Patents by Inventor Shuhei Yamaguchi

Shuhei Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160280675
    Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei YAMAGUCHI, Koutarou TAKAHASHI, Tomotaka TSUCHIMURA, Natsumi YOKOKAWA, Hidehiro MOCHIZUKI
  • Publication number: 20160280621
    Abstract: The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Hidehiro MOCHIZUKI, Koutarou TAKAHASHI, Shuhei YAMAGUCHI
  • Publication number: 20160282720
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Koutarou TAKAHASHI, Tomotaka TSUCHIMURA, Shuhei YAMAGUCHI, Natsumi YOKOKAWA, Hidehiro MOCHIZUKI
  • Patent number: 9423689
    Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: August 23, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Hidenori Takahashi, Michihiro Shirakawa, Fumihiro Yoshino
  • Patent number: 9417083
    Abstract: It is an object to provide a technique capable of searching for a route as close to a route intended by a user as possible. A route creation device includes an input unit that accepts a line drawn on a map displayed based on map data, and a link retrieval unit that retrieves corresponding road links that correspond to the line accepted by the input unit from the map data. The route creation device further includes a route searching unit that searches for a route including at least one road link satisfying a predetermined condition among the road links retrieved by the link retrieval unit.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: August 16, 2016
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Shuhei Yamaguchi
  • Publication number: 20160209747
    Abstract: There is provided an active light sensitive or radiation sensitive composition which contains (A) a compound that generates an acid by irradiation with active light or radiation, (P) a compound of which the solubility in alkali developers is increased due to the action of an acid, and (N) at least one specific compound, and which can satisfy high resolving power, an excellent pattern shape, and low line width roughness (LWR) at the same time to a high level in formation of a very fine pattern (for example, a line width of 50 nm or less), and a resist film, a pattern forming method, a resist-coated mask blank, a method for producing a photomask, a photomask, a method for manufacturing an electronic device, and an electronic device, each of which uses this active light sensitive or radiation sensitive composition.
    Type: Application
    Filed: March 25, 2016
    Publication date: July 21, 2016
    Applicant: FUJIFILM Corporation
    Inventor: Shuhei YAMAGUCHI
  • Publication number: 20160209746
    Abstract: There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).
    Type: Application
    Filed: March 25, 2016
    Publication date: July 21, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei YAMAGUCHI, Tomotaka TSUCHIMURA, Natsumi YOKOKAWA, Koutarou TAKAHASHI
  • Patent number: 9383645
    Abstract: A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to forming a negative tone pattern.
    Type: Grant
    Filed: May 7, 2014
    Date of Patent: July 5, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Hidenori Takahashi, Kei Yamamoto, Fumihiro Yoshino
  • Patent number: 9316910
    Abstract: Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: April 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Hidenori Takahashi, Shuhei Yamaguchi, Shoichi Saitoh, Michihiro Shirakawa, Fumihiro Yoshino
  • Publication number: 20160070174
    Abstract: Disclosed is a pattern forming method including forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; exposing the active light sensitive or radiation sensitive film; and forming a negative type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer which includes an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) which has an acidic group and a lactone structure and of which, due to a polarity thereof being increased by an action of an acid, a solubility decreases with respect to a developer which includes an organic solvent.
    Type: Application
    Filed: November 11, 2015
    Publication date: March 10, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Shuhei YAMAGUCHI, Kei YAMAMOTO, Shohei KATAOKA
  • Patent number: 9244344
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) generating organic acid by irradiation of actinic ray or radiation, and 1% by mass or more of a resin (C) which has at least one of a fluorine atom and a silicon atom and is different from the resin (P) with regard to total solids of the actinic ray-sensitive or radiation-sensitive resin composition, wherein, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a straight chain or branched alkyl group.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: January 26, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kosuke Koshijima, Hidenori Takahashi, Shuhei Yamaguchi, Kei Yamamoto
  • Publication number: 20160018732
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.
    Type: Application
    Filed: September 29, 2015
    Publication date: January 21, 2016
    Inventors: SHUHEI YAMAGUCHI, TORU TSUCHIHASHI, TOMOTAKA TSUCHIMURA
  • Publication number: 20160015654
    Abstract: An adhesive composition for medical use of the present invention includes an acrylic copolymer, a medicament having a carboxyl group, and a base, the acrylic copolymer is prepared by copolymerization of a monomer mixture containing 0.1 to 2 mass % of an ethylenically unsaturated carboxylic acid monomer as a monomer A, 58 to 99.9 mass % of an alkyl(meth)acrylate ester having an alkyl group of 4 to 12 carbon atoms as a monomer B, 30 mass % or less of an alkyl(meth)acrylate ester having 1 to 3 carbon atoms as a monomer C, and 30 mass % or less of a monomer having an ethylenically unsaturated group other than those of the monomers A to C (the total of monomers A to D is taken as 100 mass %) as a monomer D, and the content of sulfuric acid in the acrylic copolymer is 700 ppm by mass or less.
    Type: Application
    Filed: September 29, 2015
    Publication date: January 21, 2016
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Shuhei YAMAGUCHI, Toshiyuki WAKAYAMA
  • Patent number: 9235117
    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: January 12, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Junichi Ito, Shuhei Yamaguchi, Hidenori Takahashi, Kei Yamamoto
  • Publication number: 20150378257
    Abstract: According to one example of the present application, there is provided a pattern forming method including: (i) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a specific resin and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) exposing the film; and (iii) developing the film exposed, by using an organic solvent-containing developer to form a negative pattern.
    Type: Application
    Filed: September 14, 2015
    Publication date: December 31, 2015
    Inventors: SHUHEI YAMAGUCHI, JUNICHI ITO, HIDENORI TAKAHASHI
  • Patent number: 9213237
    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: December 15, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Junichi Ito, Hidenori Takahashi, Shuhei Yamaguchi, Kei Yamamoto
  • Publication number: 20150331314
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.
    Type: Application
    Filed: July 29, 2015
    Publication date: November 19, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Shuhei YAMAGUCHI, Takamitsu TOMIGA, Fumihiro YOSHINO, Hajime FURUTANI, Michihiro SHIRAKAWA, Mitsuhiro FUJITA
  • Publication number: 20150323339
    Abstract: It is an object to provide a technique capable of searching for a route as close to a route intended by a user as possible. A route creation device includes an input unit that accepts a line drawn on a map displayed based on map data, and a link retrieval unit that retrieves corresponding road links that correspond to the line accepted by the input unit from the map data. The route creation device further includes a route searching unit that searches for a route including at least one road link satisfying a predetermined condition among the road links retrieved by the link retrieval unit.
    Type: Application
    Filed: July 17, 2012
    Publication date: November 12, 2015
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Shuhei YAMAGUCHI
  • Patent number: 9152049
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.
    Type: Grant
    Filed: August 27, 2010
    Date of Patent: October 6, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Akinori Shibuya, Shuhei Yamaguchi, Hisamitsu Tomeba
  • Patent number: 9120288
    Abstract: The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern, in the general formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a linear or branched alkyl group.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: September 1, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Hidenori Takahashi, Shuhei Yamaguchi, Shohei Kataoka, Michihiro Shirakawa, Fumihiro Yoshino, Shoichi Saitoh