing chamber. A sequence including the first plasma processing and the second plasma processing is performed a plurality of times.

Abstract: In a plasma processing according to an exemplary embodiment, a pulsed negative direct-current voltage is periodically applied to the lower electrode. A frequency defining a cycle at which the pulsed negative direct-current voltage is periodically applied to the lower electrode is lower than a frequency of radio frequency power which is supplied to generate plasma. The radio frequency power is supplied in a first partial period in the cycle. A power level of the radio frequency power in a second partial period in the cycle is set to a power level reduced from a power level of the radio frequency power in the first partial period.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: A measuring device includes a substrate disposed on a substrate support of a plasma processing apparatus, a transmission circuit, a transmitting antenna, a receiving antenna, a reception demodulation circuit, and a calculator which are provided in the substrate. The transmission circuit generates a microwave. The transmitting antenna transmits the microwave generated by the transmission circuit as a transmission wave. The receiving antenna receives a reflected wave of the transmission wave by plasma above the substrate support as at least one reception wave. The reception demodulation circuit generates a signal that reflects a thickness of a sheath between the substrate and the plasma, from the reception wave. The calculator obtains the thickness of the sheath from the signal generated by the reception demodulation circuit.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: A control method of a spectroscopic imaging device including an imaging element and a spectral element, the control method includes causing the spectroscopic imaging device to generate a first measurement spectrum consisting of N1 wavelengths by imaging a target object by making output wavelengths of a spectral element different when the spectroscopic imaging device is in a high accuracy mode and causing the spectroscopic imaging device to generate a second measurement spectrum consisting of N2 wavelengths by imaging the target object by making the output wavelengths of the spectral element different when the spectroscopic imaging device is in a high speed mode, in which N1 is an integer greater than or equal to two, and N2 is an integer less than N1.

Abstract: A method of controlling a display system includes a first generation step of projecting a test pattern in a reference state in which a projection condition of a first projector is adjusted so that a color of a first projection image when viewed from the front becomes a desired color, and taking the first projection image corresponding to the test pattern by a first camera to generate a first reference image, a second generation step of projecting the test pattern and then taking the projection image corresponding to the test pattern by the first camera to generate a first comparative image, a third generation step of generating first correction data for correcting the projection condition so that the first comparative image coincides with the first reference image, and a correction step of correcting the projection condition based on the first correction data.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A projector controlling method includes projecting image light on a screen on which at least three markers are placed in one direction along a curved projector surface to form a projection image and adjusting the projection position based on a captured image of the projection image and the markers which is captured by a camera in such a way that positions on the outer edge of a projection area of the projection image substantially coincide with the positions of the markers.

Abstract: A plasma measuring apparatus includes: a chamber; a stage provided inside the chamber; a plasma generation source configured to generate plasma in the chamber; an inorganic electroluminescence (EL) substrate placed on the stage and configured to emit light when an electric field is applied; a transmission window provided in the chamber and configured to transmit light; a spectroscope disposed outside the chamber and configured to measure a light emission of the inorganic EL substrate through the transmission window; and a controller configured to measure an ion energy from a result of the measurement by the spectroscope.

Abstract: A plasma measuring apparatus includes a chamber; a stage provided in the chamber; a plasma generation source configured to generate plasma in the chamber; a transmission window provided in the chamber and configured to transmit light; a phosphor arranged in the chamber and configured to emit light according to energy of incident electrons; a spectroscope arranged outside the chamber and configured to measure light emission from the phosphor through the transmission window; and a controller configured to measure an ion energy from measurement results by the spectroscope.

Abstract: A radio frequency power source according to an exemplary embodiment includes a power generator configured to generate radio frequency power. The radio frequency power includes a plurality of power components. The plurality of power components respectively have a plurality of frequencies set symmetrically with respect to a fundamental frequency at an interval of a predetermined frequency. The envelope of the radio frequency power has peaks that periodically appear at a time interval defined by the predetermined frequency or a frequency that is a multiple of twice or more the predetermined frequency. The power level of the radio frequency power is set to be zero in a period excluding a period between a zero-cross region of the envelope immediately before a point in time of appearance of each of the peaks and a zero-cross region of the envelope immediately after the point in time of the appearance.

Abstract: A projector includes a projector main body including an optical unit for generating an image light beam, and a projection optical device attached to a mounting part of the projector main body, and projecting the image light beam generated by the optical unit on a screen, a chassis of the projection optical device includes a camera attachment part to which a camera is attached, and an imaging range of the camera attached to the camera attachment part includes at least a part of a projection image projected by the projection optical device.

Abstract: A projector includes a first control section and a projector main body to which a camera is detachably mountable. The first control section is configured to be capable of communicating with the camera when the camera is detached from the projector main body. When the camera is mounted on the projector main body, the first control section executes first processing. When the camera is detached from the projector main body, the first control section enables communication connection to the camera and executes second processing different from the first processing.

Abstract: A disclosed plasma processing method includes generating plasma in a chamber of a plasma processing apparatus by supplying radio frequency power from a radio frequency power source in a first period. The plasma processing method further includes stopping supply of the radio frequency power from the radio frequency power source in a second period following the first period. The plasma processing method further includes applying a negative direct-current voltage from a bias power source to a substrate support in a third period following the second period. In the third period, the radio frequency power is not supplied. In the third period, the negative direct-current voltage is set to generate ions in a chamber by secondary electrons that are emitted by causing ions in the chamber to collide with a substrate.

Abstract: In a plasma processing apparatus according to an embodiment, a first radio-frequency power supply is connected to a lower electrode of a substrate support provided within a chamber via a first matcher. The first radio-frequency power supply supplies first radio-frequency power for bias to the lower electrode. The second radio-frequency power supply is connected to a load via a second matcher. The second radio-frequency power supply supplies second radio-frequency power for plasma generation. A controller of the second matcher sets an impedance of a matching circuit of the second matcher such that a reflection from the load of the second radio-frequency power supply is reduced in a designated partial period within each cycle of the first radio-frequency power.