Patents by Inventor Shuichi Yoshimura
Shuichi Yoshimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8952203Abstract: A method for manufacturing an acetal compound represented by the formula [1] in which the steps (A) to (D) as defined herein are performed sequentially, and an acetal compound of the formula [1] which is produced by the method: wherein n is 0 or 1 provided that R1 groups may be bonded or may not be bonded to each other when n is 0; R1 is an alkyl group having 1 or 2 carbon atoms or an alkylene group having 1 or 2 carbon atoms and the R1 groups may be same or different from each other; and R2 is an alkylene group having 1 or 6 carbon atoms.Type: GrantFiled: March 23, 2012Date of Patent: February 10, 2015Assignee: NOF CorporationInventors: Takashi Ichikawa, Shuichi Yoshimura, Ken-ichiro Nakamoto
-
Patent number: 8569444Abstract: A process for producing a polyalkylene glycol derivative having such high molecular weight and purity that the derivative can be used in pharmaceutical applications, which produces a polyalkylene glycol derivative of the formula (X) by steps (A), (B), (C) and (D), wherein R is as defined: R—(OA)nOH??(X) (step (A)) 5 to 50% by mol of an alkali catalyst is added to a compound represented by the formula (Y), wherein R is as defined: R—OH??(Y) (step (B)) an alkylene oxide having 2 to 4 carbon atoms is reacted under a condition of 50 to 130° C. until the average number of moles of an oxyalkylene group OA added reaches the range of 5 to 500 to obtain a polyalkylene glycol derivative; (step (C)) 10 to 5000% by mass of a hydrocarbon solvent is added to the derivative of the step (B) to dilute it, and remaining water is removed by azeotropy; and (step (D)) the derivative of the step (B) is reacted with an alkylene oxide having 2 to 4 carbon atoms under a condition of 50 to 130° C.Type: GrantFiled: November 11, 2009Date of Patent: October 29, 2013Assignee: NOF CorporationInventors: Ken-ichiro Nakamoto, Chika Itoh, Shuichi Yoshimura, Tsuyoshi Takehana
-
Publication number: 20120277477Abstract: A method for manufacturing an acetal compound represented by the formula [1] in which the steps (A) to (D) as defined herein are performed sequentially, and an acetal compound of the formula [1] which is produced by the method: wherein n is 0 or 1 provided that R1 groups may be bonded or may not be bonded to each other when n is 0; R1 is an alkyl group having 1 or 2 carbon atoms or an alkylene group having 1 or 2 carbon atoms and the R1 groups may be same or different from each other; and R2 is an alkylene group having 1 or 6 carbon atoms.Type: ApplicationFiled: March 23, 2012Publication date: November 1, 2012Applicant: NOF CORPORATIONInventors: Takashi Ichikawa, Shuichi Yoshimura, Ken-ichiro Nakamoto
-
Patent number: 8163869Abstract: An object of the present invention is to provide a purification method of separating impurities from a carboxyl group-containing polyoxyethylene derivative having a molecular weight of 2,000 to 100,000. The purification method according to the invention includes the following steps. The polyoxyethylene derivative is dissolved to form a solution using toluene, xylene, benzene, ethyl acetate, or butyl acetate in an amount 5 times by mass or more the amount of the polyoxyethylene derivative. A slurry is formed by adding to the solution an inorganic adsorbent containing at least one of an oxide and a hydroxide of one or more elements selected from the group consisting of magnesium, silicon, and aluminum in an amount 0.5 to 10 times by mass the amount of the polyoxyethylene derivative. The slurry is stirred at a temperature of 25° C. or higher. Toluene, xylene, benzene, ethyl acetate, or butyl acetate is added to a filtration cake obtained by filtration of the slurry, and further filtration is performed.Type: GrantFiled: December 27, 2010Date of Patent: April 24, 2012Assignee: NOF CorporationInventors: Shuichi Yoshimura, Ken-ichiro Nakamoto, Satoshi Matsuo, Takashi Ichikawa
-
Patent number: 8097692Abstract: A purification method in which, from a specific polyoxyalkylene derivative having a molecular weight of 8,800 to 100,000, an impurity differing in the number of hydroxyl groups is separated, the method including steps (A), (B), (C), and (D). Step (A): a step in which an aprotic organic solvent is used in an amount at least 5 times by weight the amount of the polyoxyalkylene derivative to dissolve the polyoxyalkylene derivative therein and give a solution; step (B): a step in which an adsorbent comprising an oxide containing at least one of aluminum and silicon is added to the solution in an amount 0.5 to 5 times by weight the amount of the polyoxyalkylene derivative to thereby yield a slurry; step (C): a step in which the slurry is stirred at 25° C. or higher; step (D): a step in which the polyoxyalkylene derivative is recovered from the slurry.Type: GrantFiled: March 31, 2010Date of Patent: January 17, 2012Assignee: NOF CorporationInventors: Shuichi Yoshimura, Ken-ichiro Nakamoto, Chika Itoh
-
Patent number: 8067526Abstract: A method for producing a polyoxyalkylene derivative including: step (A) in which a polyoxyalkylene derivative having hydroxyl group(s) is reacted with a phthalimide derivative in the presence of an azo reagent and a phosphine reagent; step (B) in which the phthalimide groups of the compound obtained in step (A) are deprotected using a compound having a primary amino group; and step (C) in which impurities derived from the phthalimide derivative and the deprotection reagent are removed by adsorption or extraction.Type: GrantFiled: March 26, 2010Date of Patent: November 29, 2011Assignee: NOF CorporationInventors: Hiroki Yoshioka, Takashi Matani, Shuichi Yoshimura, Kazuhiro Hashimoto
-
Publication number: 20110218322Abstract: An object of the present invention is to provide a process for producing a polyalkylene glycol derivative having such high molecular weight and purity that the derivative can be used in pharmaceutical applications. The production process of the invention produces a polyalkylene glycol derivative of the formula (X) by steps (A), (B), (C), (D), and (E). R—(OA)nOH??(X) (Step (A)) 5 to 50% by mol of an alkali catalyst is added to a compound represented by the formula (Y). R—OH??(Y) (Step (B)) An alkylene oxide having 2 to 4 carbon atoms is reacted under a condition of 50 to 130° C. until the average number of moles of an oxyalkylene group OA added reaches the range of 5 to 500 to obtain a polyalkylene glycol derivative. (Step (C)) 10 to 5000% by mass of a hydrocarbon solvent is added to the derivative of the step (B) to dilute it, and remaining water is removed by azeotropy.Type: ApplicationFiled: November 11, 2009Publication date: September 8, 2011Applicant: NOF CORPORATIONInventors: Ken-ichiro Nakamoto, Chika Itoh, Shuichi Yoshimura, Tsuyoshi Takehana
-
Publication number: 20100286361Abstract: A purification method in which, from a specific polyoxyalkylene derivative having a molecular weight of 8,800 to 100,000, an impurity differing in the number of hydroxyl groups is separated, the method including steps (A), (B), (C), and (D). Step (A): a step in which an aprotic organic solvent is used in an amount at least 5 times by weight the amount of the polyoxyalkylene derivative to dissolve the polyoxyalkylene derivative therein and give a solution; step (B): a step in which an adsorbent comprising an oxide containing at least one of aluminum and silicon is added to the solution in an amount 0.5 to 5 times by weight the amount of the polyoxyalkylene derivative to thereby yield a slurry; step (C): a step in which the slurry is stirred at 25° C. or higher; step (D): a step in which the polyoxyalkylene derivative is recovered from the slurry.Type: ApplicationFiled: March 31, 2010Publication date: November 11, 2010Applicant: NOF CORPORATIONInventors: Shuichi YOSHIMURA, Ken-ichiro NAKAMOTO, Chika ITOH
-
Publication number: 20100256325Abstract: A method for producing a polyoxyalkylene derivative including: step (A) in which a polyoxyalkylene derivative having hydroxyl group(s) is reacted with a phthalimide derivative in the presence of an azo reagent and a phosphine reagent; step (B) in which the phthalimide groups of the compound obtained in step (A) are deprotected using a compound having a primary amino group; and step (C) in which impurities derived from the phthalimide derivative and the deprotection reagent are removed by adsorption or extraction.Type: ApplicationFiled: March 26, 2010Publication date: October 7, 2010Applicant: NOF CORPORATIONInventors: Hiroki YOSHIOKA, Takashi MATANI, Shuichi YOSHIMURA, Kazuhiro HASHIMOTO