Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered on a predetermined center frequency; a plasma generating unit configured to generate plasma by using the carrier wave group; a spectrum detecting unit configured to detect a progressive wave spectrum and a reflection wave spectrum of the carrier wave group; and a control unit configured to calculate, by using the progressive wave spectrum and the reflection wave spectrum, an absorption power which is a power of the carrier wave group absorbed into the plasma, and configured to adjust a parameter, which varies a minimum value of the reflection wave spectrum and a frequency corresponding to the minimum value, such that the absorption power becomes equal to or larger than a threshold value.

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.

Abstract: Detection accuracy of a distance between a tip of a pointing element and a screen is to be improved. An interactive projector includes a projection unit, a plurality of cameras, and a position detection unit that detects a three-dimensional position of the pointing element with respect to the projected screen based on a plurality of images including the pointing element of which the image is captured by the plurality of cameras. When a direction separated from the projected screen is defined as a Z direction, the second camera is arranged at a position nearer the projected screen than that of the first camera in the Z direction.

Abstract: A projector includes an imaging unit which images a screen SC, and a position detection unit which detects an indication position of an indicator based on a captured image of the imaging unit. The position detection unit detects reflected light of detection light reflected by the indicator from the captured image of the imaging unit and obtains the indication position of the indicator based on the position of the reflected light detected from the captured image and the distance between the screen SC and the imaging unit.

Abstract: A system consisting of a plurality of terminals storing image data and an image displaying device which are connected with each other through a network capable of two-way communication has the disadvantage of decreasing in throughput on account of slow image data transfer over the network. The image displaying device performs two-way communications with each of the terminals by a communication means at the display device side. Also, the image displaying device acquires image data from a relevant terminal while instructing other terminals to suspend transmission by the image data acquisition controlling means, thereby suspending transmission of image data. The image displaying device displays images by the image displaying means based on the thus acquired image data.

Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.

Abstract: In a substrate processing method, electrons having a first energy are supplied from an electron beam generator into an inner space of a chamber body of a substrate processing apparatus to generate negative ions by attaching the electrons to molecules in a processing gas supplied to the inner space. Then a positive bias voltage is applied to an electrode of a supporting table that supports a substrate mounted on thereon in the inner space to attract the negative ions to the substrate.

Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.

Abstract: A projection system includes a light emitting apparatus that emits detection light to a detection area for detecting indication positions of indicators, and a projector that detects the indication positions of the indicators in the detection area. The projector includes an imaging portion that captures an image of the detection area, and a position detection portion that detects at least one of an image of light generated by the indicator and an image of the detection light reflected on the indicator from data of a captured image of the imaging portion, and discriminates and detects the indication positions of the indicator and the indicator based on light emission timings of the indicator and the light emitting apparatus.

Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered on a predetermined center frequency; a plasma generating unit configured to generate plasma by using the carrier wave group; a spectrum detecting unit configured to detect a progressive wave spectrum and a reflection wave spectrum of the carrier wave group; and a control unit configured to calculate, by using the progressive wave spectrum and the reflection wave spectrum, an absorption power which is a power of the carrier wave group absorbed into the plasma, and configured to adjust a parameter, which varies a minimum value of the reflection wave spectrum and a frequency corresponding to the minimum value, such that the absorption power becomes equal to or larger than a threshold value.

Abstract: A position detection portion of a projector detects an operation on a screen based on a captured image obtained by capturing the screen. A control portion executes a calibration in which positions in a projection image and positions in the captured image are associated with each other based on the captured image obtained by capturing the projection image projected by a calibration control portion based on auto calibration images in which marks for specifying positions are arranged. In addition, the calibration control portion executes the calibration based on the captured image corresponding to the plurality of auto calibration images which are different in arrangement states of the marks.

Abstract: An interactive projector is provided with a projection section adapted to project an image on a screen surface, a detection section, and a correction section. The detection section detects presence or absence of contact of the pointing element with the screen surface based in a relationship between a difference between a Z-coordinate value of the pointing element and a Z-coordinate value of the screen surface, and a difference threshold value set in advance. The correction section corrects at least one of the Z-coordinate value of the screen surface, the Z-coordinate value of the pointing element, and the difference threshold value based on a history of the Z-coordinate value of the pointing element.

Abstract: A plasma processing apparatus includes an electrode to which a high frequency for plasma generation is applied and which serves as a mounting table for a target object. The plasma processing apparatus further includes a high frequency generation unit, a distortion component extraction unit and a waveform correction unit. The high frequency generation unit generates the high frequency by using waveform data including a set frequency component having a predetermined frequency. The distortion component extraction unit extracts a distortion component given to the high frequency in a path for transmitting the high frequency generated by the high frequency generation unit to the electrode. The waveform correction unit corrects the waveform data by combining an antiphase component obtained by inverting a phase of the distortion component and the set frequency component of the waveform data used for generation of the high frequency.

Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.

Abstract: Detection accuracy of a distance between a tip of a pointing element and a screen is to be improved. An interactive projector includes a projection unit, a plurality of cameras, and a position detection unit that detects a three-dimensional position of the pointing element with respect to the projected screen based on a plurality of images including the pointing element of which the image is captured by the plurality of cameras. When a direction separated from the projected screen is defined as a Z direction, the second camera is arranged at a position nearer the projected screen than that of the first camera in the Z direction.

Abstract: A plasma processing apparatus includes a processing chamber, a carrier wave group generation unit and a plasma generation unit. The carrier wave group generation unit is configured to generate a carrier wave group including a plurality of carrier waves having different frequencies in a frequency domain. The carrier wave group is represented by an amplitude waveform in which a first peak and a second peak of which absolute value is smaller than an absolute value of the first peak alternately appear in a time domain. The plasma generation unit is configured to generate a plasma in the processing chamber by using the carrier wave group.

Abstract: A plasma processing apparatus includes an electrode to which a high frequency for plasma generation is applied and which serves as a mounting table for a target object. The plasma processing apparatus further includes a high frequency generation unit, a distortion component extraction unit and a waveform correction unit. The high frequency generation unit generates the high frequency by using waveform data including a set frequency component having a predetermined frequency. The distortion component extraction unit extracts a distortion component given to the high frequency in a path for transmitting the high frequency generated by the high frequency generation unit to the electrode. The waveform correction unit corrects the waveform data by combining an antiphase component obtained by inverting a phase of the distortion component and the set frequency component of the waveform data used for generation of the high frequency.

Abstract: A plasma processing apparatus includes a microwave generation unit configured to generate a microwave, a processing vessel configured to introduce the microwave thereinto, and a gas supply mechanism configured to supply a gas into the processing vessel, plasma being generated within the processing vessel so that a plasma processing is performed on a processing target object. The microwave generation unit includes an oscillation circuit configured to oscillate the microwave, a pulse generation circuit configured to oscillate a control wave having a predetermined frequency bandwidth at a predetermined cycle, and a frequency modulation circuit configured to modulate a frequency of the microwave to a modulated wave having the predetermined frequency bandwidth by the control wave and output the modulated wave, and the frequency modulation circuit alternately and repeatedly outputs the modulated wave and a non-modulated microwave at the predetermined cycle.

Abstract: A plasma processing apparatus includes a processing chamber, a carrier wave group generation unit and a plasma generation unit. The carrier wave group generation unit is configured to generate a carrier wave group including a plurality of carrier waves having different frequencies in a frequency domain. The carrier wave group is represented by an amplitude waveform in which a first peak and a second peak of which absolute value is smaller than an absolute value of the first peak alternately appear in a time domain. The plasma generation unit is configured to generate a plasma in the processing chamber by using the carrier wave group.

Abstract: A projection display apparatus includes an image projecting unit projecting an image, an operation unit as an operation device whose output value changes depending on the amount of operation, a correction amount setting unit changing a keystone correction amount in accordance with an output value of the operation unit, and a keystone correcting unit performing keystone correction on an image to be projected in accordance with the keystone correction amount. A zero reference position in which the keystone correction amount is zero is set in an operation range of the operation unit. The correction amount setting unit sets a dead zone in the operation range such that the dead zone includes the zero reference position and an area surrounding this position, and sets the keystone correction amount to zero in accordance with the output value corresponding to the inside of the dead zone.