Abstract: According to one embodiment, a controller writes either processed data or preprocessing data and flags into each page included in m pages. The processed data is data after first data translation of write data to be written into a relevant page. The preprocessing data is data before the first data translation of the write data to be written into the relevant page. Each of the flag at least represents whether or not the first data translation is performed for write data to be written into the relevant page.

Abstract: A controller executes a first data conversion for write data to be written into a first page. The first data conversion includes increasing a ratio of a number of a first value to a total number of pieces of data. The controller executes a second data conversion for write data to be written into a second page. The second data conversion includes increasing a ratio of the number of the second value to the total number of pieces of data.

Abstract: According to one embodiment, a controller writes either processed data or preprocessing data and flags into each page included in m pages. The processed data is data after first data translation of write data to be written into a relevant page. The preprocessing data is data before the first data translation of the write data to be written into the relevant page. Each of the flag at least represents whether or not the first data translation is performed for write data to be written into the relevant page.

Abstract: According to one embodiment, a controller executes a first data conversion for write data to be written into a first page. The first data conversion includes increasing a ratio of a number of a first value to a total number of pieces of data. The controller executes a second data conversion for write data to be written into a second page.

Abstract: According to an aspect of the present invention, there is provided a semiconductor device including: first and second blocks that each includes a word line group of first to N-th word lines, the word lines extending in a given direction, the word lines having a first width, the first and second blocks being adjacent to and in parallel with each other in a crossing direction so that an inter-block area is interposed therebetween and so that the word line groups are symmetrical with respect to the inter-block area; and a first wirings that are formed in a first wiring layer positioned above the word lines to have a second width wider than the first width and that connect a k-th word line of the first block and a k-th word line of the second block.

Abstract: According to an aspect of the present invention, there is provided a semiconductor device including: first and second blocks that each includes a word line group of first to N-th word lines, the word lines extending in a given direction, the word lines having a first width, the first and second blocks being adjacent to and in parallel with each other in a crossing direction so that an inter-block area is interposed therebetween and so that the word line groups are symmetrical with respect to the inter-block area; and a first wirings that are formed in a first wiring layer positioned above the word lines to have a second width wider than the first width and that connect a k-th word line of the first block and a k-th word line of the second block.

Abstract: A semiconductor device including a semiconductor substrate, a memory cell transistor formed in a memory cell region of the semiconductor substrate; a transistor formed in a peripheral circuit region of the semiconductor substrate and having an LDD (Lightly Doped Drain) structure; and the memory cell transistor has a same film thickness for an insulating film formed in a source/drain region and an insulating film formed or a gate electrode sidewall; and the transistor having the LDD structure is provided with a spacer insulating film on the gate electrode sidewall.