Patents by Inventor Taira Takase

Taira Takase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210267042
    Abstract: A plasma processing apparatus includes a cooling plate having a fixing surface to which an upper electrode is fixed, the cooling plate having, on the fixing surface, an electrostatic chuck configured to attract the upper electrode by an attraction force generated by an applied voltage; a power supply configured to apply the voltage to the electrostatic chuck; and a power supply controller configured to control the power supply such that an absolute value of the voltage applied to the electrostatic chuck is increased based on a degree of consumption of the upper electrode.
    Type: Application
    Filed: May 7, 2021
    Publication date: August 26, 2021
    Inventors: Yohei Uchida, Tetsuji Sato, Shojiro Yahata, Taira Takase
  • Patent number: 11032899
    Abstract: A plasma processing apparatus includes a cooling plate having a fixing surface to which an upper electrode is fixed, the cooling plate having, on the fixing surface, an electrostatic chuck configured to attract the upper electrode by an attraction force generated by an applied voltage; a power supply configured to apply the voltage to the electrostatic chuck; and a power supply controller configured to control the power supply such that an absolute value of the voltage applied to the electrostatic chuck is increased based on a degree of consumption of the upper electrode.
    Type: Grant
    Filed: September 10, 2019
    Date of Patent: June 8, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yohei Uchida, Tetsuji Sato, Shojiro Yahata, Taira Takase
  • Publication number: 20200343122
    Abstract: A mounting table includes a base member, having a rear surface and a front surface facing the rear surface, in which a coolant path is formed, a groove portion having a bottom surface within the base member being annularly formed on the front surface, the base member being divided into a cylindrical inner base member portion positioned at an inner side of the groove portion and an annular outer base member portion positioned at an outer side of the groove portion by the groove portion; an annular focus ring supported by the outer base member portion, the annular focus ring having, at an inner side surface thereof, a protrusion that is protruded radially and inwardly to cover the groove portion; a first heat transfer member provided between the mounting surface and the coolant path; and the second heat transfer member provided between the focus ring and the coolant path.
    Type: Application
    Filed: July 10, 2020
    Publication date: October 29, 2020
    Inventors: Kyouhei Yamamoto, Taira Takase
  • Patent number: 10727101
    Abstract: A mounting table includes a base member, having a rear surface and a front surface facing the rear surface, in which a coolant path is formed, a groove portion having a bottom surface within the base member being annularly formed on the front surface, the base member being divided into a cylindrical inner base member portion positioned at an inner side of the groove portion and an annular outer base member portion positioned at an outer side of the groove portion by the groove portion; an annular focus ring supported by the outer base member portion, the annular focus ring having, at an inner side surface thereof, a protrusion that is protruded radially and inwardly to cover the groove portion; a first heat transfer member provided between the mounting surface and the coolant path; and a second heat transfer member provided between the focus ring and the coolant path.
    Type: Grant
    Filed: January 28, 2014
    Date of Patent: July 28, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kyouhei Yamamoto, Taira Takase
  • Publication number: 20200107429
    Abstract: A plasma processing apparatus includes a cooling plate having a fixing surface to which an upper electrode is fixed, the cooling plate having, on the fixing surface, an electrostatic chuck configured to attract the upper electrode by an attraction force generated by an applied voltage; a power supply configured to apply the voltage to the electrostatic chuck; and a power supply controller configured to control the power supply such that an absolute value of the voltage applied to the electrostatic chuck is increased based on a degree of consumption of the upper electrode.
    Type: Application
    Filed: September 10, 2019
    Publication date: April 2, 2020
    Inventors: Yohei Uchida, Tetsuji Sato, Shojiro Yahata, Taira Takase
  • Publication number: 20140209245
    Abstract: A mounting table includes a base member, having a rear surface and a front surface facing the rear surface, in which a coolant path is formed, a groove portion having a bottom surface within the base member being annularly formed on the front surface, the base member being divided into a cylindrical inner base member portion positioned at an inner side of the groove portion and an annular outer base member portion positioned at an outer side of the groove portion by the groove portion; an annular focus ring supported by the outer base member portion, the annular focus ring having, at an inner side surface thereof, a protrusion that is protruded radially and inwardly to cover the groove portion; a first heat transfer member provided between the mounting surface and the coolant path; and a second heat transfer member provided between the focus ring and the coolant path.
    Type: Application
    Filed: January 28, 2014
    Publication date: July 31, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Kyouhei YAMAMOTO, Taira TAKASE
  • Patent number: 8117986
    Abstract: The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: February 21, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Patent number: 8118936
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: February 21, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Patent number: 7811428
    Abstract: The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: October 12, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Patent number: 7678226
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: March 16, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Patent number: 7585385
    Abstract: A plasma processing apparatus includes a processing chamber for accommodating therein an object to be processed, a plurality of bar-shaped magnets rotatably installed standing around the processing chamber, a rotation driving mechanism for synchronously rotating the bar-shaped magnets, a rotation detection unit for detecting a rotation of a bar-shaped magnet and clocking times corresponding to the detected rotation, and an abnormal rotation determination unit for determining whether the rotation driving mechanism is abnormal by comparing an interval calculated from the clocked times to a time period.
    Type: Grant
    Filed: July 8, 2005
    Date of Patent: September 8, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Satoshi Yamazaki, Taira Takase
  • Patent number: 7566368
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: July 28, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Publication number: 20070125494
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Application
    Filed: February 5, 2007
    Publication date: June 7, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito SAIGUSA, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Publication number: 20070107846
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Application
    Filed: January 5, 2007
    Publication date: May 17, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Publication number: 20070102287
    Abstract: The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
    Type: Application
    Filed: January 5, 2007
    Publication date: May 10, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinya Nishimoto, Kouji Mitsuhashi, Hidehito Saigusa, Taira Takase, Hiroyuki Nakayama
  • Publication number: 20070096658
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Application
    Filed: December 5, 2006
    Publication date: May 3, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito SAIGUSA, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Patent number: 7204912
    Abstract: The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: April 17, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Publication number: 20070028839
    Abstract: The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
    Type: Application
    Filed: October 16, 2006
    Publication date: February 8, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Patent number: 7166166
    Abstract: The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: January 23, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama
  • Patent number: 7166200
    Abstract: The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously provides gas injection of a process gas with substantially minimal erosion of the electrode plate.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: January 23, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Hidehito Saigusa, Taira Takase, Kouji Mitsuhashi, Hiroyuki Nakayama