Patents by Inventor Shuichiro Adachi

Shuichiro Adachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140158196
    Abstract: An element of the present invention includes a silicon substrate; an electrode which is provided on the silicon substrate and which is a sintered product of a paste composition for an electrode containing a phosphorus-containing copper alloy particle, a glass particle, a solvent and a resin; and a solder layer containing a flux, which is provided on the electrode.
    Type: Application
    Filed: July 24, 2012
    Publication date: June 12, 2014
    Inventors: Yoshiaki Kurihara, Masato Yoshida, Takeshi Nojiri, Yasushi Kurata, Shuichiro Adachi, Takahiko Kato
  • Patent number: 8748877
    Abstract: The invention provides a material for forming a passivation film for a semiconductor substrate. The material includes a polymer compound having an anionic group or a cationic group.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: June 10, 2014
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akihiro Orita, Masato Yoshida, Takeshi Nojiri, Yoichi Machii, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Toru Tanaka
  • Publication number: 20140120648
    Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a glass powder and a dispersion medium, in which the glass powder includes an donor element and a total amount of the life time killer element in the glass powder is 1000 ppm or less. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: November 10, 2013
    Publication date: May 1, 2014
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Yoichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuichiro ADACHI, Tetsuya SATO, Keiko KIZAWA
  • Publication number: 20140065761
    Abstract: The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: November 9, 2013
    Publication date: March 6, 2014
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Yoichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuichiro ADACHI, Tetsuya SATO, Keiko KIZAWA
  • Publication number: 20130078759
    Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a glass powder and a dispersion medium, in which the glass powder includes an donor element and a total amount of the life time killer element in the glass powder is 1000 ppm or less. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: April 22, 2011
    Publication date: March 28, 2013
    Inventors: Yoichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Publication number: 20130071968
    Abstract: The composition for forming a composition for forming a p-type diffusion layer, the composition containing a glass powder and a dispersion medium, in which the glass powder includes an acceptor element and a total amount of a life time killer element in the glass powder is 1000 ppm or less. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
    Type: Application
    Filed: April 22, 2011
    Publication date: March 21, 2013
    Inventors: Yoichi Machii, Masato Yoshida, Takeshi Nojiri, Kaoru Okaniwa, Mitsunori Iwamuro, Shuichiro Adachi, Tetsuya Sato, Keiko Kizawa
  • Publication number: 20130042912
    Abstract: The solder bonded body according to the present invention contains: an oxide body to be bonded having an oxide layer on the surface thereof; and a solder layer bonded to the oxide layer, which the solder layer is formed by an alloy containing at least two metals selected from the group consisting of tin, copper, silver, bismuth, lead, aluminum, titanium and silicon and having a melting point of lower than 450° C. and has a zinc content of 1% by mass or less.
    Type: Application
    Filed: August 10, 2012
    Publication date: February 21, 2013
    Inventors: Yoshiaki KURIHARA, Masato Yoshida, Takeshi Nojiri, Shuichiro Adachi, Takashiko Kato, Yasushi Kurata
  • Publication number: 20130025668
    Abstract: The invention provides an element including a semiconductor substrate and an electrode disposed on the semiconductor substrate, the electrode being a sintered product of a composition for an electrode that includes phosphorus-containing copper alloy particles, glass particles and a dispersing medium, and the electrode includes a line-shaped electrode having an aspect ratio, which is defined as electrode short length:electrode height, of from 2:1 to 250:1.
    Type: Application
    Filed: July 24, 2012
    Publication date: January 31, 2013
    Inventors: Shuichiro ADACHI, Masato Yoshida, Takeshi Nojiri, Yoshiaki Kurihara, Takahiko Kato
  • Publication number: 20120260981
    Abstract: The present invention provides a paste composition for an electrode, the paste composition including phosphorus-tin-containing copper alloy particles, glass particles, a solvent and a resin. The present invention also provides a photovoltaic cell element having an electrode formed from the paste composition, and a photovoltaic cell.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 18, 2012
    Inventors: Shuichiro ADACHI, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20120260982
    Abstract: The present invention provides a paste composition for an electrode, the paste composition comprising phosphorus-containing copper alloy particles, tin-containing particles, glass particles, a solvent and a resin. The present invention also provides a photovoltaic cell element having an electrode formed from the paste composition, and a photovoltaic cell.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 18, 2012
    Inventors: Shuichiro ADACHI, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20120260988
    Abstract: A paste composition for an electrode, the paste composition comprising: phosphorous-containing copper alloy particles in which the content of phosphorous is from 6% by mass to 8% by mass; glass particles; a solvent; and a resin.
    Type: Application
    Filed: April 5, 2012
    Publication date: October 18, 2012
    Inventors: Shuichiro Adachi, Masato Yoshida, Takeshi Nojiri, Mitsunori Iwamuro, Keiko Kizawa, Takuya Aoyagi, Hiroki Yamamoto, Takashi Naito, Takahiko Kato
  • Publication number: 20120125670
    Abstract: In an electronic component having a wiring and/or an electrode prepared through firing of a paste or in an electronic component having a wiring in contact with a glass or glass ceramic member, provided is an electronic component using a Cu-based wiring material which less suffers from increase in electric resistance due to oxidation, which less causes bubbles in the glass or glass ceramic, and has satisfactory migration resistance. The Cu—Al alloy powder includes a Cu—Al alloy powder including Cu and, preferably, 50 percent by weight or less of Al; and an aluminum oxide film having a thickness of 80 nm or less and being present on the surface of the Cu—Al alloy powder. The powder, when compounded with a glass or glass ceramic material to give a paste, can be used to form wiring (interconnections), electrodes, and/or contact members.
    Type: Application
    Filed: August 2, 2010
    Publication date: May 24, 2012
    Inventors: Takahiko Kato, Takashi Naito, Takuya Aoyagi, Hiroki Yamamoto, Masato Yoshida, Mitsuo Katayose, Shinji Takeda, Naotaka Tanaka, Shuichiro Adachi