Abstract: A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 20 of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 20 of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1. AI ? 1 = XM ? 1 XQ ? 1 XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.

Abstract: A vehicle roof module includes a front support portion extending in the width direction of the vehicle and connecting the upper bodies of the vehicle with each other, a rear support portion extending in the width direction of the vehicle and provided at a rear of the front support portion, and a reinforcing support portion connecting the front support portion and the rear support portion in a longitudinal direction of the vehicle and including an internal pattern, in which the front support portion, the rear support portion, the reinforcing support portion, and the upper bodies of the vehicle are connected to each other to form a load path for a vehicle collision along the internal pattern of the reinforcing support portion.

Abstract: One embodiment of the present invention relates to an electronic device for reproducing, in time sequence, first pen data in which handwriting strokes are digitized on a medium by an electronic pen. The electronic device comprises: a communication module; a control module; an output module for reproducing or outputting first handwriting information, first image or audio information photographed or recorded by the electronic device, and event information in time sequence; and a memory module for storing contents including the first handwriting information, the first image or audio information, and the event information, wherein, when the communication module further receives second pen data in a state where the first handwriting information is held on the output module after the contents are stored in the memory module, second handwriting information corresponding to the second pen data is added to the first handwriting information and then reproduced.

Abstract: One embodiment of the present invention relates to an electronic device for reproducing, in time sequence, first pen data in which handwriting strokes are digitized on a medium by an electronic pen. The electronic device comprises: a communication module; a control module; an output module for reproducing or outputting first handwriting information, first image or audio information photographed or recorded by the electronic device, and event information in time sequence; and a memory module for storing contents including the first handwriting information, the first image or audio information, and the event information, wherein, when the communication module further receives second pen data in a state where the first handwriting information is held on the output module after the contents are stored in the memory module, second handwriting information corresponding to the second pen data is added to the first handwriting information and then reproduced.

Abstract: One embodiment of the present invention relates to an electronic device for reproducing, in time sequence, first pen data in which handwriting strokes are digitized on a medium by an electronic pen. The electronic device comprises: a communication module; a control module; an output module for reproducing or outputting first handwriting information, first image or audio information photographed or recorded by the electronic device, and event information in time sequence; and a memory module for storing contents including the first handwriting information, the first image or audio information, and the event information, wherein, when the communication module further receives second pen data in a state where the first handwriting information is held on the output module after the contents are stored in the memory module, second handwriting information corresponding to the second pen data is added to the first handwriting information and then reproduced.

Abstract: One embodiment of the present invention relates to an electronic device for reproducing, in time sequence, first pen data in which handwriting strokes are digitized on a medium by an electronic pen. The electronic device comprises: a communication module; a control module; an output module for reproducing or outputting first handwriting information, first image or audio information photographed or recorded by the electronic device, and event information in time sequence; and a memory module for storing contents including the first handwriting information, the first image or audio information, and the event information, wherein, when the communication module further receives second pen data in a state where the first handwriting information is held on the output module after the contents are stored in the memory module, second handwriting information corresponding to the second pen data is added to the first handwriting information and then reproduced.

Abstract: A method for fabricating a semiconductor device is provided. The method for fabricating the semiconductor device includes forming an interlayer insulating layer that comprises a first region and a second region, forming an etch stop pattern for exposing the second region in the first region of the interlayer insulating layer and forming a mask pattern that comprises a first via-hole that exposes an upper surface of the etch stop pattern and a second via-hole that penetrates the interlayer insulating layer on the interlayer insulating layer and the etch stop pattern.

Abstract: A method for fabricating a semiconductor device is provided. The method for fabricating the semiconductor device includes forming an interlayer insulating layer that comprises a first region and a second region, forming an etch stop pattern for exposing the second region in the first region of the interlayer insulating layer and forming a mask pattern that comprises a first via-hole that exposes an upper surface of the etch stop pattern and a second via-hole that penetrates the interlayer insulating layer on the interlayer insulating layer and the etch stop pattern.

Abstract: A method of detecting focus shift in a lithography process, a method of analyzing an error of a transferred pattern using the same, and a method of manufacturing a semiconductor device using the methods are provided. The focus shift detecting method of a lithography process comprises generating a first contour band of a mask pattern between a first focus and a second focus, generating a second contour of the mask pattern between the first focus and a third focus, and determining whether focus shift of the mask pattern occurs using an intersection of the first contour band and the second contour band.

Abstract: A method of designing patterns of semiconductor devices includes forming a plurality of tiles having patterns on a wafer, measuring the patterns of the plurality of tiles, analyzing the measurements of the patterns and determining a tile having such a size that the measurements linearly vary according to a design size and pattern density, and modifying the pattern density of the determined tile.

Abstract: A mask for photolithography and methods of manufacturing a mask and a semiconductor device are provided. The method of manufacturing a mask may comprise providing a substrate, forming a phase shift material layer on the substrate, forming a light blocking layer on the phase shift material layer, and forming a main pattern and a sub pattern on the substrate by patterning the phase shift material layer and the light blocking layer. The light blocking layer may be removed on the main pattern left on the light blocking layer remaining on the sub pattern. A semiconductor device may be manufactured using the mask to form a photoresist pattern on a semiconductor wafer. The pattern of the photoresist may be used to etch an object layer of the semiconductor wafer.

Abstract: A method of detecting focus shift in a lithography process, a method of analyzing an error of a transferred pattern using the same, and a method of manufacturing a semiconductor device using the methods are provided. The focus shift detecting method of a lithography process comprises generating a first contour band of a mask pattern between a first focus and a second focus, generating a second contour of the mask pattern between the first focus and a third focus, and determining whether focus shift of the mask pattern occurs using an intersection of the first contour band and the second contour band.

Abstract: A mask for photolithography and methods of manufacturing a mask and a semiconductor device are provided. The method of manufacturing a mask may comprise providing a substrate, forming a phase shift material layer on the substrate, forming a light blocking layer on the phase shift material layer, and forming a main pattern and a sub pattern on the substrate by patterning the phase shift material layer and the light blocking layer. The light blocking layer may be removed on the main pattern left on the light blocking layer remaining on the sub pattern. A semiconductor device may be manufactured using the mask to form a photoresist pattern on a semiconductor wafer. The pattern of the photoresist may be used to etch an object layer of the semiconductor wafer.

Abstract: A method and apparatus are provided to manage contents in a network, and a web server used thereto. A memory is configured to store a code output with a printed matter and mapping information of contents, which are executed by a reader reading the code. A receiver is configured to receive a request from the reader to transmit the mapping information. A transmitter is configured to transmit the mapping information to the reader. When the code outputted to the printed matter is read, the contents executed in the reader are changed into various contents such that the changed contents are used. In addition, a product user and a product seller obtain the learning information of a learner through the reader, or product application information.

Abstract: A method of designing patterns of semiconductor devices includes forming a plurality of tiles having patterns on a wafer, measuring the patterns of the plurality of tiles, analyzing the measurements of the patterns and determining a tile having such a size that the measurements linearly vary according to a design size and pattern density, and modifying the pattern density of the determined tile.

Abstract: A semiconductor device includes a logic region disposed in a central region of the semiconductor device, and a peripheral region disposed in an outer region thereof. The logic region includes a line-shaped logic transistor and a box-shaped decoupling capacitor. The peripheral region includes a line-shaped peripheral transistor and a line-shaped peripheral dummy transistor disposed adjacent to the peripheral transistor.

Abstract: A film with codes, a reader configured to read the film, and an electronic device having a display including the film are provided. The reader may include a first light irradiating section, a second light irradiating section, a control section, and a light capturing section.

Abstract: A method of forming fine patterns of a semiconductor device according to a double patterning process that uses acid diffusion is provided. In this method, a plurality of first mask patterns are formed on a substrate. A capping film including an acid source is formed on the exposed surface areas of the plurality of first mask patterns. A second mask layer is formed on the capping films. A plurality of acid diffused regions are formed within the second mask layer by diffusing acid obtained from the acid source from the capping films into the second mask layer. A plurality of second mask patterns are formed of residual parts of the second mask layer which remain after removing the acid diffused regions of the second mask layer.

Abstract: Disclosed are a method for providing a correction and teaching services over a network and a web server used in the method. The method of the present invention is implemented by the steps of: enabling a web server to receive information to be corrected including image information created by a student from a student terminal, storing the information to be corrected, transmitting the information to be corrected to a teacher terminal, receiving corrected information from the teacher terminal, and mapping the corrected information and the information to be corrected. According to the present invention, the cost of time required for correcting and teaching can be reduced, and the teacher can provide the student with both corrections on the student's answer sheet and with feedback in the teacher's voice.

Abstract: Disclosed are a film having codes recorded thereon, a reader used to recognize the film having the codes recorded thereon, and electronic equipment including a display device to which the film having the codes recorded thereon is attached. The reader includes a light emitting part irradiating light having a first wavelength onto a film surface printed with a code by using a predetermined fluorescent material, and a light receiving part receiving only a light having a second wavelength radiated by the predetermined fluorescent material if the light having the first wavelength is irradiated on the code. The reader recognizes the codes together with a screen when a code pattern is printed on the surface of the transparent material and the transparent material is attached on the surface of a display part provided in the electronic equipment.