Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a gate electrode, and a stack of dielectric layers. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer. The compound semiconductor layer is disposed on the barrier layer. The gate electrode is disposed on the compound semiconductor layer. The stack of dielectric layers is disposed on the gate electrode. The stack of dielectric layers includes layers having different etching rates.

Abstract: A package component and forming method thereof are provided. The package component includes a substrate and a conductive layer. The substrate includes a first surface. The conductive layer is disposed over the first surface. The conductive layer includes a first conductive feature and a second conductive feature. The second conductive feature covers a portion of the first conductive feature. A resistance of the second conductive feature is lower than a resistance of the first conductive feature.

Abstract: A composition includes at least one pH adjuster, at least one chelating agent, at least one anionic surfactant, at least one nitrogen containing heterocycle, at least one alkylamine compound, and an aqueous solvent, wherein the composition has a pH of from about 7 to about 14.

Abstract: A transistor for emitting laser with a fixed frequency includes a first region, a second region, at least one quantum well, and a third region. The at least one quantum well is installed in the second region, and the second region is coupled between the first region and the third region. When one of the first region, the second region, and the third region receives two signals, or two of the first region, the second region, and the third region receive the two signals respectively, the at least one quantum well emits the laser with the fixed frequency.

Abstract: A polishing composition includes an abrasive; an optional pH adjuster; a barrier film removal rate enhancer; a TEOS removal rate inhibitor; a cobalt removal rate enhancer; an azole-containing corrosion inhibitor; and a cobalt corrosion inhibitor.

Abstract: A material life predicting method is to perform X-ray diffraction on a target to obtain a composition state curve diagram of the target, and then compare the composition state curve diagram of the target according to a built-in data in a database to obtain a composition of the target and content of the composition, and then the content of the identical composition of the target and the control is compared to obtain the change in the content of the identical composition between the target and the control, and then quantify a consumption degree of the material life of the target, where the control is a new furnace tube and the target is a used furnace tube.

Abstract: A method of forming a semiconductor structure includes following operations. A substrate including a silicon (Si) layer is received. An amorphous germanium (Ge) layer is formed on the Si layer. A barrier layer is formed over the amorphous Ge layer. The substrate is annealed to transform the Si layer and the Ge layer to form a single crystalline SiGe layer. A Ge concentration is in a positive correlation with a ratio of a thickness of the Ge layer and a thickness of the Si layer.

Abstract: A treatment method of wastewater containing high-concentration boron includes steps as follows: pouring wastewater containing high-concentration boron into a PH value adjusting tank; pouring an alkaline solution into the PH value adjusting tank; pouring the wastewater containing boron into a boron-removing electrocoagulation tank, and an electric conducting electrolyte being provided for performing an electrocoagulation procedure; discharging sludge generated by the electrocoagulation procedure into a boron-contained sludge dewatering tank; outputting the wastewater containing boron into a first absorbing tank provided with a first absorbing material to perform an absorbing and filtering procedure; outputting the wastewater containing boron into a second absorbing tank provided with a second absorbing material to perform another absorbing and filtering procedure; and outputting the wastewater containing boron into a filtering tank to perform another filtering procedure for outputting the wastewater containing

Abstract: A polishing composition includes at least one abrasive, at least one organic acid, at least one anionic surfactant comprising at least a phosphate, at least one phosphonic acid compound having a molecular weight below 500 g/mol, at least one azole containing compound, at least one alkylamine compound having a 6-24 carbon alkyl chain, and an aqueous solvent, and optionally, a pH adjuster.

Abstract: A transistor for emitting laser with a fixed frequency includes a first region, a second region, at least one quantum well, and a third region. The at least one quantum well is installed in the second region, and the second region is coupled between the first region and the third region. When one of the first region, the second region, and the third region receives two signals, or two of the first region, the second region, and the third region receive the two signals respectively, the at least one quantum well emits the laser with the fixed frequency.

Abstract: This disclosure features a polishing composition that includes at least one abrasive; at least one first corrosion inhibitor that includes a phosphate or a phosphonate group; at least one complexing agent; at least one second corrosion inhibitor that is at least one azole compound; and optionally a pH adjuster.

Abstract: A polishing composition includes an abrasive; an optional pH adjuster; a barrier film removal rate enhancer; a TEOS removal rate inhibitor; a cobalt removal rate enhancer; an azole-containing corrosion inhibitor; and a cobalt corrosion inhibitor.

Abstract: The present invention provides a ?-agarase, a composition containing the same and applications thereof. The present ?-agarase provides the field a novel alternative and is favorable for the industrial utilities of the hydrolysis products of agarose. Furthermore, the present agarase is particularly modified for heterologous production by prokaryotic expression systems, and thereby is favorable for commercial use.

Abstract: A slurry that polishes surfaces or substrates which includes cobalt. The slurry further comprises an anionic and/or cationic surfactant, each of which has a phosphate group, a long chain alkyl group, or both. The slurry also includes a corrosion inhibitor, abrasives, removal rate enhancers, solvents, pH adjustors, and chelating agents. The pH of the slurry is preferably 8 or higher.

Abstract: The present invention discloses a wireless package with a resilient connector for connecting a substrate to an antenna. The antenna is disposed directly on a top surface of a molding compound of the wireless package. The resilient connector has a lower terminal bonded to the substrate, a horizontal contact portion, and an oblique support portion integrally extending between the horizontal contact portion and the lower terminal. The horizontal contact portion has a flat top surface that is coplanar with the top surface of the molding compound and is in direct contact with the antenna such that the contact resistance distribution is concentrated and the production yield of the wireless package is improved.

Abstract: An exercise apparatus includes a resistance system which has a first rotating shaft, a second rotating shaft and a transmission mechanism mounted between the two rotating shafts, such that the two rotating shafts are rotated with respect to each other at a predetermined transmission ratio. Besides, a first resistance device is controlled to apply a first resistance against rotation of the first rotating shaft, and a second resistance device is controlled to apply a second resistance against rotation of the second rotating shaft. The first resistance device and the second resistance device can be controlled independently. When a user uses the exercise apparatus to perform exercise, a moving member is driven by movement of the user. When the moving member is moved, the two rotating shafts are driven to rotate simultaneously, namely the user has to overcome the rotational resistance of the two rotating shaft during exercise.

Abstract: The driving system for driving a display panel includes a timing controller and a source driving circuit. The source driving circuit includes a plurality of output channels and a plurality of shift registers respectively corresponding to the output channels. The plurality of shift registers are classified into a plurality of shift register series, among which a first shift register series includes a first shift register being as one end and a second shift register being as the other end, and a second shift register series includes a third shift register being as one end and a fourth shift register being as the other end. The timing controller is connected to the first shift register, the second shift register, the third shift register, and the fourth shift register, and transmits a first start pulse to the first shift register and a second start pulse to the third shift register.

Abstract: An exercise apparatus includes a motion mechanism and a handle assembly. The motion mechanism is provided for a user to perform exercise. The handle assembly has at least one grip portion for being held by the user during exercising. Specifically, the grip portion has a temperature variable area thereon. The temperature of the temperature variable area could be controlled to rise to a suitable temperature that the hand of the user can feel warm, for example, a temperature between 38 and 50 degrees Celsius. The temperature of the temperature variable area could also be controlled to reduce to a suitable temperature that the hand of the user can feel cool, for example, a temperature between 20 and 36 degrees Celsius. The temperature of the temperature variable area could be directly controlled by the user or automatically changed according to the exercise status of the user.

Abstract: A slurry that polishes surfaces or substrates which includes cobalt. The slurry further comprises an anionic and/or cationic surfactant, each of which has a phosphate group, a long chain alkyl group, or both. The slurry also includes a corrosion inhibitor, abrasives, removal rate enhancers, solvents, pH adjustors, and chelating agents. The pH of the slurry is preferably 8 or higher.