Patents by Inventor Sybren J. Sijbrandij

Sybren J. Sijbrandij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10037862
    Abstract: A charged particle detecting device includes: a holding structure; a first charged particle detector at the terminal portion of the holding structure; a second charged particle detector at the terminal portion of the holding structure; a detector head at the terminal portion of the holding structure; and a first electrode which is transmissive for the first and second species of charged particles covering an entrance opening of the detector head.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: July 31, 2018
    Assignee: Carl Zeiss Microscopy, LLC
    Inventors: Sybren J. Sijbrandij, John A. Notte, IV, Raymond Hill
  • Publication number: 20170032925
    Abstract: A charged particle detecting device is disclosed which includes: a holding structure; a first charged particle detector at the terminal portion of the holding structure, the first charged particle detector being configured to generate a first electrical signal when a first species of charged particles impinges on the first charged particle detector; a second charged particle detector at the terminal portion of the holding structure, the second charged particle detector is configured to generate a second electrical signal when a second species of charged particles impinges on the second charged particle detector; a detector head at the terminal portion of the holding structure, the detector head defining a hollow volume within which a particle entrance surface of the first charged particle detector and a particle entrance surface of the second charged particle detector are arranged; and a first electrode which is transmissive for the first and second species of charged particles covering an entrance opening of
    Type: Application
    Filed: May 24, 2016
    Publication date: February 2, 2017
    Inventors: Sybren J. Sijbrandij, John A. Notte, IV, Raymond Hill
  • Patent number: 7727681
    Abstract: Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.
    Type: Grant
    Filed: January 16, 2004
    Date of Patent: June 1, 2010
    Assignee: FEI Company
    Inventors: Diane K. Stewart, J. David Casey, Jr., Joan Williams Casey, legal representative, John Beaty, Christian R. Musil, Steven Berger, Sybren J. Sijbrandij
  • Publication number: 20040226814
    Abstract: Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.
    Type: Application
    Filed: January 16, 2004
    Publication date: November 18, 2004
    Inventors: Diane K. Stewart, J. David Casey, John Beaty, Christian R. Musil, Steven Berger, Sybren J. Sijbrandij, Joan Williams Casey