Patents by Inventor Tadashi Fukuzawa

Tadashi Fukuzawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5170226
    Abstract: Disclosed is a new method suitable for making highly integrated quantum wire arrays, quantum dot arrays in a single crystal compound semiconductor and FETs of less than 0.1 micron gate length. This makes it possible to construct a high-performance electronic device with high speed and low power consumption, using a combination of low-temperature-growth molecular beam epitaxy (LTG-MBE) and focused ion beam (FIB) implantation. The compound semiconductor (GaAs) epitaxial layers, which are made by LTG-MBE, are used as targets of Ga FIB implantation to make Ga wire or dot arrays. Precipitation of arsenic microcrystals, which are initially embedded in a single crystal GaAs layer and act as Schottky barriers, are typically observed in an LTG GaAs layer. A thermal annealing process, after implantation, changes the arsenic microcrystals to GaAs crystals if the arsenic microcrystals are in the region in which the Ga ions are implanted.
    Type: Grant
    Filed: May 17, 1991
    Date of Patent: December 8, 1992
    Assignee: International Business Machines Corporation
    Inventors: Tadashi Fukuzawa, Hiro Munekata
  • Patent number: 5157543
    Abstract: An apparatus for changing the direction of an optical beam comprises a thin film grating deflector; an optical energy source for providing optical energy to strike the deflector at a first angle with respect to gratings of the deflector and to exit the deflector at a second angle with respect to the gratings; and elements for applying a voltage to the deflector to vary the second angle. The optical energy source preferably comprises a laser diode; and a collimator for coupling energy from the laser diode to the grating deflector. The grating deflector is a planar waveguide including a plurality of stacked quantum wells formed of GaAs separated by barriers of AlGaAs. Optical energy provided to the grating deflector in a first direction is deflected in a second direction. These directions define a plane in which the waveguide is disposed. The quantum wells are stacked in a direction perpendicular to a plane of the waveguide.
    Type: Grant
    Filed: December 10, 1990
    Date of Patent: October 20, 1992
    Assignee: International Business Machines Corporation
    Inventors: Tadashi Fukuzawa, Satoru S. Kano, Yutaka Takahashi
  • Patent number: 5091980
    Abstract: A device structure is provided for optical modulation using a quantum interference effect in an excited state of electron-systems. The optical modulation is performed by causing the effect of modulation on the excited state of electron-systems represented by excitons to be executed on light via the state in which the light and the excited state of electron-systems represented by the excitonic polaritons are coupled.
    Type: Grant
    Filed: September 11, 1990
    Date of Patent: February 25, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Kensuke Ogawa, Toshio Katsuyama, Tadashi Fukuzawa
  • Patent number: 5001536
    Abstract: In a semiconductor device having, at least, a first semiconductor layer which contains substantially no impurity, a second semiconductor layer which has a band gap greater than that of the first semiconductor layer and which contains an impurity, an interface between the first and second semiconductor layers forming a heterojunction, at least one pair of electrodes which are electronically connected with the first semiconductor layer, and means to control carriers developing at the heterojunction interface; a semiconductor device characterized in that the first semiconductor layer is a Ge layer, while the second semiconductor layer is a group III-V compound semiconductor layer.
    Type: Grant
    Filed: January 17, 1989
    Date of Patent: March 19, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Michiharu Nakamura, Eizaburo Yamada
  • Patent number: 4957337
    Abstract: A device structure is provided for optical modulation using a quantum interference effect in an excited state of electron-systems. The optical modulation is performed by causing the effect of modulation on the excited state of electron-systems represented by excitons to be executed on light via the state in which the light and the excited state of electron-systems represented by the excitonic polaritons are coupled.
    Type: Grant
    Filed: May 5, 1989
    Date of Patent: September 18, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Kensuke Ogawa, Toshio Katsuyama, Tadashi Fukuzawa
  • Patent number: 4933728
    Abstract: A semiconductor optical device in which a hetero-structure is constructed by sandwiching a semiconductor layer including a thin film made of a semiconductor or insulator between semiconductors having a larger band gap than that of the thin film so that the electron-hole pairs generated through the thin film may recombine by the tunnel effect to emit an optical beam. The optical device is equipped with electrodes for controlling the probability of said recombination.
    Type: Grant
    Filed: February 13, 1989
    Date of Patent: June 12, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Eizaburo Yamada, Kenji Hiruma, Hiroyoshi Matsumura
  • Patent number: 4881238
    Abstract: In a well-known semiconductor laser, a multiple quantum well type active layer consisting of barrier layers and active layers or well layers, each of which has a thickness less than the de Broglie wavelength of electrons, is doped with an impurity, and the impurity density is made higher in the barrier layer than in the well layer. Further, in a case where the multiple quantum well active layer is held between p-type and n-type cladding layers, the well layer is undoped, the part of the barrier layer lying in contact with the well layer is undoped, and the other part of the barrier layer close to the p-type cladding layer is put into the n-conductivity type while that of the barrier layer close to the n-type cladding layer is put into the p-conductivity type.
    Type: Grant
    Filed: July 22, 1986
    Date of Patent: November 14, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Naoki Chinone, Kazuhisa Uomi, Tadashi Fukuzawa, Hideaki Matsueda, Takashi Kajimura
  • Patent number: 4881235
    Abstract: In a well-known semiconductor laser, a multiple quantum well type active layer consisting of barrier layers and active layers or well layers, each of which has a thickness less than the de Broglie wavelength of electrons, is doped with an impurity, and the impurity density is made higher in the barrier layer than in the well layer. Further, in a case where the multiple quantum well active layer is held between p-type and n-type cladding layers, the well layer is undoped, the part of the barrier layer lying in contact with the well layer is undoped, and the other part of the barrier layer close to the p-type cladding layer is put into the n-conductivity type while that of the barrier layer close to the n-type cladding layer is put into the n-conductivity type. Desirably, the impurity density should range from about 1.times.10.sup.18 to about 1.times.10.sup.19 cm.sup.- 3.
    Type: Grant
    Filed: April 23, 1987
    Date of Patent: November 14, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Naoki Chinone, Kazuhisa Uomi, Tadashi Fukuzawa, Hideaki Matsueda, Takashi Kajimura, Tsukuru Ohtoshi
  • Patent number: 4861130
    Abstract: An optical device utilizes a polariton substance and utilizes the absorption wavelength band of excitonic polaritons. Further, an external stimulus such as electric field, magnetic field, stress, current or electromagnetic wave (light) is continuously or intermittently given to the polariton substance, thereby to modulate light which enters the optical device. Thus, a modulating operation of ultra-high speed is possible.
    Type: Grant
    Filed: October 26, 1987
    Date of Patent: August 29, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Toshio Katsuyama, Hiroyoshi Matsumura, Hiroaki Inoue, Tadashi Fukuzawa, Naoki Chinone
  • Patent number: 4847573
    Abstract: An optical modulator which utilizes the Stark effect according to which the absorption spectra change if an electric field is applied to the excitons. A thin film of a suitable thickness composed of a semiconductor and an insulator or composed of either one of them, is formed between a group of electrons and a group of positive holes that constitute excitons, so that the excitons are stabilized. The optical modulator performs the modulation at high speeds maintaining a high efficiency.
    Type: Grant
    Filed: May 7, 1986
    Date of Patent: July 11, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Eizaburo Yamada, Kenji Hiruma, Hiroyoshi Matsumura
  • Patent number: 4835578
    Abstract: A semiconductor device comprises a first superlattice layer consisting of a first semiconductor layer that contains impurities and a second semiconductor layer that contains impurities at a low concentration, said first superlattice layer being formed on a semiconductor substrate; and a second superlattice layer that covers that exposed side walls of said first superlattice layer. A disordered region is formed in the vicinity of the first semiconductor layer of the second superlattice layer in order to realize quantum wires with the conventional manufacturing process. This makes it possible to easily fabricate a laser device, a light-emitting diode and a transistor having quantum wires to enhance their performance.
    Type: Grant
    Filed: December 30, 1987
    Date of Patent: May 30, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Tsukuru Ohtoshi, Kazuhisa Uomi, Tadashi Fukuzawa, Naoki Chinone
  • Patent number: 4827483
    Abstract: A semiconductor laser device including at least one of a laser active layer formed of a super lattice and an optical guide layer formed of another super lattice is disclosed in which part of at least one of the super lattices is converted into a mixed crystal by the impurity induced disordering based upon one of impurity diffusion and impurity ion implantation, to divide the super lattice into a first region formed of the mixed crystal and a second region having the super lattice structure, the width of the second region in directions perpendicular to the lengthwise direction of a laser cavity varies along the above lengthwise direction, and the width of a laser excitation region is smaller than the mean value of the width of the second region, to generate laser oscillation having a single transverse mode and a multi longitudinal mode. Thus, the semiconductor laser device emits a laser beam which is small in astigmatism and low in optical feedback noise.
    Type: Grant
    Filed: August 11, 1986
    Date of Patent: May 2, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Naoki Chinone, Shin'ichi Nakatsuka, Katsutoshi Saito, Takashi Kajimura, Yuuichi Ono
  • Patent number: 4784451
    Abstract: The present invention provides a waveguide type optical switch which has a high extinction ratio and can be driven efficiently at a low voltage or a low current injection. Where the waveguide type optical switch is used as a reflection type optical switch, the switch section is of current confinement structure, and where it is used as a directional coupler type optical switch, the pn junction is formed in the position where the optical electric field takes the maximum value for the fundamental mode of the light propagating in the waveguide.
    Type: Grant
    Filed: August 5, 1985
    Date of Patent: November 15, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Hitoshi Nakamura, Tadashi Fukuzawa, Koji Ishida, Hiroyoshi Matumura, Kenji Hiruma, Hiroaki Inoue
  • Patent number: 4783425
    Abstract: A p-GaAlAs cladding layer is exposed to the air if a groove of the form of a stripe is formed by chemical etching in an n-GaAs layer that serves as a current confinement layer on the p-GaAlAs cladding layer, the groove being so formed as to reach the cladding layer. The GaAlAs is oxidized so easily that an unstable degradation layer is formed on the surface thereof. To solve this problem according to the prior art, an undoped GaAs layer that serves as a cover layer is formed on the p-GaAlAs cladding layer, the n-GaAs layer is formed, and the etching is effected so that the undoped GaAs layer is simply exposed. The undoped GaAs layer is then heated in the MBE apparatus while being irradiated with the As molecular beam and is thermally etched. Therefore, the cladding layer is exposed in vacuum and the p-GaAlAs layer is formed thereon. However, this method is not suited for mass-production since the thermal etching is unstable and it needs the MBE apparatus of a very high degree of vacuum.
    Type: Grant
    Filed: October 30, 1986
    Date of Patent: November 8, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Yuichi Ono, Shinichi Nakatsuka, Takashi Kajimura
  • Patent number: 4775980
    Abstract: A distributed feedback semiconductor laser provided with a grating which effects optical feedback by means of periodic corrugation disposed inside an optical resonator. The optical resonator has at least two regions having different Bragg wavelengths, and these regions are arranged longitudinally in the direction of an optical axis. The laser device can realize stable single longitudinal mode oscillation through variation of the refractive indexes of the regions nonuniformly around an average value.
    Type: Grant
    Filed: July 26, 1985
    Date of Patent: October 4, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Naoki Chinone, Shinji Tsuji, Yoshihisa Fujisaki, Yasutoshi Kashiwada, Motohisa Hirao, Hitoshi Nakamura, Akio Oishi, Kenji Hiruma, Tadashi Fukuzawa, Hiroyoshi Matumura
  • Patent number: 4772925
    Abstract: The semiconductor device of this invention consists at least of a laminate of a semi-insulating or p-type first semiconductor layer having a forbidden band width E.sub.g1, an undoped or p.sup.- -type second semiconductor layer having a forbidden band width E.sub.g2 and an n-type third semiconductor layer having forbidden band width E.sub.g3. The laminate is deposited on a predetermined semiconductor substrate and the forbidden band width has the relation E.sub.g2 <E.sub.g1, E.sub.g3. A pair of electrodes are so formed as to come into contact at least with the interface between the second and third semiconductor layers, and a control electrode, which forms a Schottky junction with the third semiconductor layer, is formed at a predetermined position interposed between the pair of electrodes. The semiconductor device has excellent pinch-off characteristic.
    Type: Grant
    Filed: November 26, 1986
    Date of Patent: September 20, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Ken Yamaguchi, Susumu Takahashi, Hisao Nakashima, Michiharu Nakamura
  • Patent number: 4752934
    Abstract: A semiconductor laser having such a structure that a laser structure including a laser active region of multi quantum well structure, cladding layers and a cap layer is formed on a substrate, is disclosed in which both end regions of the laser active region in the quantum well layer is converted into mixed crystal by impurity induced intermixing so that a multi quantum well active region is sandwiched between mixed crystal regions, and impurity diffused regions are formed between the surface of the crystal and the mixed crystal regions, to form a current path and to inject carriers into the multi quantum well region in a direction parallel to the laser active layer. Thus, the semiconductor laser can modulate laser oscillation at a very high frequency, and moreover is readily fabricated or integrated.
    Type: Grant
    Filed: August 20, 1986
    Date of Patent: June 21, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Naoki Chinone, Kazuhisa Uomi, Takashi Kajimura
  • Patent number: 4748132
    Abstract: As a process for fabricating uniform patterns fine enough to produce a quantum size effect, the use of electron halography is proposed. Disclosed examples employing a process are methods of manufacturing a semiconductors laser whose threshold current is approximately 1 mA, and a permeable transistor and bistable device whose response rates are 100 GHz.
    Type: Grant
    Filed: December 15, 1986
    Date of Patent: May 31, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Akira Tonomura, Naoki Chinone
  • Patent number: 4720836
    Abstract: The present invention relates to a semiconductor laser which oscillates in a single longitudinal mode and with a low threshold current and which exhibits a good mode stability against reflected light, and provides a structure of a distributed feedback semiconductor laser with modulation for a gain. The structure is such that gain producing regions are periodically arranged and that a substance transparent to laser radiation is buried between the regions. A layer including the gain regions is formed of a superlattice layer, and an impurity is diffused or implanted into periodic positions of the layer, whereby the transparent regions and the gain regions with little lattice damages can be readily formed.
    Type: Grant
    Filed: August 20, 1985
    Date of Patent: January 19, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Hiroyoshi Matsumura, Shinji Tsuji, Hitoshi Nakamura, Kenji Hiruma
  • Patent number: 4430741
    Abstract: Disclosed is a semiconductor laser device comprising a semiconductor assembly which serves to effect laser oscillation and in which first, second and third semiconductor layers are successively stacked on a predetermined semiconductor body, at least the first and third semiconductor layers being small in the refractive index relative to the second semiconductor layer and great in the forbidden band gap relative thereto and having conductivity types opposite to each other, and means to spread depletion regions within at least a part of a current path for effecting the laser oscillation and in a manner to intersect with the current path. A small-sized semiconductor laser device capable of fast modulation can be realized.
    Type: Grant
    Filed: January 15, 1981
    Date of Patent: February 7, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fukuzawa, Michiharu Nakamura, Susumu Takahashi