Abstract: In one embodiment, after a new filter unit is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract: In one embodiment, after a new filter unit is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract: In one embodiment, after a new filter unit (3) is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part (31) of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract: A bottle change apparatus includes a change mechanism that changes a bottle, and the bottle includes a bottle cap. The bottle cap includes: a treatment solution straw part that forms a treatment solution flow passage for supplying a treatment solution in the bottle to an outside of the bottle and extends to an inside of the bottle; and a treatment solution connecting part that is provided at an end portion outside the bottle of the treatment solution straw part. The change mechanism includes: a connection mechanism part including a treatment solution pipe which is connected to the treatment solution connecting part of the bottle and through which the treatment solution supplied from the bottle flows; and a bottle mounting part that transfers the bottle to a connection position where the treatment solution connecting part and the treatment solution pipe are connected together.

Abstract: In one embodiment, after a new filter unit (3) is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part (31) of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract: A method of setting an exposure apparatus to expose exposure sectors defined on a resist film formed on a surface of a substrate with proper values of an exposure amount and a focus value for forming a pattern having a predetermined dimension includes exposing and developing an exposure sector defined on a reference substrate by a first exposure apparatus having a first state, and imaging the same. The method exposes and develops exposure sectors defined on an inspection substrate by a second exposure apparatus having a second state where at least one of the exposure amount and the focus value is unknown, and forms and images a pattern on the inspection substrate. The method determines the proper values for the exposure amount and the focus value for the second state based on luminance of the exposure sector of reference data and luminances of the exposure sectors of inspection data.

Abstract: A bottle change apparatus includes a change mechanism that changes a bottle, and the bottle includes a bottle cap. The bottle cap includes: a treatment solution straw part that forms a treatment solution flow passage for supplying a treatment solution in the bottle to an outside of the bottle and extends to an inside of the bottle; and a treatment solution connecting part that is provided at an end portion outside the bottle of the treatment solution straw part. The change mechanism includes: a connection mechanism part including a treatment solution pipe which is connected to the treatment solution connecting part of the bottle and through which the treatment solution supplied from the bottle flows; and a bottle mounting part that transfers the bottle to a connection position where the treatment solution connecting part and the treatment solution pipe are connected together.

Abstract: An image processing method of picking up an image of a substrate and converting pixel values of the picked-up substrate image makes the pixel values of the picked-up substrate image into a histogram, and creates a tone curve T composed of a periodic function of a predetermined amplitude and a predetermined period based on a distribution of the pixel values in the histogram. The pixel values of the picked-up substrate image are converted using the tone curve T to obtain a substrate image with a high contrast.

Abstract: An image processing method of picking up an image of a substrate and converting pixel values of the picked-up substrate image makes the pixel values of the picked-up substrate image into a histogram, and creates a tone curve T composed of a periodic function of a predetermined amplitude and a predetermined period based on a distribution of the pixel values in the histogram. The pixel values of the picked-up substrate image are converted using the tone curve T to obtain a substrate image with a high contrast.

Abstract: At least one of a start abnormality detector (31), a temperature abnormality detector (32) and a voltage abnormality detector (33) has a latch inhibiting circuit for inhibiting retention of a detecting state when one of the abnormality detectors detects an abnormality, so that a current abnormality detector (34) can be inhibited from detecting an abnormal input current caused when the oscillation is halted by the abnormality detector. Accordingly, after the abnormality is removed, automatic resetting can be easily accomplished without causing the oscillation to halt as a result of the current abnormality detector detecting the presence of the abnormality. Also, since a power source abnormality detecting circuit (30) is designed in the form of an analog circuit, a low cost can be achieved and the monitoring level can be modified. In addition, the monitoring level associated only with the temperature abnormality occurring in an IGBT element (7) can be modified.

Abstract: An oscillation control signal generated by an inverter power source control circuit (12) includes a reference voltage setting signal for approximating the current waveform of the AC output form the AC power source (1) to a sinusoidal wave by making both sides of the waveform generate current according to the fluctuation of the PWM control signal, and a waveform shaping signal consisting of a peak adjustment signal of a sinusoidal waveform for approximating the waveform peak portion of the current waveform to a sinusoidal wave by subtraction. Accordingly, even if the PWM control signal fluctuates, it is possible to automatically improve the power factor of the power source circuit to a value higher than a predetermined value by approximating the current waveform of the AC output from the AC power source to the sinusoidal wave, thereby improving the efficiency of the power source.

Abstract: At least one of a start abnormality detector (31), a temperature abnormality detector (32) and a voltage abnormality detector (33) has a latch inhibiting circuit for inhibiting retention of a detecting state when one of the abnormality detectors detects an abnormality, so that a current abnormality detector (34) can be inhibited from detecting an abnormal input current caused when the oscillation is halted by the abnormality detector. Accordingly, after the abnormality is removed, automatic resetting can be easily accomplished without causing the oscillation to halt as a result of the current abnormality detector detecting the presence of the abnormality. Also, since a power source abnormality detecting circuit (30) is designed in the form of an analog circuit, a low cost can be achieved and the monitoring level can be modified. In addition, the monitoring level associated only with the temperature abnormality occurring in an IGBT element (7) can be modified.

Abstract: An oscillation control signal generated by an inverter power source control circuit (12) includes a reference voltage setting signal for approximating the current waveform of the AC output form the AC power source (1) to a sinusoidal wave by making both sides of the waveform generate current according to the fluctuation of the PWM control signal, and a waveform shaping signal consisting of a peak adjustment signal of a sinusoidal waveform for approximating the waveform peak portion of the current waveform to a sinusoidal wave by subtraction. Accordingly, even if the PWM control signal fluctuates, it is possible to automatically improve the power factor of the power source circuit to a value higher than a predetermined value by approximating the current waveform of the AC output from the AC power source to the sinusoidal wave, thereby improving the efficiency of the power source.