Patents by Inventor Tadanori Inoue

Tadanori Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6260494
    Abstract: A sewing machine with a dust removing device prevents trouble such as faulty sewing caused when dust including waste thread and waste cloth is collected under a throat plate, in performing, for example, interlock stitch sewing by an overlock sewing machine. Specifically, an upward air introducing path is provided, through which the cooling airflow generated by a cooling fan actuated during sewing operation is fed to an air introducing path for oil cooling underneath a lubricating oil storage part, and, through which the cooling airflow passing through the air introducing path for oil cooling is blown up from the underside of a frame to a needle location of the throat plate, in order to blow up the dust. An opening of one end of a suction pipe for collecting dust attached to the frame is disposed sidewise above the throat plate.
    Type: Grant
    Filed: May 5, 2000
    Date of Patent: July 17, 2001
    Assignee: Yamato Sewing Machine Seizo Co., Ltd.
    Inventors: Tadanori Inoue, Yoshihide Shimizu
  • Patent number: 6257158
    Abstract: The invention provides a sewing machine with uncurling device comprising a separating plate and a suction tube, the separating plate is placed in front of the needle drop point and it separates upper and lower fabrics fed to a needle drop point with their respective edge hems overlapped, and the suction tube has an air-intake with its size covering across upper and lower surfaces of the separating plate and it straightens curls at separated edge hems of the both fabrics by air flow sucked into the suction tube through the air-intake. As the overlapped edge hems of the both fabrics are fed into the needle drop point, the curls at the edge hems are reliably straightened regardless of the shape thereof. Therefore, it eliminates troublesome manual labor for straightening the curls before feeding of the fabrics.
    Type: Grant
    Filed: May 4, 2000
    Date of Patent: July 10, 2001
    Assignee: Yamato Mishin Seizo Kabushiki Kaisha
    Inventors: Yoshiyuki Asazuma, Tadanori Inoue
  • Patent number: 4297945
    Abstract: Relieved pattern of a resin original pattern plate, which does not exhibit fluidity at transferring temperature and possesses elastic modulus no smaller than 10 kg/cm.sup.2, preferably no smaller than 100 kg/cm.sup.2, is transferred onto thermoplastic resin material having fluidity at the transferring temperature (ASTM D1238, load 21.6 kg) of at least 0.01 dg/min, preferably at least 0.1 dg/min, by pressing the thermoplastic resin material to the original pattern plate under a pressure condition where elastic deformation of the original pattern plate is kept within 10%. The resin original pattern plate is prepared by controlling the photo-polymerizable resin composition to adjust its crosslink-ability and then photo-polymerizing, whereby the resulting resin original pattern plate possesses an elastic modulus of 10 kg/cm.sup.2 or higher at transferring temperature.
    Type: Grant
    Filed: March 9, 1979
    Date of Patent: November 3, 1981
    Assignee: Sumitomo Chemical Company, Ltd.
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura
  • Patent number: 4247621
    Abstract: An original pattern plate obtained by the use of a photo-sensitive resin composition comprising:(A) an unsaturated polyester having an acid value of from 10 to 40 and having not less than 50% by mole of unsaturated acids in the acid component,(B) a photo-polymerizable, ethylenically unsaturated compound which essentially contains a compound having a photo-polymerizable, ethylenically unsaturated linkage and at least one hydroxyl group,(C) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6)(CH.sub.2 OH).sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m+n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4,(D) a photo-polymerization initiator, and(E) a thermal polymerization inhibitor,the weight proportion of the components (A), (B) and (C) satisfying the relationships of the following equations: 1/5.ltoreq.B/(A+B).ltoreq.3/5 and 1/50.ltoreq.C/(A+B+C).ltoreq.
    Type: Grant
    Filed: March 26, 1976
    Date of Patent: January 27, 1981
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura, Akihiro Furuta
  • Patent number: 4193798
    Abstract: A printing resin plate is produced by adoption of such process and apparatus that a negative film is placed on a transparent plate positioned on a frame stand; a liquid photopolymerizable resin is applied through a cover film onto said negative film to form a layer; the frame stand and/or a means having a belt, which has been extended between at least two rolls and which can rotate synchronously with the frame stand, are moved to insert a support into a space between the liquid photopolymerizable resin layer on the frame stand and the lower surface of said belt; the frame stand is moved to below the lower surface of the belt while pressing the support with the lower surface of the belt by the downward pressure of the belt thereby closely adhering the support onto the liquid photopolymerizable resin layer; and then the liquid photopolymerizable resin layer is exposed to light.
    Type: Grant
    Filed: May 31, 1977
    Date of Patent: March 18, 1980
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue
  • Patent number: 4156389
    Abstract: Relieved pattern of a resin original pattern plate, which does not exhibit fluidity at transferring temperature and possesses elastic modulus no smaller than 10 kg/cm.sup.2, preferably no smaller than 100 kg/cm.sup.2, is transferred onto thermoplastic resin material having fluidity at the transferring temperature (ASTM D1238, load 21.6 kg) of at least 0.01 dg/min, preferably at least 0.1 dg/min, by pressing the thermoplastic resin material to the original pattern plate under a pressure condition where elastic deformation of the original pattern plate is kept within 10%. The resin original pattern plate is prepared by controlling the photopolymerizable resin composition to adjust its cross-linkability and then photo-polymerizing, whereby the resulting resin original pattern plate possesses an elastic modulus of 10 kg/cm.sup.2 or higher at transferring temperature.
    Type: Grant
    Filed: May 3, 1976
    Date of Patent: May 29, 1979
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura
  • Patent number: 4140605
    Abstract: A crosslinkable composition comprising:(I) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6) (CH.sub.2 OH.sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m + n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4;(II) a compound having at least two functional groups condensable with the component (I) and an average molecular weight of not less than 1,000;(III) a compound having an ethylenically un-unsaturated linkage photopolymerizable by actinic light;(IV) a photopolymerization initiator; and(V) a thermal polymerization inhibitor.
    Type: Grant
    Filed: April 21, 1977
    Date of Patent: February 20, 1979
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura, Akihiro Furuta
  • Patent number: 4079159
    Abstract: A novel original plate for producing matrix which has improved strength, mold releasability and dimensional stability during production of matrices consists of a laminated structure of a metal base, a bonding layer, a relief supporting layer and a relief of a photo-polymerized resin, said relief supporting layer comprising a resin similar to that of the relief or having a high affinity with that of the relief.
    Type: Grant
    Filed: August 11, 1975
    Date of Patent: March 14, 1978
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue