Patents by Inventor Stephen Hsu

Stephen Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7735052
    Abstract: Optical proximity effects (OPEs) are a well-known phenomenon in photolithography. OPEs result from the structural interaction between the main feature and neighboring features. It has been determined by the present inventors that such structural interactions not only affect the critical dimension of the main feature at the image plane, but also the process latitude of the main feature. Moreover, it has been determined that the variation of the critical dimension as well as the process latitude of the main feature is a direct consequence of light field interference between the main feature and the neighboring features. Depending on the phase of the field produced by the neighboring features, the main feature critical dimension and process latitude can be improved by constructive light field interference, or degraded by destructive light field interference. The phase of the field produced by the neighboring features is dependent on the pitch as well as the illumination angle.
    Type: Grant
    Filed: August 14, 2006
    Date of Patent: June 8, 2010
    Assignee: ASML Masktools Netherlands B.V.
    Inventors: Xuelong Shi, Jang Fung Chen, Duan-Fu Stephen Hsu
  • Publication number: 20100086863
    Abstract: A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test structures through a selected range of dimensions, simulating an image of the test structures, determining an image quality metric for the simulated image, analyzing the determined image quality metric to determine pitch ranges for which split improves the image quality metric and ranges for which split does not improve the image quality metric, and generating the two sub-patterns in accordance with the determined pitch ranges.
    Type: Application
    Filed: September 25, 2009
    Publication date: April 8, 2010
    Applicant: BRION TECHNOLOGIES INC.
    Inventors: DUAN-FU STEPHEN HSU, JOOBYOUNG KIM
  • Patent number: 7681171
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. The method includes the steps of: defining an initial H-mask corresponding to the target pattern; defining an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask having a width which is less than a predetermined critical width; identifying vertical critical features in the V-mask having a width which is less than a predetermined critical width; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask.
    Type: Grant
    Filed: April 12, 2006
    Date of Patent: March 16, 2010
    Assignee: ASML Masktooks B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke
  • Patent number: 7666554
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: February 23, 2010
    Assignee: ASML Masktools, B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Patent number: 7617476
    Abstract: A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) determining a minimum critical dimension and pitch associated with a process to be utilized to image the multiple patterns; (b) generating an anchoring feature; (c) disposing the anchoring feature adjacent a first feature of the target pattern; (d) growing the anchoring feature a predetermined amount so as to define a first area; (e) assigning any feature within the first area to a first pattern; (f) disposing the anchoring feature adjacent a second feature of the target pattern; (g) growing the anchoring feature the predetermined amount so as to define a second area; and (h) assigning any feature within the second area to a second pattern. Steps (c)-(h) are then repeated until the densely spaced features within the target pattern have been assigned to either the first or second pattern.
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: November 10, 2009
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Noel Corcoran, Jang Fung Chen, Douglas Van Den Broeke
  • Publication number: 20090237508
    Abstract: A method and apparatus for providing immersive surveillance wherein a remote security guard may monitor a scene using a variety of imagery sources that are rendered upon a model to provide a three-dimensional conceptual view of the scene. Using a view selector, the security guard may dynamically select a camera view to be displayed on his conceptual model, perform a walk through of the scene, identify moving objects and select the best view of those moving objects and so on.
    Type: Application
    Filed: March 13, 2009
    Publication date: September 24, 2009
    Applicant: L-3 COMMUNICATIONS CORPORATION
    Inventors: Aydin Arpa, Keith Hanna, Rakesh Kumar, Supun Samarasekera, Harpreet Singh Sawhney, Manoj Aggarwal, David Nister, Stephen Hsu
  • Patent number: 7549140
    Abstract: A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).
    Type: Grant
    Filed: January 18, 2005
    Date of Patent: June 16, 2009
    Assignee: ASML Masktools B. V.
    Inventors: Doug Van Den Broeke, Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Hsu
  • Patent number: 7523438
    Abstract: A method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of an optical exposure tool. The method comprising the steps of generating a diffraction pattern corresponding to the lithographic pattern, where the diffraction pattern indicates a plurality of spatial frequency components corresponding to the lithographic pattern; determining which of the spatial frequency components need to be captured by a lens in the optical exposure tool in order to accurately reproduce the lithographic pattern; determining a set of illumination conditions required for the optical exposure tool to capture the spatial frequency components necessary for accurately reproducing the lithographic pattern; and illuminating the high transmission attenuated phase-shift mask with this set of illumination conditions.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: April 21, 2009
    Assignee: ASML Masktools B.V.
    Inventors: Michael Hsu, Stephen Hsu, Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen
  • Patent number: 7522186
    Abstract: A method and apparatus for providing immersive surveillance wherein a remote security guard may monitor a scene using a variety of imagery sources that are rendered upon a model to provide a three-dimensional conceptual view of the scene. Using a view selector, the security guard may dynamically select a camera view to be displayed on his conceptual model, perform a walk through of the scene, identify moving objects and select the best view of those moving objects and so on.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: April 21, 2009
    Assignee: L-3 Communications Corporation
    Inventors: Aydin Arpa, Keith J. Hanna, Rakesh Kumar, Supun Samarasekera, Harpreet Singh Sawhney, Manoj Aggarwal, David Nister, Stephen Hsu
  • Patent number: 7434195
    Abstract: A method of generating a mask for use in an imaging process pattern. The method includes the steps of: (a) obtaining a desired target pattern having a plurality of features to be imaged on a substrate; (b) simulating a wafer image utilizing the target pattern and process parameters associated with a defined process; (c) defining at least one feature category; (d) identifying features in the target pattern that correspond to the at least one feature category, and recording an error value for each feature identified as corresponding to the at least one feature category; and (e) generating a statistical summary which indicates the error value for each feature identified as corresponding to the at least one feature category.
    Type: Grant
    Filed: September 14, 2005
    Date of Patent: October 7, 2008
    Assignee: ASML Masktools B.V.
    Inventors: Michael Hsu, Thomas Laidig, Kurt E. Wampler, Duan-Fu Stephen Hsu, Xuelong Shi
  • Patent number: 7433791
    Abstract: A method of calibrating a simulation model of a photolithography process. The method includes the steps of defining a set of input data; defining a simulation model having model parameters which affect the simulation result produced by the simulation model; performing a first stage calibration process in which the model parameters and alignment parameters are adjusted such that the simulation result is within a first predefined error tolerance; and performing a second stage calibration process in which the alignment parameters are fixed and the model parameters are adjusted such that the simulation result is within a second predefined error tolerance.
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: October 7, 2008
    Assignee: ASML Masktools B.V.
    Inventors: Sangbong Park, Duan-Fu Stephen Hsu, Edita Tejnil
  • Publication number: 20080103699
    Abstract: A method and apparatus for performing wide area terrain mapping. The system comprises a digital elevation map (DEM) and mosaic generation engine that processes images that are simultaneously captured by an electro-optical camera (RGB camera) and a LIDAR sensor. The image data collected by both the camera and the LIDAR sensor are processed to create a geometrically accurate three-dimensional view of objects viewed from an aerial platform.
    Type: Application
    Filed: February 10, 2006
    Publication date: May 1, 2008
    Inventors: Barbara Hanna, Bing-Bing Chai, Stephen Hsu
  • Patent number: 7363157
    Abstract: A method and apparatus for performing wide area terrain mapping. The system comprises a digital elevation map (DEM) and mosaic generation engine that processes images that are simultaneously captured by an electro-optical camera (RGB camera) and a LIDAR sensor. The image data collected by both the camera and the LIDAR sensor are processed to create a geometrically accurate three-dimensional view of objects viewed from an aerial platform.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: April 22, 2008
    Assignee: Sarnoff Corporation
    Inventors: Barbara Hanna, Bing-Bing Chai, Stephen Hsu
  • Patent number: 7355673
    Abstract: Disclose is a method, program product and apparatus for optimizing numerical aperture (“NA”) and sigma of a lithographic system based on the target layout. A pitch or interval analysis is performed to identify the distribution of critical pitch over the design. Based on the pitch or interval analysis, a critical dense pitch is identified. NA, sigma-in, sigma-out parameters are optimized such that the critical feature will print with or without bias adjustment. For features other than the critical dense features, adjustments are made in accordance with OPC, and lithographic apparatus settings are further mutually optimized. Accordingly, lithographic apparatus settings may be optimized for any pattern concurrently with OPC.
    Type: Grant
    Filed: June 29, 2004
    Date of Patent: April 8, 2008
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Armin Liebchen
  • Publication number: 20070214448
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Application
    Filed: May 3, 2007
    Publication date: September 13, 2007
    Inventors: Stephen Hsu, Noel Corcoran, Jang Chen
  • Publication number: 20070162889
    Abstract: A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged on a substrate; determining an interference map based on the target pattern, the interference map defining areas of constructive interference and areas of destructive interference between at least one of the features to be imaged and a field area adjacent the at least one feature; and placing assist features in the mask design based on the areas of constructive interference and the areas of destructive interference.
    Type: Application
    Filed: March 6, 2007
    Publication date: July 12, 2007
    Applicant: ASML MASKTOOLS B.V.
    Inventors: Douglas Broeke, Jang Chen, Thomas Laidig, Kurt Wampler, Stephen Hsu
  • Publication number: 20070099295
    Abstract: The present invention relates to methods of determining anti-infectious agent IgG avidity, for example, human anti-cytomegalovirus and human anti-toxoplasma IgG avidity, using a competitive assay format.
    Type: Application
    Filed: November 2, 2005
    Publication date: May 3, 2007
    Inventors: Gregory Maine, Stephen Hsu, Darwin Smith, Dominick Pucci, Jorg Herzogenrath, Ingo Curdt, Heike Christ
  • Publication number: 20070031064
    Abstract: A method and apparatus for performing two-dimensional video alignment onto three-dimensional point clouds. The system recovers camera pose from camera video, determines a depth map, converts the depth map to a Euclidean video point cloud, and registers two-dimensional video to the three-dimensional point clouds.
    Type: Application
    Filed: June 10, 2005
    Publication date: February 8, 2007
    Inventors: Wenyi Zhao, David Nister, Stephen Hsu
  • Patent number: 7138212
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: November 21, 2006
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Patent number: 7100145
    Abstract: Optical proximity effects (OPEs) are a well-known phenomenon in photolithography. OPEs result from the structural interaction between the main feature and neighboring features. It has been determined by the present inventors that such structural interactions not only affect the critical dimension of the main feature at the image plane, but also the process latitude of the main feature. Moreover, it has been determined that the variation of the critical dimension as well as the process latitude of the main feature is a direct consequence of light field interference between the main feature and the neighboring features. Depending on the phase of the field produced by the neighboring features, the main feature critical dimension and process latitude can be improved by constructive light field interference, or degraded by destructive light field interference. The phase of the field produced by the neighboring features is dependent on the pitch as well as the illumination angle.
    Type: Grant
    Filed: September 13, 2004
    Date of Patent: August 29, 2006
    Assignee: ASML Masktools B.V.
    Inventors: Xuelong Shi, Jang Fung Chen, Duan-Fu Stephen Hsu