Abstract: A display substrate, a manufacturing method thereof, and a display device. The manufacturing method of a display substrate includes: providing a substrate; and forming, on the substrate, a first thin film transistor including a first active layer and a second thin film transistor including a second active layer. The second active layer includes a central area and doped regions located at two sides of the central area, respectively. Forming a first thin film transistor including a first active layer and a second thin film transistor including a second active layer on the substrate includes forming the first active layer and the doped regions of the second active layer using a single mask.

Abstract: A display substrate, a manufacturing method thereof, and a display device. The manufacturing method of a display substrate includes: providing a substrate; and forming, on the substrate, a first thin film transistor including a first active layer and a second thin film transistor including a second active layer. The second active layer includes a central area and doped regions located at two sides of the central area, respectively. Forming a first thin film transistor including a first active layer and a second thin film transistor including a second active layer on the substrate includes forming the first active layer and the doped regions of the second active layer using a single mask.

Abstract: The disclosure discloses a thin film transistor, a method for fabricating the same, and a display device so as to avoid a source and a drain from being oxidized while the thin film transistor is being fabricated, to thereby improve the performance of the thin film transistor. The method for fabricating a thin film transistor includes: forming an active layer pattern on a base substrate, and a source-drain metal layer located above the active layer pattern and with a same pattern as the active layer pattern, using one patterning process; forming a first insulation layer above the source-drain metal layer; and patterning the source-drain metal layer and the first insulation layer using one patterning process so that portion of the active layer pattern corresponding to a channel area is exposed to form a source pattern and a drain pattern.

Abstract: A semi-transparent semi-retroreflective film and an air display device are provided. The air display device includes: a first polarizer and a second polarizer assembled with each other to form a cell; a semi-transparent semi-reflective structure and a semi-transparent semi-retroreflective film disposed between the first polarizer and the second polarizer; a first ¼ wave plate disposed at a side of the air display device adjacent to the first polarizer; and a second ¼ wave plate disposed between the semi-transparent semi-reflective structure and the semi-transparent semi-retroreflective film. The air display device is configured such that polarized light incident from the first polarizer, after being processed by an internal optical path of the air display device, exits from the second polarizer to form an air image at a side of the air display device away from the first polarizer.

Abstract: A touch panel, a manufacturing method thereof and a display device are provided. The touch panel includes a first touch electrode, a second touch electrode and a one-piece insulating element. The second touch electrode includes an electrode section disposed in a same layer as the first touch electrode and a connecting section under the electrode section. The electrode section includes a first electrode section and a second electrode section, which are electrically connected by the connecting section, and the connecting section is spaced apart from the first touch electrode. The insulating element includes a first insulating section between the connecting section and the first touch electrode and a second insulating section between the first electrode section and the first touch electrode and also between the second electrode section and the first touch electrode. The insulating sections can be obtained by performing a patterning process, so that the manufacturing method of the touch panel is simplified.

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

Abstract: Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

Abstract: The present disclosure provides an array substrate, its manufacturing method, and a display device. The method includes steps of forming a passivation layer on a base substrate, and forming a contact layer and a pixel electrode on the base substrate with the passivation layer through a single patterning process. The contact layer is made of an identical transparent conductive material to the pixel electrode.

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

Abstract: The disclosure discloses a thin film transistor, a method for fabricating the same, and a display device so as to avoid a source and a drain from being oxidized while the thin film transistor is being fabricated, to thereby improve the performance of the thin film transistor. The method for fabricating a thin film transistor includes: forming an active layer pattern on a base substrate, and a source-drain metal layer located above the active layer pattern and with a same pattern as the active layer pattern, using one patterning process; forming a first insulation layer above the source-drain metal layer; and patterning the source-drain metal layer and the first insulation layer using one patterning process so that portion of the active layer pattern corresponding to a channel area is exposed to form a source pattern and a drain pattern.

Abstract: A method for manufacturing an array substrate, comprising forming a pattern of a gate electrode by one pattering process; forming a gate insulating layer on a substrate provided with the pattern of the gate electrode; forming first and second patterns thereon, in which the first pattern corresponds to a pattern of a semiconductor active layer and the second pattern corresponds to a source electrode and a drain electrode; forming a pattern layer including an opening area on the substrate provided with the second pattern, in which the opening area corresponds to a gap between the source electrode and the drain electrode, the minimum width thereof being greater than the width of the gap between the source electrode and the drain electrode, and at least forming a pattern of the source electrode and the drain electrode and a pixel electrode electrically connected with the drain electrode through the opening area.

Abstract: The present invention has disclosed a touch screen, comprising: a substrate; at least one first electrode formed on the substrate; at least one second electrode formed on the substrate, the first electrode and the second electrode having different extending directions, and there being an intersecting area between a vertical projection of the first electrode on the substrate and a vertical projection of the second electrode on the substrate; and a first protection layer formed at least at the intersecting area between the first electrode and the second electrode; wherein, the substrate is provided with a groove at the intersecting area between the first electrode and the second electrode so as to at least receive therein a portion of the first electrode located within the intersecting area. The present invention has also disclosed a display device and a method for manufacturing the touch screen.

Abstract: The present invention provides an array substrate and a manufacturing method thereof and a display device. The manufacturing method comprises: forming a pattern including a pixel electrode and a source of a thin film transistor on a base substrate through a single patterning process, the pixel electrode is provided in a layer under a layer in which the source is located; forming a pattern including a drain, an active layer, a gate insulation layer and a gate of the thin film transistor through a single patterning process, the active layer covers the source and the drain, and is separated from the gate through the gate insulation layer; and forming a pattern including a passivation layer, a common electrode and a gate line through a single patterning process, the common electrode is a slit electrode and separated from the active layer and the pixel electrode through the passivation layer.

Abstract: The present disclosure provides an array substrate, its manufacturing method, and a display device. The method includes steps of forming a passivation layer on a base substrate, and forming a contact layer and a pixel electrode on the base substrate with the passivation layer through a single patterning process. The contact layer is made of an identical transparent conductive material to the pixel electrode.

Abstract: Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

Abstract: A preparation method of a poly-silicon thin film transistor (TFT) array substrate and an array substrate thereof are provided. The preparation method includes: forming a photoresist layer on a poly-silicon layer, and exposing and developing the photoresist layer with a gray tone mask to form patterns of a photoresist completely-reserved region, a photoresist partially-reserved regions and a photoresist completely-removed region; removing part of the poly-silicon layer located in the photoresist completely-removed region, to form patterns of active layers; ashing the photoresist so as to expose part of the active layer located in the photoresist partially-reserved regions and inject P+ ions of high concentration into the part of the active layer, to form doping regions of patterns of source-drain electrodes of a P-type TFT; and stripping off remaining photoresist.

Abstract: A touch organic light emitting diode (OLED) display device, including: a thin film transistor formed on one side of a substrate, a touch signal feedback layer formed on the thin film transistor, a luminous substrate provided on the touch signal feedback layer, and a touch signal receiving layer formed on the other side of the substrate. An anode layer of the luminous substrate is connected to a drain electrode of the thin film transistor. As to the touch-sensitive OLED display device, a touch screen and an OLED display portion are prepared integratedly, so that the weight and thickness of the display itself are greatly reduced, and the production cost is saved. A manufacturing method of the touch-sensitive OLED display device is further disclosed.

Abstract: A preparation method of a poly-silicon thin film transistor (TFT) array substrate and an array substrate thereof are provided. The preparation method includes: forming a photoresist layer on a poly-silicon layer, and exposing and developing the photoresist layer with a gray tone mask to form patterns of a photoresist completely-reserved region, a photoresist partially-reserved regions and a photoresist completely-removed region; removing part of the poly-silicon layer located in the photoresist completely-removed region, to form patterns of active layers; ashing the photoresist so as to expose part of the active layer located in the photoresist partially-reserved regions and inject P+ions of high concentration into the part of the active layer, to form doping regions of patterns of source-drain electrodes of a P-type TFT; and stripping off remaining photoresist.

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode (8), including a first portion (b) in a non-display region and a second portion (a) in a display region; a first electrode (6) formed on the first portion (b) of the pixel electrode (8); a passivation layer (9) formed on the pixel electrode (8) and the first electrode (6), the passivation layer (9) includes a via hole (11) located over the first electrode (6); an active layer (4) and a second electrode (7) that are formed on the passivation layer (9), the active layer (4) being connected to the first electrode (6) through the via hole (11) of the passivation layer (9). With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, materials of the electrodes are less subjected to corrosion, and quality of the array substrate is enhanced.

Abstract: The present invention has disclosed a touch screen, comprising: a substrate; at least one first electrode formed on the substrate; at least one second electrode formed on the substrate, the first electrode and the second electrode having different extending directions, and there being an intersecting area between a vertical projection of the first electrode on the substrate and a vertical projection of the second electrode on the substrate; and a first protection layer formed at least at the intersecting area between the first electrode and the second electrode; wherein, the substrate is provided with a groove at the intersecting area between the first electrode and the second electrode so as to at least receive therein a portion of the first electrode located within the intersecting area. The present invention has also disclosed a display device and a method for manufacturing the touch screen.