Patents by Inventor Shoji Sakaguchi
Shoji Sakaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9589926Abstract: A method of manufacturing a semiconductor device that includes: preparing a pair of substrates that respectively include a device structure on one primary surface or another primary surface thereof; stacking the substrates so that said one primary surfaces face each other, exposing said another surfaces to the outside, and fixing entire peripheral outer edges of the substrates that have been stacked to each other; and thereafter, plating said exposed another primary surfaces of the stacked and fixed substrates.Type: GrantFiled: November 3, 2015Date of Patent: March 7, 2017Assignee: FUJI ELECTRIC CO., LTD.Inventor: Shoji Sakaguchi
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Patent number: 9466584Abstract: A method for manufacturing a semiconductor device includes a first step of forming a first electrode on one main surface side of a semiconductor wafer; a second step of bonding a first film to another main surface side of the semiconductor wafer; a third step of bonding a second film to an outer peripheral portion of the semiconductor wafer by applying pressure to the second film on the semiconductor wafer using a plurality of cylindrical rollers, after the second step; and a fourth step of forming a plating layer on the first electrode on the one main surface side of the semiconductor wafer by a plating process, after the third step.Type: GrantFiled: January 7, 2016Date of Patent: October 11, 2016Assignee: FUJI ELECTRIC CO., LTD.Inventor: Shoji Sakaguchi
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Publication number: 20160240504Abstract: A method for manufacturing a semiconductor device includes a first step of forming a first electrode on one main surface side of a semiconductor wafer; a second step of bonding a first film to another main surface side of the semiconductor wafer; a third step of bonding a second film to an outer peripheral portion of the semiconductor wafer by applying pressure to the second film on the semiconductor wafer using a plurality of cylindrical rollers, after the second step; and a fourth step of forming a plating layer on the first electrode on the one main surface side of the semiconductor wafer by a plating process, after the third step.Type: ApplicationFiled: January 7, 2016Publication date: August 18, 2016Inventor: Shoji SAKAGUCHI
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Publication number: 20160181224Abstract: A method of manufacturing a semiconductor device that includes: preparing a pair of substrates that respectively include a device structure on one primary surface or another primary surface thereof; stacking the substrates so that said one primary surfaces face each other, exposing said another surfaces to the outside, and fixing entire peripheral outer edges of the substrates that have been stacked to each other; and thereafter, plating said exposed another primary surfaces of the stacked and fixed substrates.Type: ApplicationFiled: November 3, 2015Publication date: June 23, 2016Applicant: FUJI ELECTRIC CO., LTD.Inventor: Shoji SAKAGUCHI
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Patent number: 8932110Abstract: A method of manufacturing a perpendicular magnetic recording medium substrate is capable of reducing the waviness of all wavelength components and a recording medium is capable of reducing contact with a magnetic head to improve the flying stability of the magnetic head. The method includes two polishing operations. The first operation includes polishing a substrate having a Ni—P-based alloy underlayer with a first porous material that includes 0.1 wt % to 25 wt % of alumina, titania, silica, and zirconia abrasive while supplying a first slurry liquid including an organic or inorganic acid and a first abrasive to the underlayer of the substrate. The second operation includes polishing a surface of the underlayer polished in the first polishing with a second porous material while supplying a second slurry liquid including an organic or inorganic acid and a second abrasive with a grain diameter smaller than that of the first abrasive.Type: GrantFiled: March 11, 2011Date of Patent: January 13, 2015Assignee: Fuji Electric Co., Ltd.Inventors: Shoji Sakaguchi, Masaoki Miyakoshi, Jun Natsume
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Patent number: 8906795Abstract: A semiconductor device manufacturing method allows stably forming a plating layer at low cost on one main surface side of a substrate, while preventing unintended plating layer deposition on the other main surface side. Emitter and collector electrodes are respectively formed on the front and back surfaces of a semiconductor substrate. A first film is attached to the back surface. A notch portion of the substrate is filled with a resin member. A second film is attached to an outer peripheral portion of the substrate, straddling the substrate from the front surface to the back surface. The first and second films push out air remaining between the first and second films and the substrate. An electroless plating process is carried out while the first and second films are attached to the substrate, thereby sequentially forming a nickel plating layer and a gold plating layer on the front surface side.Type: GrantFiled: October 10, 2013Date of Patent: December 9, 2014Assignee: Fuji Electric Co., Ltd.Inventors: Shoji Sakaguchi, Idayu Sofya
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Publication number: 20140120716Abstract: A semiconductor device manufacturing method allows stably forming a plating layer at low cost on one main surface side of a substrate, while preventing unintended plating layer deposition on the other main surface side. Emitter and collector electrodes are respectively formed on the front and back surfaces of a semiconductor substrate. A first film is attached to the back surface. A notch portion of the substrate is filled with a resin member. A second film is attached to an outer peripheral portion of the substrate, straddling the substrate from the front surface to the back surface. The first and second films push out air remaining between the first and second films and the substrate. An electroless plating process is carried out while the first and second films are attached to the substrate, thereby sequentially forming a nickel plating layer and a gold plating layer on the front surface side.Type: ApplicationFiled: October 10, 2013Publication date: May 1, 2014Applicant: FUJI ELECTRIC CO., LTD.Inventors: Shoji SAKAGUCHI, Idayu Sofya
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Patent number: 8167685Abstract: A method of manufacturing a perpendicular magnetic recording medium and a substrate for the medium are disclosed, in which abnormal protrusions on an underlayer made of a Ni—P alloy are automatically eliminated while maintaining a flat surface with high accuracy on the underlayer, and appropriate texture traces remain to promote magnetization alignment in the vertical direction in a perpendicular magnetic recording medium without adversely affecting the magnetization alignment. In the method, texture processing is carried out on an underlayer made of a Ni—P alloy on a nonmagnetic base plate using a polishing tape while supplying mixed slurry of a surfactant and abrasive grains of polycrystalline diamond, and then, texture polishing is carried out on the underlayer processed by the texture processing, using a polishing tape while supplying slurry containing an abrasive material and an organic acid until the surface of the underlayer is polished to an arithmetic mean roughness Ra of at most 0.Type: GrantFiled: October 26, 2007Date of Patent: May 1, 2012Assignee: Fuji Electric Co., Ltd.Inventors: Shoji Sakaguchi, Hiroyuki Nakamura, Hideki Matsuo
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Publication number: 20120009441Abstract: A method of manufacturing a perpendicular magnetic recording medium substrate is capable of reducing the waviness of all wavelength components and a recording medium is capable of reducing contact with a magnetic head to improve the flying stability of the magnetic head. The method includes two polishing operations. The first operation includes polishing a substrate having a Ni—P-based alloy underlayer with a first porous material that includes 0.1 wt % to 25 wt % of alumina, titania, silica, and zirconia abrasive while supplying a first slurry liquid including an organic or inorganic acid and a first abrasive to the underlayer of the substrate. The second operation includes polishing a surface of the underlayer polished in the first polishing with a second porous material while supplying a second slurry liquid including an organic or inorganic acid and a second abrasive with a grain diameter smaller than that of the first abrasive.Type: ApplicationFiled: March 11, 2011Publication date: January 12, 2012Applicant: Fuji Electric Device Technology Co., Ltd.Inventors: Shoji SAKAGUCHI, Masaoki Miyakoshi, Jun Natsume
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Patent number: 7780504Abstract: A method for manufacturing a magnetic recording medium disk substrate is provided for achieving a magnetic disk having a suitable surface roughness, a high in-plane magnetic anisotropy and a high S/N. The manufacturing method has a texturing process wherein the magnetic recording medium disk substrate is rotated in the circumferential direction while a polishing tape is pressed against the rotating substrate. The polishing tape includes polyester fiber having a fiber diameter of 400 nm to 950 nm, on the surface coming into contact with the substrate. All the while, slurry including abrasive grains including a cluster diamond is supplied to the surfaces of the substrate. The present invention relates to a magnetic recording medium disk substrate produced by the manufacturing method; and a magnetic recording medium at least comprising a magnetic layer on the magnetic recording medium disk substrate and manufacturing method of the magnetic recording medium.Type: GrantFiled: December 21, 2007Date of Patent: August 24, 2010Assignees: Fuji Electric Device Technology Co., Ltd., Teijin Fibers LimitedInventors: Shoji Sakaguchi, Hiroyuki Nakamura, Hideki Matsuo
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Publication number: 20090029041Abstract: The invention provides a method of cleaning a magnetic recording medium substrate that removes residual substances and suppresses oxidation of the substrate surface. The method of cleaning the magnetic recording medium substrate uses nano-bubble water. Also disclosed is a method of manufacturing a magnetic recording medium that includes the method of cleaning the magnetic recording medium substrate and steps of sequentially forming at least a magnetic layer, a protective layer, and a liquid lubricant layer on the cleaned substrate.Type: ApplicationFiled: July 10, 2008Publication date: January 29, 2009Applicant: Fuji Electric Device Technology Co., Ltd.Inventors: Jun Natsume, Shoji Sakaguchi, Takashi Shimada
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Publication number: 20080188165Abstract: A method for manufacturing a magnetic recording medium disk substrate is provided for achieving a magnetic disk having a suitable surface roughness, a high in-plane magnetic anisotropy and a high S/N. The manufacturing method has a texturing process wherein the magnetic recording medium disk substrate is rotated in the circumferential direction while a polishing tape is pressed against the rotating substrate. The polishing tape includes polyester fiber having a fiber diameter of 400 nm to 950 nm, on the surface coming into contact with the substrate. All the while, slurry including abrasive grains including a cluster diamond is supplied to the surfaces of the substrate. The present invention relates to a magnetic recording medium disk substrate produced by the manufacturing method; and a magnetic recording medium at least comprising a magnetic layer on the magnetic recording medium disk substrate and manufacturing method of the magnetic recording medium.Type: ApplicationFiled: December 21, 2007Publication date: August 7, 2008Applicants: Fuji Electric Device Technology Co., Ltd., Teijin Fibers LimitedInventors: Shoji Sakaguchi, Hiroyuki Nakamura, Hideki Matsuo
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Publication number: 20080131737Abstract: A method of manufacturing a perpendicular magnetic recording medium and a substrate for the medium are disclosed, in which abnormal protrusions on an underlayer made of a Ni—P alloy are automatically eliminated while maintaining a flat surface with high accuracy on the underlayer, and appropriate texture traces remain to promote magnetization alignment in the vertical direction in a perpendicular magnetic recording medium without adversely affecting the magnetization alignment. In the method, texture processing is carried out on an underlayer made of a Ni—P alloy on a nonmagnetic base plate using a polishing tape while supplying mixed slurry of a surfactant and abrasive grains of polycrystalline diamond, and then, texture polishing is carried out on the underlayer processed by the texture processing, using a polishing tape while supplying slurry containing an abrasive material and an organic acid until the surface of the underlayer is polished to an arithmetic mean roughness Ra of at most 0.Type: ApplicationFiled: October 26, 2007Publication date: June 5, 2008Applicant: Fuji Electric Device Technology Co., Ltd.Inventors: Shoji Sakaguchi, Hiroyuki Nakamura, Hideki Matsuo
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Publication number: 20080096052Abstract: A perpendicular magnetic recording media substrate, suitable for magnetic recording media using the perpendicular magnetic recording method, is disclosed. Texturing is used to polish the substrate. A polishing tape is pressed against a substrate, while a polishing slurry comprising abrasive particles is supplied onto the substrate for perpendicular magnetic recording media while it is rotated, to perform texturing of the substrate. The average fiber diameter of polishing fibers contained in the polishing tape is 400 nm or less, and the average particle diameter of abrasive particles contained in the polishing slurry is 150 nm or less.Type: ApplicationFiled: October 23, 2007Publication date: April 24, 2008Applicant: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.Inventors: Hideki MATSUO, Shoji SAKAGUCHI, Hiroyuki NAKAMURA
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Patent number: 6770310Abstract: The present invention provides a composition having protein, transglutaminase and a transglutaminase suppressing compound such as an ammonium salt, which is useful in the preparation of pickle solutions and in methods of making processed meat products with the pickle solution.Type: GrantFiled: September 15, 2000Date of Patent: August 3, 2004Assignee: Ajinomoto Co., Inc.Inventors: Yasuyuki Susa, Hiroyuki Nakagoshi, Shoji Sakaguchi
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Publication number: 20040131728Abstract: In this application is disclosed an improved enzyme preparation for binding solid food materials which comprises, as the active ingredient, a transglutaminase, and (1) a collagen in which the total of the residues of the hydroxyproline and proline in the collagen is less than 20% of the total of the amino acid residues in the collagen or/and (2) a collagen having an average particle diameter of smaller than 600 &mgr;m, which preparation is excellent in operability and provides high binding strength.Type: ApplicationFiled: February 20, 2004Publication date: July 8, 2004Inventors: Tomoko Ootsuka, Rikiya lshida, Yoshiyuki Kumazawa, Tomoko Kaneko, Hiroyuki Nakagoshi, Shoji Sakaguchi
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Patent number: 6749873Abstract: Herein is disclosed a cheese yield enhancing method in a cheese manufacturing method including a process of separating a cheese curd from a whey after a milk coagulating treatment of a material milk by a milk coagulating enzyme, said cheese yield enhancing method comprising steps of: adding/mixing a protein decomposing enzyme treated material of a milk whey protein (a partial hydrolysate of the milk whey protein) to the material milk; and subjecting a resulting mixture to the milk coagulating treatment by the milk coagulating enzyme, or said cheese yield enhancing method comprising steps of: adding/mixing a partial hydrolysate of a milk whey protein to the material milk; allowing transglutaminase to act on a resulting mixture; and subjecting the mixture to the milk coagulating treatment by the milk coagulating enzyme, whereby a yield of a cheese curd from a material milk, and therefore a yield of cheese may be enhanced and a cheese superior in quality may be manufactured.Type: GrantFiled: August 8, 2001Date of Patent: June 15, 2004Assignee: Ajinomoto Co., Inc.Inventors: Yoshiyuki Kumazawa, Jiro Sakamoto, Chiya Kuraishi, Noriki Nio, Shoji Sakaguchi
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Patent number: 6716461Abstract: Herein is disclosed a method for modifying raw material milk, wherein a reducing agent such as a thiol compound is added when transglutaminase is caused to act upon raw material milk for a dairy product, whereby the reactivity of the transglutaminase to the raw material milk such as raw cow milk, can be improved and the milk protein can, in turn, be modified effectively. From the thus-modified raw material milk can be produced dairy products such as yogurt, cheese and powdered milk improved in physical properties, mouthfeel or texture.Type: GrantFiled: October 5, 2001Date of Patent: April 6, 2004Assignee: Ajinomoto Co., Inc.Inventors: Noriko Miwa, Yoshiyuki Kumazawa, Hiroyuki Nakagoshi, Shoji Sakaguchi
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Patent number: 6432458Abstract: A process for producing noodles, which includes using (1) a transglutaminase and (2) a carbonate and/or a reducing agent, and optionally, a protein partial hydrolyzate, in addition to starting materials such as cereal flour as the main starting material, whereby noodles of which the texture is improved by imparting a good balance between firmness and glutinousness to ordinary noodles of which functions such as convenience, restorability, shelf stability and the like are required, are provided.Type: GrantFiled: April 5, 1999Date of Patent: August 13, 2002Assignee: Ajinomoto Co., IncInventors: Katsutoshi Yamazaki, Shoji Sakaguchi, Takahiko Soeda
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Publication number: 20020061358Abstract: Herein is disclosed a method for modifying raw material milk, wherein a reducing agent such as a thiol compound is added when transglutaminase is caused to act upon raw material milk for a dairy product, whereby the reactivity of the transglutaminase to the raw material milk such as raw cow milk, can be improved and the milk protein can, in turn, be modified effectively. From the thus-modified raw material milk can be produced dairy products such as yogurt, cheese and powdered milk improved in physical properties, mouthfeel or texture.Type: ApplicationFiled: October 5, 2001Publication date: May 23, 2002Applicant: AJINOMOTO CO., INC.Inventors: Noriko Miwa, Yoshiyuki Kumazawa, Hiroyuki Nakagoshi, Shoji Sakaguchi