Patents by Inventor Sung-Hong Park

Sung-Hong Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240294394
    Abstract: Disclosed is a composite transition metal precursor for a cathode active material containing Ni and at least one transition metal, wherein a molar amount of Ni is 60% or more based on a total amount of transition metal and a ratio (I101/I001) of an intensity of a (101) plane to an intensity of a (001) plane ranges from 0.7 to 1.1 in XRD analysis.
    Type: Application
    Filed: September 29, 2021
    Publication date: September 5, 2024
    Inventors: Sun Hong PARK, Won Gyeong KANG, Sung Kyun CHANG, Doe Hyoung KIM
  • Patent number: 12037589
    Abstract: The present invention relates to a double-stranded oligonucleotide which can highly specifically and efficiently inhibit an amphiregulin expression and, preferably, a double-stranded oligonucleotide comprising a sequence in the form of RNA/RNA, DNA/DNA or DNA/RNA hybrid, a double-stranded oligonucleotide structure comprising the double-stranded oligonucleotide, nanoparticles comprising the double-stranded oligonucleotide structure, and a fibrosis or respiratory disease preventive or therapeutic use thereof.
    Type: Grant
    Filed: June 7, 2023
    Date of Patent: July 16, 2024
    Assignee: Bioneer Corporation
    Inventors: Tae-Rim Kim, Pyoung Oh Yoon, Youngho Ko, Seon Joo Bae, Han-Oh Park, Seung Seob Son, Jun-Hong Park, Sung-Il Yun
  • Patent number: 11573283
    Abstract: Provided is a method for generating MRI data including applying, by an MRI computing device, an RF excitation pulse, and completing, by the MRI computing device, a K-space by acquiring a plurality of phase encoding line groups, in a state in which any other RF excitation pulse is not applied after applying the RF excitation pulse, in which each of the plurality of phase encoding line groups includes a plurality of phase encoding lines, and an absolute value of an average phase encoding size of a phase encoding line group acquired earlier is not greater than an absolute value of an average phase encoding size of a phase encoding line group acquired later, among the plurality of phase encoding line groups.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: February 7, 2023
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Sung-Hong Park, Hyun-Soo Lee
  • Publication number: 20230016293
    Abstract: Provided is a method for generating Mill data including applying, by an Mill computing device, an RF excitation pulse, and completing, by the MM computing device, a K-space by acquiring a plurality of phase encoding line groups, in a state in which any other RF excitation pulse is not applied after applying the RF excitation pulse, in which each of the plurality of phase encoding line groups includes a plurality of phase encoding lines, and an absolute value of an average phase encoding size of a phase encoding line group acquired earlier is not greater than an absolute value of an average phase encoding size of a phase encoding line group acquired later, among the plurality of phase encoding line groups.
    Type: Application
    Filed: July 20, 2021
    Publication date: January 19, 2023
    Inventors: Sung-Hong PARK, Hyun-Soo LEE
  • Patent number: 11209512
    Abstract: The present invention relates to a method for acquiring data for acquiring an arteriogram and a venogram of magnetic resonance imaging, the method: using one or more echo; and simultaneously acquiring, through one-time photography, an arteriogram and a venogram, which are optimized according to the number of slabs or improving connectivity of a slab boundary part of the arteriogram.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: December 28, 2021
    Inventors: Sung-Hong Park, Won-Joon Do
  • Patent number: 11185248
    Abstract: Disclosed are a method of detecting a neuron resonance signal and an MRI signal processing apparatus. The method of detecting a neuron resonance signal includes acquiring a plurality of different digital sequences respectively corresponding to a plurality of different repetition periods by sampling a magnetic resonance signal of a neuron resonance signal according to each of the plurality of different repetition periods and calculating correlation between the plurality of different digital sequences in a frequency band based on the plurality of different digital sequences.
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: November 30, 2021
    Assignee: Korea Advanced Institute of Science and Technology
    Inventors: Sung-Hong Park, Kihwan Kim, Hyoim Heo, Hyun-Soo Lee
  • Patent number: 11029381
    Abstract: Provided is an MRI image generation method including: acquiring first phase encoding lines obtained by undersampling along a first direction using an MRI device; acquiring second phase encoding lines obtained by undersampling in a second direction different from the first direction using the MRI device; generating a first MRI image based on the first phase encoding lines and the second phase encoding lines; and generating a second MRI image different from the first MRI image based on the first phase encoding lines and the second phase encoding lines.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: June 8, 2021
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Sung-Hong Park, Ki-Hwan Kim
  • Publication number: 20200096585
    Abstract: The present invention relates to a method for acquiring data for acquiring an arteriogram and a venogram of magnetic resonance imaging, the method: using one or more echo; and simultaneously acquiring, through one-time photography, an arteriogram and a venogram, which are optimized according to the number of slabs or improving connectivity of a slab boundary part of the arteriogram.
    Type: Application
    Filed: October 16, 2017
    Publication date: March 26, 2020
    Inventors: Sung-Hong PARK, Won-Joon DO
  • Publication number: 20190219654
    Abstract: Provided is an MRI image generation method including: acquiring first phase encoding lines obtained by undersampling along a first direction using an MRI device; acquiring second phase encoding lines obtained by undersampling in a second direction different from the first direction using the MRI device; generating a first MRI image based on the first phase encoding lines and the second phase encoding lines; and generating a second MRI image different from the first MRI image based on the first phase encoding lines and the second phase encoding lines.
    Type: Application
    Filed: January 14, 2019
    Publication date: July 18, 2019
    Inventors: Sung-Hong PARK, Ki-Hwan KIM
  • Patent number: 10136834
    Abstract: The present disclosure provides a neuronal resonance-magnetic resonance imaging (NR-MRI) method and technology for measuring a difference between a resting state and a state of providing external stimuli with respect to various frequency bands by using the NR-MRI scheme through frequency band selection filter characteristic mapping of neurons. In addition, the present disclosure provides technology for revealing a frequency selective communication mechanism between brain regions on the basis of systems biology researches for the frequency selective communication mechanism between the brain regions as well as technology useful for completing proof-of-concept and a frequency selective communication map between the entire brain regions.
    Type: Grant
    Filed: December 26, 2014
    Date of Patent: November 27, 2018
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Sung-Hong Park, Kwang Hyun Cho
  • Publication number: 20180289282
    Abstract: Disclosed are a method of detecting a neuron resonance signal and an MRI signal processing apparatus. The method of detecting a neuron resonance signal includes acquiring a plurality of different digital sequences respectively corresponding to a plurality of different repetition periods by sampling a magnetic resonance signal of a neuron resonance signal according to each of the plurality of different repetition periods and calculating correlation between the plurality of different digital sequences in a frequency band based on the plurality of different digital sequences.
    Type: Application
    Filed: April 6, 2018
    Publication date: October 11, 2018
    Applicant: Korea Advanced Institute of Science and Technology
    Inventors: Sung-Hong Park, Kihwan Kim, Hyoim Heo, Hyun-Soo Lee
  • Publication number: 20150238112
    Abstract: The present disclosure provides a neuronal resonance-magnetic resonance imaging (NR-MRI) method and technology for measuring a difference between a resting stale and a state of providing external stimuli with respect to various frequency bands by using the NR-MRI scheme through frequency band selection filter characteristic mapping of neurons. In addition, the present disclosure provides technology for revealing a frequency selective communication mechanism between brain regions on the basis of systems biology researches for the frequency selective communication mechanism between the brain regions as well as technology useful for completing proof-of-concept and a frequency selective communication map between the entire brain regions.
    Type: Application
    Filed: December 26, 2014
    Publication date: August 27, 2015
    Inventors: Sung-Hong Park, Kwang Hyun CHO
  • Patent number: 8676296
    Abstract: A dual-echo sequence technique provided herein empowers simultaneous acquisition of both TOF MRA and BOLD MRV in a single MR acquisition. By this approach, an echo-specific K-space ordering scheme permits the adjustment of the scan parameters that are compatible for each of the MRA and MRV. The image quality in the MRA and MRV acquired by this compatible dual-echo arteriovenography (CODEA) technique is comparable to that for conventional, single-echo MRA and MRV. When the technique is integrated with MOTSA, seamless vascular connectivity is achieved in both MRA and MRV over a large area of brain anatomy. The technique will facilitate routine clinical acquisition and application of dual-echo MRA and MRV, as both MRA and MRV can be acquired with minimal impact on the image quality and without adversely affecting the scan throughput.
    Type: Grant
    Filed: September 14, 2009
    Date of Patent: March 18, 2014
    Assignee: Univerity of Pittsburgh—Of The Commonwealth System of Higher Education
    Inventors: Sung-Hong Park, Kyongtae Ty Bae
  • Publication number: 20110213237
    Abstract: A dual-echo sequence technique provided herein empowers simultaneous acquisition of both TOF MRA and BOLD MRV in a single MR acquisition. By this approach, an echo-specific K-space ordering scheme permits the adjustment of the scan parameters that are compatible for each of the MRA and MRV. The image quality in the MRA and MRV acquired by this compatible dual-echo arteriovenography (CODEA) technique is comparable to that for conventional, single-echo MRA and MRV. When the technique is integrated with MOTSA, seamless vascular connectivity is achieved in both MRA and MRV over a large area of brain anatomy. The technique will facilitate routine clinical acquisition and application of dual-echo MRA and MRV, as both MRA and MRV can be acquired with minimal impact on the image quality and without adversely affecting the scan throughput.
    Type: Application
    Filed: September 14, 2009
    Publication date: September 1, 2011
    Inventors: Sung-Hong Park, Kyongtae Ty Bae
  • Patent number: 7747063
    Abstract: In an embodiment of a method of inspecting a substrate, the substrate on which minute structures are formed is divided into a plurality of inspection regions. A main inspection region among the inspection regions is selected. A main image of the main inspection region and sub-images of sub-inspection regions adjacent to the main inspection region are obtained. An average image of the main image and the sub-images is obtained. The average image is then compared with the main image to detect defects in the main inspection region. Gray levels may be used. The average image may have improved quality so that the defects in the selected inspection region may be rapidly and accurately detected. This process has an improved reliability. Further, the number of inspecting processes for the substrate may be reduced. And a line for the inspection process may be automated so that a worker-free line may be established.
    Type: Grant
    Filed: August 8, 2006
    Date of Patent: June 29, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Taek Lim, Chung-Sam Jun, Young-Jee Yoon, Sung-Hong Park
  • Patent number: 7626164
    Abstract: In an embodiment, a method of scanning a substrate, and a method and an apparatus for analyzing crystal characteristics are disclosed. A sequential scan on the scan areas using a first electron beam and a second electron beam are repeatedly performed. The electrons accumulated in the scan areas by the first electron beam are removed from the scan areas by the second electron beam. When a size of the scan area is substantially the same as a spot size of the first electron beam, adjacent scan areas partially overlap each other. When each of the scan areas is larger than a spot size of the first electron beam, the adjacent scan areas do not overlap each other. Images of the scan areas are generated using back-scattered electrons emitted from each of the scan areas by irradiating the first electron beam to analyze crystal characteristics of circuit patterns on the substrate.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: December 1, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young-Jee Yoon, Jung-Taek Lim, Tae-Sung Kim, Chung-Sam Jun, Sung-Hong Park
  • Patent number: 7498248
    Abstract: In the methods of compensating for an alignment error during fabrication of structures on semiconductor substrates, a conductive pattern structure is formed at a first position on a first semiconductor substrate. The conductive pattern structure includes a grid of first and second conductive patterns arranged as columns and intersecting rows with openings bounded therebetween. A first conductive contact structure overlaps the conductive pattern structure, and includes a plurality of spaced apart conductive contacts arranged as a grid of rows and columns that can be tilted at a non-zero angle relative to the grid of the conductive pattern structure. A determination is made as to whether the first conductive contact structure is electrically connected to the conductive pattern structure.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: March 3, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Taek Lim, Dong-Chun Lee, Young-Jee Yoon, Sung-Hong Park
  • Publication number: 20070120220
    Abstract: In the methods of compensating for an alignment error during fabrication of structures on semiconductor substrates, a conductive pattern structure is formed at a first position on a first semiconductor substrate. The conductive pattern structure includes a grid of first and second conductive patterns arranged as columns and intersecting rows with openings bounded therebetween. A first conductive contact structure overlaps the conductive pattern structure, and includes a plurality of spaced apart conductive contacts arranged as a grid of rows and columns that can be tilted at a non-zero angle relative to the grid of the conductive pattern structure. A determination is made as to whether the first conductive contact structure is electrically connected to the conductive pattern structure.
    Type: Application
    Filed: October 31, 2006
    Publication date: May 31, 2007
    Inventors: Jung-Taek Lim, Dong-Chun Lee, Young-Jee Yoon, Sung-Hong Park
  • Publication number: 20070120054
    Abstract: In an embodiment, a method of scanning a substrate, and a method and an apparatus for analyzing crystal characteristics are disclosed. A sequential scan on the scan areas using a first electron beam and a second electron beam are repeatedly performed. The electrons accumulated in the scan areas by the first electron beam are removed from the scan areas by the second electron beam. When a size of the scan area is substantially the same as a spot size of the first electron beam, adjacent scan areas partially overlap each other. When each of the scan areas is larger than a spot size of the first electron beam, the adjacent scan areas do not overlap each other. Images of the scan areas are generated using back-scattered electrons emitted from each of the scan areas by irradiating the first electron beam to analyze crystal characteristics of circuit patterns on the substrate.
    Type: Application
    Filed: November 29, 2006
    Publication date: May 31, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-Jee YOON, Jung-Taek LIM, Tae-Sung KIM, Chung-Sam JUN, Sung-Hong PARK
  • Publication number: 20070030479
    Abstract: In a method, with improved utilization of memory, of inspecting a defect on an object, the object is divided into a plurality of inspection regions. A plurality of levels is determined according to the numbers of defects, which are expected before detecting the defects, on the inspection regions. The defects on a selected inspection region are detected. The level including a range, which corresponds to the number of defects detected on the selected inspection region, is assigned to the selected inspection region with reference to the number of defects detected on the selected inspection region. The steps of detecting defects and assigning levels are repeated with respect to remaining inspection regions.
    Type: Application
    Filed: August 7, 2006
    Publication date: February 8, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung-Hong PARK, Young-Jee YOON, Jung-Taek LIM, Chung-Sam JUN