Patents by Inventor Sonoko Migitaka

Sonoko Migitaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230006233
    Abstract: An object of the present invention is to provide a fuel cell that maintains electric generation efficiency of the fuel cell and that has high reliability in which an electrolyte film is not easily damaged. The fuel cell according to the present invention includes a stress adjusting layer covering an opening above a support substrate, and the stress adjusting layer has tensile stress with respect to the support substrate and has a columnar crystal structure in which a grain boundary extends along a direction parallel to a film thickness direction (see FIG. 2).
    Type: Application
    Filed: November 8, 2019
    Publication date: January 5, 2023
    Inventors: Noriyuki SAKUMA, Yoshitaka SASAGO, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
  • Publication number: 20220399558
    Abstract: An object of the present invention is to provide a fuel battery cell of a high power generation output by increasing an area of an effective power generation region contributing to power generation while ensuring mechanical strength of the fuel battery cell. The fuel battery cell according to the present invention is provided with a first and a second insulating films between a support substrate and a first electrode. The support substrate has a first opening, the first insulating film has a second opening, and the second insulating film has a third opening. An opening area of the first opening is larger than that of the second opening, and an opening area of the third opening is larger than that of the second opening (see FIG. 2).
    Type: Application
    Filed: November 7, 2019
    Publication date: December 15, 2022
    Inventors: Noriyuki SAKUMA, Yoshitaka SASAGO, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
  • Publication number: 20220393215
    Abstract: An object of the invention is to increase the output power of a solid oxide fuel cell by making a lower electrode layer porous so as to form a three-phase interface and reducing a thickness of a solid electrolyte layer to 1 micrometer or less. A fuel cell according to the invention includes a first electrode layer at a position where an opening formed in a board is covered, and a solid electrolyte layer having a thickness of 1000 nm or less. At least a part of a region of the first electrode layer covering the opening is porous (see FIG. 5).
    Type: Application
    Filed: November 7, 2019
    Publication date: December 8, 2022
    Inventors: Yoshitaka SASAGO, Noriyuki SAKUMA, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
  • Publication number: 20220384835
    Abstract: The present invention aims to reduce a failure in a fuel cell module and reduce manufacturing costs by specifying and taking countermeasures against cells in short-circuit failure from among fuel cells manufactured on a substrate by using a thin-film deposition process. In a fuel cell array according to the present invention, each fuel cell includes a solid electrolyte layer between a first electrode layer and a second electrode layer. A first wiring is connected to the second electrode layer, and a second wiring is connected to the first electrode layer through a connection element. The connection element is formed by sandwiching a conductive layer between two electrodes (refer to FIG. 8).
    Type: Application
    Filed: November 7, 2019
    Publication date: December 1, 2022
    Inventors: Yoshitaka SASAGO, Noriyuki SAKUMA, Yumiko ANZAI, Sonoko MIGITAKA, Natsuki YOKOYAMA, Takashi TSUTSUMI, Aritoshi SUGIMOTO, Toru ARAMAKI
  • Patent number: 11181502
    Abstract: While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: November 23, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Naoshi Itabashi, Sonoko Migitaka, Itaru Yanagi, Rena Akahori, Kenichi Takeda
  • Patent number: 11130985
    Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: September 28, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Naoshi Itabashi, Sonoko Migitaka, Masatoshi Narahara, Tomohiro Shoji, Yukio Ono
  • Patent number: 10451584
    Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: October 22, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshimitsu Yanagawa, Takahide Yokoi, Naoshi Itabashi, Takayuki Kawahara, Sonoko Migitaka, Makiko Yoshida, Takamichi Muramatsu
  • Publication number: 20170260573
    Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
    Type: Application
    Filed: October 7, 2015
    Publication date: September 14, 2017
    Inventors: Naoshi ITABASHI, Sonoko MIGITAKA, Masatoshi NARAHARA, Tomohiro SHOJI, Yukio ONO
  • Publication number: 20170138899
    Abstract: While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.
    Type: Application
    Filed: March 26, 2015
    Publication date: May 18, 2017
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Naoshi ITABASHI, Sonoko MIGITAKA, Itaru YANAGI, Rena AKAHORI, Kenichi TAKEDA
  • Publication number: 20150362458
    Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).
    Type: Application
    Filed: November 18, 2013
    Publication date: December 17, 2015
    Inventors: Yoshimitsu YANAGAWA, Takahide YOKOI, Naoshi ITABASHI, Takayuki KAWAHARA, Sonoko MIGITAKA, Makiko YOSHIDA, Takamichi MURAMATSU
  • Patent number: 7005216
    Abstract: Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: February 28, 2006
    Assignee: Renesas Technology Corp.
    Inventors: Hiroshi Shiraishi, Sonoko Migitaka, Takashi Hattori, Tadashi Arai, Toshio Sakamizu
  • Patent number: 6790564
    Abstract: In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: September 14, 2004
    Assignee: Renesas Technology Corporation
    Inventors: Sonoko Migitaka, Tadashi Arai, Tsutomu Araki, Satoshi Momose, Osamu Yamaguchi
  • Publication number: 20030129505
    Abstract: Providing a photo mask for KrF excimer laser lithography, which can be produced with high accuracy and low defects in a smaller number of steps. A photo mask for KrF excimer laser lithography according to the present invention is one in which a resist pattern 18 efficiently absorbing a KrF excimer laser light (wavelength: about 248 nm) is formed directly on a quartz substrate 10. The resist pattern 18 comprises: an aqueous alkali-soluble resin having a high light shielding property, which incorporates a naphthol structure having at least one hydroxyl group bound to a naphthalene nucleus; or a radiation sensitive resist having, as a main component, an aqueous alkali-soluble resin containing a derivative of the above-mentioned aqueous alkali-soluble resin as a resin matrix.
    Type: Application
    Filed: November 20, 2002
    Publication date: July 10, 2003
    Inventors: Hiroshi Shiraishi, Sonoko Migitaka, Takashi Hattori, Tadashi Arai, Toshio Sakamizu
  • Publication number: 20020086222
    Abstract: In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.
    Type: Application
    Filed: December 19, 2001
    Publication date: July 4, 2002
    Inventors: Sonoko Migitaka, Tadashi Arai, Tsutomu Araki, Satoshi Momose, Osamu Yamaguchi