Patents by Inventor Sonoko Migitaka
Sonoko Migitaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230006233Abstract: An object of the present invention is to provide a fuel cell that maintains electric generation efficiency of the fuel cell and that has high reliability in which an electrolyte film is not easily damaged. The fuel cell according to the present invention includes a stress adjusting layer covering an opening above a support substrate, and the stress adjusting layer has tensile stress with respect to the support substrate and has a columnar crystal structure in which a grain boundary extends along a direction parallel to a film thickness direction (see FIG. 2).Type: ApplicationFiled: November 8, 2019Publication date: January 5, 2023Inventors: Noriyuki SAKUMA, Yoshitaka SASAGO, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
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Publication number: 20220399558Abstract: An object of the present invention is to provide a fuel battery cell of a high power generation output by increasing an area of an effective power generation region contributing to power generation while ensuring mechanical strength of the fuel battery cell. The fuel battery cell according to the present invention is provided with a first and a second insulating films between a support substrate and a first electrode. The support substrate has a first opening, the first insulating film has a second opening, and the second insulating film has a third opening. An opening area of the first opening is larger than that of the second opening, and an opening area of the third opening is larger than that of the second opening (see FIG. 2).Type: ApplicationFiled: November 7, 2019Publication date: December 15, 2022Inventors: Noriyuki SAKUMA, Yoshitaka SASAGO, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
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Publication number: 20220393215Abstract: An object of the invention is to increase the output power of a solid oxide fuel cell by making a lower electrode layer porous so as to form a three-phase interface and reducing a thickness of a solid electrolyte layer to 1 micrometer or less. A fuel cell according to the invention includes a first electrode layer at a position where an opening formed in a board is covered, and a solid electrolyte layer having a thickness of 1000 nm or less. At least a part of a region of the first electrode layer covering the opening is porous (see FIG. 5).Type: ApplicationFiled: November 7, 2019Publication date: December 8, 2022Inventors: Yoshitaka SASAGO, Noriyuki SAKUMA, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
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Publication number: 20220384835Abstract: The present invention aims to reduce a failure in a fuel cell module and reduce manufacturing costs by specifying and taking countermeasures against cells in short-circuit failure from among fuel cells manufactured on a substrate by using a thin-film deposition process. In a fuel cell array according to the present invention, each fuel cell includes a solid electrolyte layer between a first electrode layer and a second electrode layer. A first wiring is connected to the second electrode layer, and a second wiring is connected to the first electrode layer through a connection element. The connection element is formed by sandwiching a conductive layer between two electrodes (refer to FIG. 8).Type: ApplicationFiled: November 7, 2019Publication date: December 1, 2022Inventors: Yoshitaka SASAGO, Noriyuki SAKUMA, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
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Patent number: 11181502Abstract: While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.Type: GrantFiled: March 26, 2015Date of Patent: November 23, 2021Assignee: Hitachi High-Tech CorporationInventors: Naoshi Itabashi, Sonoko Migitaka, Itaru Yanagi, Rena Akahori, Kenichi Takeda
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Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device
Patent number: 11130985Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.Type: GrantFiled: October 7, 2015Date of Patent: September 28, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Naoshi Itabashi, Sonoko Migitaka, Masatoshi Narahara, Tomohiro Shoji, Yukio Ono -
Patent number: 10451584Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).Type: GrantFiled: November 18, 2013Date of Patent: October 22, 2019Assignee: Hitachi High-Technologies CorporationInventors: Yoshimitsu Yanagawa, Takahide Yokoi, Naoshi Itabashi, Takayuki Kawahara, Sonoko Migitaka, Makiko Yoshida, Takamichi Muramatsu
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SPOT ARRAY SUBSTRATE, METHOD FOR PRODUCING SAME, AND NUCLEIC ACID POLYMER ANALYSIS METHOD AND DEVICE
Publication number: 20170260573Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.Type: ApplicationFiled: October 7, 2015Publication date: September 14, 2017Inventors: Naoshi ITABASHI, Sonoko MIGITAKA, Masatoshi NARAHARA, Tomohiro SHOJI, Yukio ONO -
Publication number: 20170138899Abstract: While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.Type: ApplicationFiled: March 26, 2015Publication date: May 18, 2017Applicant: Hitachi High-Technologies CorporationInventors: Naoshi ITABASHI, Sonoko MIGITAKA, Itaru YANAGI, Rena AKAHORI, Kenichi TAKEDA
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Publication number: 20150362458Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).Type: ApplicationFiled: November 18, 2013Publication date: December 17, 2015Inventors: Yoshimitsu YANAGAWA, Takahide YOKOI, Naoshi ITABASHI, Takayuki KAWAHARA, Sonoko MIGITAKA, Makiko YOSHIDA, Takamichi MURAMATSU
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Patent number: 7005216Abstract: Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.Type: GrantFiled: November 20, 2002Date of Patent: February 28, 2006Assignee: Renesas Technology Corp.Inventors: Hiroshi Shiraishi, Sonoko Migitaka, Takashi Hattori, Tadashi Arai, Toshio Sakamizu
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Patent number: 6790564Abstract: In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.Type: GrantFiled: December 19, 2001Date of Patent: September 14, 2004Assignee: Renesas Technology CorporationInventors: Sonoko Migitaka, Tadashi Arai, Tsutomu Araki, Satoshi Momose, Osamu Yamaguchi
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Publication number: 20030129505Abstract: Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.Type: ApplicationFiled: November 20, 2002Publication date: July 10, 2003Inventors: Hiroshi Shiraishi, Sonoko Migitaka, Takashi Hattori, Tadashi Arai, Toshio Sakamizu
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Publication number: 20020086222Abstract: In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.Type: ApplicationFiled: December 19, 2001Publication date: July 4, 2002Inventors: Sonoko Migitaka, Tadashi Arai, Tsutomu Araki, Satoshi Momose, Osamu Yamaguchi