Patents by Inventor Susumu Sakio

Susumu Sakio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10934614
    Abstract: A vapor deposition mask (100) includes a resin layer (10) including a plurality of openings (11); a magnetic metal layer (20) located so as to overlap the resin layer, the magnetic metal layer including a mask portion (20a) having such a shape as to expose the plurality of openings and a peripheral portion (20b) located so as to enclose the mask portion; and a frame (30) secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: March 2, 2021
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Katsuhiko Kishimoto, Koshi Nishida, Kozo Yano
  • Patent number: 10927443
    Abstract: A deposition mask, which are capable of enhancing close contact between a substrate for vapor deposition and a peripheral region of each opening in the deposition mask during vapor deposition, suppressing the occurrences of film blurs and shadows during vapor deposition, and performing high definition patterning, a method for manufacturing the same, and a vapor deposition method using the deposition mask, are provided. A deposition mask (1) comprises a resin film (11) having a pattern of openings (12) for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition (2).
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: February 23, 2021
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Koshi Nishida, Katsuhiko Kishimoto
  • Publication number: 20210028364
    Abstract: A rigid material whose linear expansion coefficient is small and whose relative density is small is used to provide a vapor-deposition mask using a lightweight and highly dimension-accurate frame. A frame (15) of the vapor-deposition mask disclosed in accordance with the present embodiment is formed with a carbon-fiber reinforced plastic (CFRP).
    Type: Application
    Filed: December 25, 2017
    Publication date: January 28, 2021
    Applicants: SAKAI DISPLAY PRODUCTS CORPORATION, SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: KATSUHIKO KISHIMOTO, SUSUMU SAKIO
  • Patent number: 10886128
    Abstract: A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: January 5, 2021
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventor: Susumu Sakio
  • Patent number: 10840449
    Abstract: A method for producing a resin film by using a resin material and accurately forming a fine pattern as a vapor deposition mask or an optical element, a method for producing an organic EL display device, a base film for forming a fine pattern and a resin film with a supporting member are provided. A liquid resin material is applied onto a supporting member to form a resin coating film (S1), and a temperature of the resin coating film is increased to a temperature at which the resin material cures, to form a baked resin film (S2). Thereafter, a base film formed by the baked resin film attached to the supporting member is processed by irradiating with lasers, to form a resin film (1b) having a desired fine pattern and the supporting member (S3). Thereafter, the baked resin film on which the fine pattern is formed is peeled from the supporting member, and the resin film having the fine pattern is obtained (S5).
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: November 17, 2020
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Koshi Nishida, Kozo Yano, Katsuhiko Kishimoto, Susumu Sakio, Hideo Takei
  • Publication number: 20200303179
    Abstract: A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.
    Type: Application
    Filed: July 28, 2016
    Publication date: September 24, 2020
    Inventor: SUSUMU SAKIO
  • Publication number: 20200263288
    Abstract: A vapor deposition apparatus disclosed by an embodiment comprises: a vacuum chamber (8); a mask holder (15) for holding a deposition mask 1; a substrate holder (29) for holding a substrate for vapor deposition (2); an electromagnet (3) disposed above a surface; a vapor deposition source 5 for vaporizing or sublimating a vapor deposition material; and a heat pipe (7) including at least a heat absorption part (71) and a heat dissipation part (72), the heat absorption part being in contact with the electromagnet (3), and the heat dissipation part being derived to an outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in intimate contact with each other at an area of a contact part between the heat pipe (7) and the electromagnet (3), the area being equal to or more than a cross-sectional area within an inner perimeter of a coil (32).
    Type: Application
    Filed: April 21, 2020
    Publication date: August 20, 2020
    Inventors: Susumu Sakio, Katsuhiko Kishimoto
  • Publication number: 20200220114
    Abstract: A film formation apparatus according to an embodiment comprising: a substrate holder for holding a substrate in a standing position relative to the horizontal plane, the substrate having a vapor deposition surface on which a vapor deposition layer is formed; and an evaporation source to supply a vapor deposition material onto the vapor deposition surface while moving relative to the substrate holder upward and/or downward, the evaporation source being disposed in a region which the vapor deposition surface of the substrate held by the substrate holder is to face. The substrate holder is configured to hold the substrate in an inclined orientation relative to the vertical plane such that the upper end of the substrate is located away from the evaporation source. The apparatus further comprises an adjustment means for reducing a variation in the thickness of the vapor deposition layer, which results from the inclination of the substrate.
    Type: Application
    Filed: March 8, 2018
    Publication date: July 9, 2020
    Inventors: HIDENORI OGATA, SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Patent number: 10669620
    Abstract: A vapor deposition apparatus disclosed by an embodiment comprises: a vacuum chamber (8); a mask holder (15) for holding a deposition mask 1; a substrate holder (29) for holding a substrate for vapor deposition (2); an electromagnet (3) disposed above a surface; a vapor deposition source 5 for vaporizing or sublimating a vapor deposition material; and a heat pipe (7) including at least a heat absorption part (71) and a heat dissipation part (72), the heat absorption part being in contact with the electromagnet (3), and the heat dissipation part being derived to an outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in intimate contact with each other at an area of a contact part between the heat pipe (7) and the electromagnet (3), the area being equal to or more than a cross-sectional area within an inner perimeter of a coil (32).
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: June 2, 2020
    Assignee: Sakai Display Products Corporation
    Inventors: Susumu Sakio, Katsuhiko Kishimoto
  • Patent number: 10658591
    Abstract: A mask substrate includes a resin layer. A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the {(n+1)/2}th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a ?x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: May 19, 2020
    Assignee: Sakai Display Products Corporation
    Inventors: Katsuhiko Kishimoto, Susumu Sakio
  • Publication number: 20200123643
    Abstract: A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal body formed on the resin layer, the method including the steps of: (A) providing a magnetic metal body having at least one first opening; (B) providing a substrate; (C) forming a resin layer by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate, and then performing a heat treatment thereon; (D) securing the resin layer formed on the substrate on the magnetic metal body so as to cover the at least one first opening; (E) forming a plurality of second openings in a region of the resin layer that is located in the at least one first opening of the magnetic metal body; and (F) after the step (E), removing the substrate from the resin layer.
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Inventors: Koshi NISHIDA, Susumu SAKIO, Katsuhiko KISHIMOTO
  • Patent number: 10557191
    Abstract: A method for manufacturing a vapor deposition mask (100) including a resin layer (10), and a magnetic metal body (20) formed on the resin layer (10), the method including the steps of: (A) providing a magnetic metal body (20) having at least one first opening (25); (B) providing a substrate (60); (C) forming a resin layer (10) by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate (60), and then performing a heat treatment thereon; (D) securing the resin layer (10) formed on the substrate (60) on the magnetic metal body (20) so as to cover the at least one first opening (25); (E) forming a plurality of second openings (13) in a region of the resin layer (10) that is located in the at least one first opening (25) of the magnetic metal body (20); and (F) after the step (E), removing the substrate (60) from the resin layer (10).
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: February 11, 2020
    Assignee: Sakai Display Products Corporation
    Inventors: Koshi Nishida, Susumu Sakio, Katsuhiko Kishimoto
  • Publication number: 20200020862
    Abstract: A mask substrate includes a resin layer. A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the {(n+1)/2}th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a ?x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns.
    Type: Application
    Filed: August 22, 2019
    Publication date: January 16, 2020
    Inventors: Katsuhiko KISHIMOTO, Susumu SAKIO
  • Patent number: 10513770
    Abstract: Provided are a vapor deposition apparatus, a vapor deposition method, and a method of manufacturing an organic EL display apparatus which can prevent heat generation of a magnet chuck by using the magnet chuck that strongly attracts a deposition mask to dispose a substrate for vapor deposition and the deposition mask in proximity to each other during vapor deposition, while being less influenced by any magnetic field during alignment between the substrate for vapor deposition and the deposition mask. In the vapor deposition apparatus, a magnet chuck (3) includes a permanent magnet (3A) and an electromagnet (3B).
    Type: Grant
    Filed: July 25, 2019
    Date of Patent: December 24, 2019
    Assignee: Sakai Display Products Corporation
    Inventors: Katsuhiko Kishimoto, Susumu Sakio
  • Patent number: 10501841
    Abstract: A deposition mask capable of performing high-definition patterning while suppressing position gap between a substrate for vapor deposition and an opening arrangement of the deposition mask during vapor deposition and a manufacturing method thereof are provided. A deposition mask (1) includes a resin film (2) having an opening (4) pattern for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition. The deposition mask (1) includes a low-emissivity layer (5) whose emissivity is lower than that of the resin film (2), which is formed at least partly on a surface of the resin film (2) facing a vapor deposition source, thereby suppressing temperature rise of the resin film (2) due to heat radiated from the vapor deposition source.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: December 10, 2019
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Katsuhiko Kishimoto
  • Publication number: 20190345598
    Abstract: Provided are a vapor deposition apparatus, a vapor deposition method, and a method of manufacturing an organic EL display apparatus which can prevent heat generation of a magnet chuck by using the magnet chuck that strongly attracts a deposition mask to dispose a substrate for vapor deposition and the deposition mask in proximity to each other during vapor deposition, while being less influenced by any magnetic field during alignment between the substrate for vapor deposition and the deposition mask. In the vapor deposition apparatus, a magnet chuck (3) includes a permanent magnet (3A) and an electromagnet (3B).
    Type: Application
    Filed: July 25, 2019
    Publication date: November 14, 2019
    Inventors: Katsuhiko KISHIMOTO, Susumu SAKIO
  • Patent number: 10439138
    Abstract: A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the ((n+1)/2)th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a ?x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns. The steps B and C are performed after the step A.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: October 8, 2019
    Assignee: Sakai Display Products Corporation
    Inventors: Katsuhiko Kishimoto, Susumu Sakio
  • Patent number: 10422029
    Abstract: Provided are a vapor deposition apparatus, a vapor deposition method, and a method of manufacturing an organic EL display apparatus which can prevent heat generation of a magnet chuck by using the magnet chuck that strongly attracts a deposition mask to dispose a substrate for vapor deposition and the deposition mask in proximity to each other during vapor deposition, while being less influenced by any magnetic field during alignment between the substrate for vapor deposition and the deposition mask. In the vapor deposition apparatus, a magnet chuck (3) includes a permanent magnet (3A) and an electromagnet (3B).
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: September 24, 2019
    Assignee: SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: Katsuhiko Kishimoto, Susumu Sakio
  • Publication number: 20190249289
    Abstract: A vapor deposition apparatus disclosed by an embodiment comprises: a vacuum chamber (8); a mask holder (15) for holding a deposition mask 1; a substrate holder (29) for holding a substrate for vapor deposition (2); an electromagnet (3) disposed above a surface; a vapor deposition source 5 for vaporizing or sublimating a vapor deposition material; and a heat pipe (7) including at least a heat absorption part (71) and a heat dissipation part (72), the heat absorption part being in contact with the electromagnet (3), and the heat dissipation part being derived to an outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in intimate contact with each other at an area of a contact part between the heat pipe (7) and the electromagnet (3), the area being equal to or more than a cross-sectional area within an inner perimeter of a coil (32).
    Type: Application
    Filed: August 21, 2017
    Publication date: August 15, 2019
    Inventors: Susumu SAKIO, Katsuhiko KISHIMOTO
  • Publication number: 20190249290
    Abstract: Provided are a vapor deposition apparatus, a vapor deposition method, and a method of manufacturing an organic EL display apparatus which can prevent heat generation of a magnet chuck by using the magnet chuck that strongly attracts a deposition mask to dispose a substrate for vapor deposition and the deposition mask in proximity to each other during vapor deposition, while being less influenced by any magnetic field during alignment between the substrate for vapor deposition and the deposition mask. In the vapor deposition apparatus, a magnet chuck (3) includes a permanent magnet (3A) and an electromagnet (3B).
    Type: Application
    Filed: August 21, 2017
    Publication date: August 15, 2019
    Inventors: Katsuhiko KISHIMOTO, Susumu SAKIO