Patents by Inventor Tai T. Ngo
Tai T. Ngo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11821083Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: GrantFiled: December 28, 2021Date of Patent: November 21, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Publication number: 20220119942Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Applicant: Applied Materials, Inc.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 11230763Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: GrantFiled: January 16, 2020Date of Patent: January 25, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Publication number: 20200149161Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: ApplicationFiled: January 16, 2020Publication date: May 14, 2020Applicant: Applied Materials, Inc.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 10570511Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: GrantFiled: August 31, 2015Date of Patent: February 25, 2020Assignee: Applied Materials, Inc.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 9721757Abstract: A modular plasma source assembly for use with a processing chamber is described. The assembly includes an RF hot electrode with an end dielectric and a sliding ground connection positioned adjacent the sides of the electrode. A seal foil connects the sliding ground connection to the housing to provide a grounded sliding ground connection separated from the hot electrode by the end dielectric. A coaxial feed line passes through a conduit into the RF hot electrode isolated from the processing environment so that the coaxial RF feed line is at atmospheric pressure while the plasma processing region is at reduced pressure.Type: GrantFiled: May 31, 2016Date of Patent: August 1, 2017Assignee: Applied Materials, Inc.Inventors: John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins, Ren Liu
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Publication number: 20160276136Abstract: A modular plasma source assembly for use with a processing chamber is described. The assembly includes an RF hot electrode with an end dielectric and a sliding ground connection positioned adjacent the sides of the electrode. A seal foil connects the sliding ground connection to the housing to provide a grounded sliding ground connection separated from the hot electrode by the end dielectric. A coaxial feed line passes through a conduit into the RF hot electrode isolated from the processing environment so that the coaxial RF feed line is at atmospheric pressure while the plasma processing region is at reduced pressure.Type: ApplicationFiled: May 31, 2016Publication date: September 22, 2016Inventors: John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins, Ren Liu
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Patent number: 9355819Abstract: A modular plasma source assembly for use with a processing chamber is described. The assembly includes an RF hot electrode with an end dielectric and a sliding ground connection positioned adjacent the sides of the electrode. A seal foil connects the sliding ground connection to the housing to provide a grounded sliding ground connection separated from the hot electrode by the end dielectric. A coaxial feed line passes through a conduit into the RF hot electrode isolated from the processing environment so that the coaxial RF feed line is at atmospheric pressure while the plasma processing region is at reduced pressure.Type: GrantFiled: August 15, 2014Date of Patent: May 31, 2016Assignee: Applied Materials, Inc.Inventors: John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins, Ren Liu
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Publication number: 20160068953Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: ApplicationFiled: August 31, 2015Publication date: March 10, 2016Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 9175394Abstract: Embodiments of the invention relate to apparatus and methods for depositing materials on substrates during atomic layer deposition processes. In one embodiment, a chamber lid assembly comprises a channel having an upper portion and a lower portion, wherein the channel extends along a central axis, a housing having an inner region and at least partially defining two or more annular channels, an insert disposed in the inner region and defining the upper portion, the upper portion fluidly coupled with the two or more annular channels, and a tapered bottom surface extending from the bottom portion of the channel to a peripheral portion of the chamber lid assembly.Type: GrantFiled: March 8, 2011Date of Patent: November 3, 2015Assignee: APPLIED MATERIALS, INC.Inventors: Joseph Yudovsky, Anh N. Nguyen, Tai T. Ngo
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Publication number: 20150048739Abstract: A modular plasma source assembly for use with a processing chamber is described. The assembly includes an RF hot electrode with an end dielectric and a sliding ground connection positioned adjacent the sides of the electrode. A seal foil connects the sliding ground connection to the housing to provide a grounded sliding ground connection separated from the hot electrode by the end dielectric. A coaxial feed line passes through a conduit into the RF hot electrode isolated from the processing environment so that the coaxial RF feed line is at atmospheric pressure while the plasma processing region is at reduced pressure.Type: ApplicationFiled: August 15, 2014Publication date: February 19, 2015Inventors: John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins, Ren Liu
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Patent number: 8231431Abstract: The present invention generally relates to an edge deletion module positioned within an automated solar cell fabrication line. The edge deletion module may include a grinding wheel device for removing material from edge regions of a solar cell device and cleaning the edge regions of the solar cell device after removing the material. The edge deletion module may also include an abrasive element, a portion of which is ground as it is periodically, laterally advanced toward the grinding wheel device. A controller is provided for controlling the operation and function of various facets of the module.Type: GrantFiled: January 23, 2009Date of Patent: July 31, 2012Assignee: Applied Materials, Inc.Inventors: Dhruv Gajaria, Zhiyong Li, Gopalakrishna B. Prabhu, Yacov Elgar, John Visitacion, Yong Liu, Jeffrey S. Sullivan, Salvador Umotoy, Tai T. Ngo, Michael Marriott, Peter Crundwell, Vinay Shah, Ho Gene Choi, Dennis C. Pierce
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Publication number: 20110223334Abstract: Embodiments of the invention relate to apparatus and methods for depositing materials on substrates during atomic layer deposition processes. In one embodiment, a chamber lid assembly comprises a channel having an upper portion and a lower portion, wherein the channel extends along a central axis, a housing having an inner region and at least partially defining two or more annular channels, an insert disposed in the inner region and defining the upper portion, the upper portion fluidly coupled with the two or more annular channels, and a tapered bottom surface extending from the bottom portion of the channel to a peripheral portion of the chamber lid assembly.Type: ApplicationFiled: March 8, 2011Publication date: September 15, 2011Applicant: APPLIED MATERIALS, INC.Inventors: Joseph Yudovsky, Anh N. Nguyen, Tai T. Ngo
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Publication number: 20100305884Abstract: Methods of determining an amount of precursor in an ampoule have been provided herein. In some embodiments, a method for determining an amount of solid precursor in an ampoule may include determining a first pressure in an ampoule having a first volume partially filled with a solid precursor; flowing an amount of a first gas into the ampoule to establish a second pressure in the ampoule; determining a remaining portion of the first volume based on a relationship between the first pressure, the second pressure, and the amount of the first gas flowed into the ampoule; and determining the amount of solid precursor in the ampoule based on the first volume and the remaining portion of the first volume.Type: ApplicationFiled: May 17, 2010Publication date: December 2, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Joseph Yudovsky, Jeffrey Tobin, Patricia M. Liu, Faruk Gungor, Tai T. Ngo, Travis Tesch, Kenric Choi
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Patent number: 7779527Abstract: In a first aspect, an apparatus is provided for forming a scrubber brush assembly. The apparatus includes a mandrel adapted to be inserted into a scrubber brush so as to form a scrubber brush assembly, the mandrel having: a first end; a second end; and one or more position guides adjacent at least one of the first and second ends and adapted to position a scrubber brush on the mandrel. Numerous other aspects are provided.Type: GrantFiled: October 5, 2008Date of Patent: August 24, 2010Assignee: Applied Materials, Inc.Inventors: Joseph Yudovsky, Tai T Ngo, Leon Volfovski, Anne-Douce M P Coulin
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Publication number: 20090221217Abstract: The present invention generally relates to an edge deletion module positioned within an automated solar cell fabrication line. The edge deletion module may include a grinding wheel device for removing material from edge regions of a solar cell device and cleaning the edge regions of the solar cell device after removing the material. The edge deletion module may also include an abrasive element, a portion of which is ground as it is periodically, laterally advanced toward the grinding wheel device. A controller is provided for controlling the operation and function of various facets of the module.Type: ApplicationFiled: January 23, 2009Publication date: September 3, 2009Applicant: APPLIED MATERIALS, INC.Inventors: DHRUV GAJARIA, Zhiyong Li, Gopalakrishna B. Prabhu, Yacov Elgar, John Visitacion, Yong Liu, Jeffrey S. Sullivan, Salvador Umotoy, Tai T. Ngo, Michael Marriott, Peter Crundwell, Vinay Shah, Ho Gene Choi, Dennis C. Pierce
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Publication number: 20090031516Abstract: In a first aspect, an apparatus is provided for forming a scrubber brush assembly. The apparatus includes a mandrel adapted to be inserted into a scrubber brush so as to form a scrubber brush assembly, the mandrel having: a first end; a second end; and one or more position guides adjacent at least one of the first and second ends and adapted to position a scrubber brush on the mandrel. Numerous other aspects are provided.Type: ApplicationFiled: September 26, 2008Publication date: February 5, 2009Inventors: Joseph Yudovsky, Tai T. Ngo, Leon Volfovski, Anne-Douce MP. Coulin
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Publication number: 20090025197Abstract: In a first aspect, an apparatus is provided for forming a scrubber brush assembly. The apparatus includes a mandrel adapted to be inserted into a scrubber brush so as to form a scrubber brush assembly, the mandrel having: a first end; a second end; and one or more position guides adjacent at least one of the first and second ends and adapted to position a scrubber brush on the mandrel. Numerous other aspects are provided.Type: ApplicationFiled: October 5, 2008Publication date: January 29, 2009Inventors: Joseph Yudovsky, Tai T. Ngo, Leon Volfovski, Anne-Douce MP Coulin
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Patent number: 6464795Abstract: A support member for supporting a substrate in a process chamber, the support member having a substrate support surface with one or more isolated recessed areas. A vacuum channel and a gas channel are formed in the support member along a common plane and are coupled to a vacuum source and gas source respectively. The gas channel comprises two or more concentrically disposed annular gas channels encompassing the vacuum channel. The vacuum channel is coupled to the support surface, and in particular to the one or more recessed areas, by a plurality of conduits. A portion of the conduits is disposed diametrically exterior to at least one of the annular gas channels and communicates with the vacuum channel via bypass channels.Type: GrantFiled: May 3, 2000Date of Patent: October 15, 2002Assignee: Applied Materials, Inc.Inventors: Semyon Sherstinsky, Calvin Augason, Leonel A. Zuniga, Jun Zhao, Talex Sajoto, Leonid Selyutin, Joseph Yudovsky, Maitreyee Mahajani, Steve G. Ghanayem, Tai T. Ngo, Arnold Kholodenko