Patents by Inventor Shohei Kataoka

Shohei Kataoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10923769
    Abstract: Provided is an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a compound represented by any of General Formulae (I) to (III) and a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used. In the formulae, M represents a transition metal. R1, R2, and R3 represent a specific substituent. a represents an integer of 0 to 5. b represents an integer of 0 or more. c represents an integer of 0 to 5. Ar1 represents an aromatic ring. In General Formula (II), a plurality of Ar1's may be linked together. Ar2 represents a nitrogen-containing aromatic hetero ring.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: February 16, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Naoya Hatakeyama
  • Patent number: 10717706
    Abstract: An m-phenylenediamine compound is represented by the following General Formula (I), (II), or (III). R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. R2, R3, and R4 each represent an alkyl group. R5 and R6 each represent an alkyl group. X represents a chlorine atom or a bromine atom. A method for producing a polymer compound includes obtaining a polymer compound by using the m-phenylenediamine compound represented by General Formula (I) as a raw material.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: July 21, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Koji Hironaka, Shohei Kataoka, Masato Senoo, Tetsu Kitamura, Sotaro Inomata, Satoshi Sano, Masatoshi Yumoto
  • Patent number: 10649329
    Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a basic compound (A) corresponding to at least one of the following basic compound (A1) or (A2): (A1) a nonionic compound having an alicyclic structure (a1) and a basic site (b2) at a site different from the alicyclic structure within one molecule, or (A2) a nonionic compound having a heterocyclic structure (a2) having no basicity and a basic site (b2) at a site different from the heterocyclic structure within one molecule.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: May 12, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Akinori Shibuya, Keiyu Ou
  • Patent number: 10584367
    Abstract: A cell-spreading device may include a microchamber chip having a microchamber capable of enclosing and retaining a cell, a channel-forming frame united with the microchamber chip to form a channel on the microchamber, an inlet provided in the channel-forming frame to allow a cell suspension to flow into the channel, and an outlet provided in the channel-forming frame to allow the cell suspension, which has been allowed to flow into the channel through the inlet, to flow out from the channel. When an aperture of the microchamber is projected perpendicularly to a longitudinal width of the microchamber chip, the void ratio that is a ratio of the sum total of voids to the longitudinal width is not more than 5%, the void being a length of a portion where the projected aperture of the microchamber is not present against the longitudinal width.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: March 10, 2020
    Assignee: KONICA MINOLTA, INC.
    Inventors: Jungo Araki, Kumiko Hoshi, Shohei Yamamura, Shouki Yatsushiro, Masatoshi Kataoka
  • Publication number: 20190280335
    Abstract: Provided are an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a metal complex represented by General Formula (I), a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used, and a metal complex. In General Formula (I), M represents a transition metal. k represents an integer of 0 or more, m represents an integer of 0 to 4, and n represents an integer of 1 or more. Here, k+n represents a valence of M. R1 represents an alkyl group, an aryl group, an alkoxy group, a carbonyl group-containing group, a sulfonyl group-containing group, or a halogen atom. R2 and R3 represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, a carbonyl group-containing group, a sulfonyl group-containing group, or a halogen atom. L represents a monodentate ligand.
    Type: Application
    Filed: May 29, 2019
    Publication date: September 12, 2019
    Applicant: FUJIFILM Corporation
    Inventor: Shohei KATAOKA
  • Publication number: 20190177270
    Abstract: An m-phenylenediamine compound is represented by the following General Formula (I), (II), or (III). R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. R2, R3, and R4 each represent an alkyl group. R5 and R6 each represent an alkyl group. X represents a chlorine atom or a bromine atom. A method for producing a polymer compound includes obtaining a polymer compound by using the m-phenylenediamine compound represented by General Formula (I) as a raw material.
    Type: Application
    Filed: February 13, 2019
    Publication date: June 13, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Koji HIRONAKA, Shohei KATAOKA, Masato SENOO, Tetsu KITAMURA, Sotaro INOMATA, Satoshi SANO, Masatoshi YUMOTO
  • Publication number: 20190157720
    Abstract: Provided is an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a compound represented by any of General Formulae (I) to (III) and a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used. In the formulae, M represents a transition metal. R1, R2, and R3 represent a specific substituent. a represents an integer of 0 to 5. b represents an integer of 0 or more. c represents an integer of 0 to 5. Ar1 represents an aromatic ring. In General Formula (II), a plurality of Ar1's may be linked together. Ar2 represents a nitrogen-containing aromatic hetero ring.
    Type: Application
    Filed: January 18, 2019
    Publication date: May 23, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Shohei KATAOKA, Naoya HATAKEYAMA
  • Patent number: 10248019
    Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: April 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Kana Fujii, Sou Kamimura, Yuichiro Enomoto, Keita Kato, Shuhei Yamaguchi
  • Patent number: 10126653
    Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: November 13, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato, Yuichiro Enomoto, Kazuyoshi Mizutani, Toru Tsuchihashi, Kana Fujii
  • Patent number: 9709892
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa??1.5 when exposed to actinic rays or radiation.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: July 18, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii, Kazuyoshi Mizutani, Shinji Tarutani, Keita Kato
  • Publication number: 20170102618
    Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.
    Type: Application
    Filed: December 21, 2016
    Publication date: April 13, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
  • Publication number: 20170097565
    Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a basic compound (A) corresponding to at least one of the following basic compound (A1) or (A2): (A1) a nonionic compound having an alicyclic structure (a1) and a basic site (b2) at a site different from the alicyclic structure within one molecule, or (A2) a nonionic compound having a heterocyclic structure (a2) having no basicity and a basic site (b2) at a site different from the heterocyclic structure within one molecule.
    Type: Application
    Filed: December 20, 2016
    Publication date: April 6, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Shohei KATAOKA, Akinori SHIBUYA, Keiyu OU
  • Patent number: 9551935
    Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ?SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: January 24, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto, Kana Fujii, Kaoru Iwato, Shohei Kataoka, Kazuyoshi Mizutani
  • Patent number: 9523912
    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: December 20, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Akinori Shibuya, Toshiaki Fukuhara, Hajime Furutani, Michihiro Shirakawa
  • Patent number: 9482947
    Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: November 1, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Hidenori Takahashi, Michihiro Shirakawa, Shohei Kataoka, Shoichi Saitoh, Fumihiro Yoshino
  • Patent number: 9454079
    Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.
    Type: Grant
    Filed: May 7, 2014
    Date of Patent: September 27, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Akinori Shibuya, Yoko Tokugawa, Tomoki Matsuda, Junichi Ito, Shohei Kataoka, Toshiaki Fukuhara, Naohiro Tango, Kaoru Iwato, Masahiro Yoshidome, Shinichi Sugiyama
  • Patent number: 9405197
    Abstract: There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 2, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Akinori Shibuya, Shohei Kataoka, Tomoki Matsuda, Toshiaki Fukuhara, Akiyoshi Goto
  • Patent number: 9316910
    Abstract: Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: April 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Hidenori Takahashi, Shuhei Yamaguchi, Shoichi Saitoh, Michihiro Shirakawa, Fumihiro Yoshino
  • Publication number: 20160070174
    Abstract: Disclosed is a pattern forming method including forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; exposing the active light sensitive or radiation sensitive film; and forming a negative type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer which includes an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) which has an acidic group and a lactone structure and of which, due to a polarity thereof being increased by an action of an acid, a solubility decreases with respect to a developer which includes an organic solvent.
    Type: Application
    Filed: November 11, 2015
    Publication date: March 10, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Shuhei YAMAGUCHI, Kei YAMAMOTO, Shohei KATAOKA
  • Publication number: 20160070167
    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.
    Type: Application
    Filed: August 31, 2015
    Publication date: March 10, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Shohei KATAOKA, Akinori SHIBUYA, Toshiaki FUKUHARA, Hajime FURUTANI, Michihiro SHIRAKAWA