Abstract: A barrier stack for protecting devices from the permeation of moisture and gases includes a first layer acting as a planarization, decoupling, and/or smoothing layer, a second layer acting as a plasma resistant protective layer over the first layer, and a third layer acting as a barrier layer over the second layer. The first layer includes a polymeric or organic material. The second layer includes an inorganic material or polymeric material. The third layer includes an inorganic material and has a different density and/or refractive index than the second layer. The barrier stack may further include a fourth layer acting as a tie layer between the first layer and the substrate.

Abstract: A (meth)acrylate ester includes a (meth)acrylate moiety having an ester oxygen, an anthraquinone moiety having a transmittance spectrum producing blue light, and a linking group covalently bound to the ester oxygen and to a ring of the anthraquinone moiety, the linking group including, as a first component: phenyl, naphthyl, a linear alkyl group having from 1 to about 6 carbons, a branched alkyl group having from 3 to about 6 carbons, a cycloalkyl group having from about 3 to about 20 carbons, or a substituted aromatic group.

Abstract: A method for preparing sensing devices (biosensors) includes the steps of: (1) applying a photopatternable silicone composition to a surface in a sensing device to form a film, (2) photopatterning the film by a process comprising exposing the film to radiation through a photomask without the use of a photoresist to produce an exposed film; (3) removing regions of the non-exposed film with a developing solvent to form a patterned film, which forms a permselective layer or an analyte attenuation layer covering preselected areas of the sensing device.

Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.

Abstract: A composition includes a boron-containing hydrogen silsesquioxane polymer having a structure that includes: silicon-oxygen-silicon units, and oxygen-boron-oxygen linkages in which the boron is trivalent, wherein two silicon-oxygen-silicon units are covalently bound by an oxygen-boron-oxygen linkage therebetween.

Abstract: A triphenylmethane-based complex dye, a photosensitive resin composition, and a color filter, the triphenylmethane-based complex dye being represented by the following Chemical Formula 1:

Abstract: A resist composition comprising (A) a hydrogen silsesquioxane resin, (B) an acid dissociable group-containing compound, (C) a photo-acid generator, (D) an organic solvent and optionally (E) additives. The resist composition has improved lithographic properties (such as high etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist.

Abstract: An embodiment is directed to a polysiloxane having a moiety represented by the following Chemical Formula 1: *—Si-AR—Si—*??[Chemical Formula 1] wherein, in the Chemical Formula 1, AR is or includes a substituted or unsubstituted C6 to C30 arylene group.

Abstract: A (meth)acrylate ester includes a (meth)acrylate moiety having an ester oxygen, an anthraquinone moiety having a transmittance spectrum producing blue light, and a linking group covalently bound to the ester oxygen and to a ring of the anthraquinone moiety, the linking group including, as a first component: phenyl, naphthyl, a linear alkyl group having from 1 to about 6 carbons, a branched alkyl group having from 3 to about 6 carbons, a cycloalkyl group having from about 3 to about 20 carbons, or a substituted aromatic group.

Abstract: A composition includes a boron-containing hydrogen silsesquioxane polymer having a structure that includes: silicon-oxygen-silicon units, and oxygen-boron-oxygen linkages in which the boron is trivalent, wherein two silicon-oxygen-silicon units are covalently bound by an oxygen-boron-oxygen linkage therebetween.

Abstract: A (meth)acrylate ester includes a (meth)acrylate monomer moiety having an ester oxygen, an anthraquinone moiety having a transmittance spectrum producing red light, and a linking group covalently coupled to the ester oxygen and the anthraquinone moiety, the linking group including phenyl, naphthyl, a linear alkyl group having from 2 to about 10 carbons, a branched alkyl group having from 3 to about 10 carbons, a cycloalkyl group having from about 3 to about 20 carbons, or a substituted aromatic group.

Abstract: A method for preparing a patterned feature includes the steps of I) casting a curable silicone composition against a master, II) curing the curable silicone composition to form a silicone mold, II) separating the master and the silicone mold, IV) filling a silicone mold having a patterned surface with a curable epoxy formulation; V) curing the curable epoxy formulation to form a patterned feature; VI) separating the silicone mold and the patterned feature; optionally VIII) etching the patterned feature; optionally IX) cleaning the silicone mold; and optionally X) repeating steps IV) to IX) reusing the silicone mold.

Abstract: A method for preparing sensing devices (biosensors) includes the steps of: (1) applying a photopatternable silicone composition to a surface in a sensing device to form a film, (2) photopatterning the film by a process comprising exposing the film to radiation through a photomask without the use of a photoresist to produce an exposed film; (3) removing regions of the non-exposed film with a developing solvent to form a patterned film, which forms a permselective layer or an analyte attenuation layer covering preselected areas of the sensing device.

Abstract: A resist composition comprising (A) a hydrogen silsesquioxane resin, (B) an acid dissociable group-containing compound, (C) a photo-acid generator, (D) an organic solvent and optionally (E) additives. The resist composition has improved lithographic properties (such as high etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist.