Abstract: A curved portion at an inner circumferential face on a bend direction inside of a bend has a circular arc shape. By configuring the curved portion with a circular arc shape, a recess, serving as an example of a cross-sectional area enlargement portion that enlarges the cross-sectional area of a flow path of a pipe body running along a direction of an axial line 13, is formed in the inner circumferential face on the bend direction inside of the bend.

Abstract: A curved tube structure, including: a tube main body including a bent portion at one portion in an axis line direction; and an enlarged cross-section portion formed along the axis line direction of the tube main body in an inner periphery inside a bending direction of the bent portion for enlarging a cross-section area of the tube main body.

Abstract: A curved portion at an inner circumferential face on a bend direction inside of a bend has a circular arc shape. By configuring the curved portion with a circular arc shape, a recess, serving as an example of a cross-sectional area enlargement portion that enlarges the cross-sectional area of a flow path of a pipe body running along a direction of an axial line 13, is formed in the inner circumferential face on the bend direction inside of the bend.

Abstract: A curved tube structure, including: a tube main body including a bent portion at one portion in an axis line direction; and an enlarged cross-section portion formed along the axis line direction of the tube main body in an inner periphery inside a bending direction of the bent portion for enlarging a cross-section area of the tube main body.

Abstract: A dryer for an air suspension for a vehicle, includes a housing having an inlet port and an outlet port, a desiccant disposed between first and second filters within the housing, and a guide member including a shielding cylinder portion and a plate portion having plural communication holes, wherein the guide member is disposed between the inlet port and the first filter positioned closer to the inlet port, supports the first filter and the desiccant and guides a fluid to the desiccant, the shielding cylinder portion includes an opening and forms a flow passage for guiding the fluid, the fluid is guided to the desiccant from the inlet port via the shielding cylinder portion, and the flow passage and the communication holes, so that the fluid is dried by the desiccant and is then discharged from the dryer as a dry air to the air suspension for the vehicle.

Abstract: A dryer for an air suspension for a vehicle, includes a housing having an inlet port and an outlet port, a desiccant disposed between first and second filters within the housing, and a guide member including a shielding cylinder portion and a plate portion having plural communication holes, wherein the guide member is disposed between the inlet port and the first filter positioned closer to the inlet port, supports the first filter and the desiccant and guides a fluid to the desiccant, the shielding cylinder portion includes an opening and forms a flow passage for guiding the fluid, the fluid is guided to the desiccant from the inlet port via the shielding cylinder portion, and the flow passage and the communication holes, so that the fluid is dried by the desiccant and is then discharged from the dryer as a dry air to the air suspension for the vehicle.

Abstract: The invention is directed to spontaneously immortalized pancreatic duct cells and methods for generating pancreatic endocrine cells from spontaneously immortalized pancreatic duct cells that express the transcription factors Pdx1 and FoxO1. The invention also provides for methods for treating beta cell failure, the method comprising administering to a subject an effective amount of spontaneously immortalized pancreatic duct cells expressing a mutated version FoxO1.

Abstract: A polishing composition comprising the following components (a) to (g): (a) an abrasive which is at least one member selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide and titanium oxide, (b) a polyalkyleneimine, (c) at least one member selected from the group consisting of guinaldic acid and its derivatives, (d) at least one member selected from the group consisting of glycine, ?-alanine, histidine and their derivatives, (e) at least one member selected from the group consisting of benzotriazole and its derivatives, (f) hydrogen peroxide, and (g) water.

Abstract: The method of polishing a copper layer of a substrate is capable of improving a stock removal rate, etc. The method comprises the steps of: supplying a substrate onto an polishing pad of an polishing plate with a copper layer facing the polishing pad; pressing the substrate onto the polishing pad, with a backing pad, by a press head; relatively rotating the press head with respect to the polishing plate, with supplying polishing slurry onto the polishing pad. The backing pad is made of a material whose Asker C hardness is 75-95 and whose compressibility is 10% or less. The polishing slurry includes a chelating agent for chelating copper, an etching agent for etching the surface of copper layer, an oxidizing agent for oxidizing the surface of copper layer, and water.

Abstract: A polishing composition comprising: (a) at least one abrasive selected from the group consisting of silicon dioxide and aluminum oxide, (b) at least one organic compound selected from the group consisting of a polyethylene oxide, a polypropylene oxide, a polyoxyethylene alkyl ether, a polyoxypropylene alkyl ether, a polyoxyethylenepolyoxypropylene alkyl ether and a polyoxyalkylene addition polymer having a C≡C triple bond, represented by the formula (1): wherein each of R1 to R6 is H or a C1-10 alkyl group, each of X and Y is an ethyleneoxy group or a propyleneoxy group, and each of m and n is a positive number of from 1 to 20, (c) at least one polishing accelerating compound selected from the group consisting of citric acid, oxalic acid, tartaric acid, glycine, &agr;-alanine and histidine, (d) at least one anticorrosive selected from the group consisting of benzotriazole, benzimidazole, triazole, imidazole and tolyltriazole, (e) hydrogen peroxide, and (f) water.

Abstract: The method of polishing a copper layer of a substrate is capable of improving a stock removal rate, etc. The method comprises the steps of: supplying a substrate onto an polishing pad of an polishing plate with a copper layer facing the polishing pad; pressing the substrate onto the polishing pad, with a backing pad, by a press head; relatively rotating the press head with respect to the polishing plate, with supplying polishing slurry onto the polishing pad. The backing pad is made of a material whose Asker C hardness is 75-95 and whose compressibility is 10% or less. The polishing slurry includes a chelating agent for chelating copper, an etching agent for etching the surface of copper layer, an oxidizing agent for oxidizing the surface of copper layer, and water.

Abstract: A polishing composition comprising:

Abstract: A polishing composition comprising: (a) an abrasives (b) a compound to form a chelate with copper ions (c) a compound to provide a protective layer-forming function to a copper layer, (d) hydrogen peroxide, and (e) water, wherein the abrasive of component (a) has a primary particle size within a range of from 50 to 120 nm.

Abstract: A polishing composition comprising the following components: (a) an abrasive, (b) &agr;-alanine, (c) hydrogen peroxide, and (d) water.

Abstract: A polishing composition comprising the following components (a) to (g):

Abstract: A polishing composition comprising:

Abstract: Object: To provide a polishing composition which is capable of polishing a tantalum-containing compound at a high stock removal rate and whereby the copper surface after polishing is scarcely corroded, and to provide a polishing process where dishing can be minimized. Means to accomplish the object: A polishing composition comprising an abrasive, oxalic acid, an ethylenediamine derivative, a benzotriazole derivative and water and not containing an oxidizing agent, and a polishing composition comprising an abrasive, oxalic acid, an ethylenediamine derivative, a benzotriazole derivative, water and hydrogen peroxide.

Abstract: A polishing composition comprising the following components:(a) an abrasive,(b) an oxidizing agent capable of oxidizing tantalum,(c) a reducing agent capable of reducing tantalum oxide, and(d) water.