Patents by Inventor Takahiro Iwahama
Takahiro Iwahama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240097402Abstract: The present disclosure provides an optical member for use in a laser module that includes a surface emitting laser, the optical member being capable of detecting damage (cracking, peeling, and the like), a method for manufacturing the optical member, a laser module including the optical member, and a laser device.Type: ApplicationFiled: November 27, 2023Publication date: March 21, 2024Applicant: Daicel CorporationInventors: Takahiro Iwahama, Takeshi Fujikawa, Sadayuki Fukui
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Patent number: 11862936Abstract: The present disclosure provides an optical member for use in a laser module that includes a surface emitting laser, the optical member being capable of detecting damage (cracking, peeling, and the like), a method for manufacturing the optical member, a laser module including the optical member, and a laser device.Type: GrantFiled: July 25, 2022Date of Patent: January 2, 2024Assignee: DAICEL CORPORATIONInventors: Takahiro Iwahama, Takeshi Fujikawa, Sadayuki Fukui
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Publication number: 20220385037Abstract: The present disclosure provides an optical member for use in a laser module that includes a surface emitting laser, the optical member being capable of detecting damage (cracking, peeling, and the like), a method for manufacturing the optical member, a laser module including the optical member, and a laser device.Type: ApplicationFiled: July 25, 2022Publication date: December 1, 2022Applicant: Daicel CorporationInventors: Takahiro Iwahama, Takeshi Fujikawa, Sadayuki Fukui
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Publication number: 20220308271Abstract: Provided is a technique that can suppress stray light incident on a microlens array from a gap between a lens component and a light shielding film and improve the imaging performance of the microlens array. A light shielding film is provided around one or more lens components arranged at a base material portion having a substantially flat plate shape such that a predetermined gap region is formed with respect to at least a portion of an outer periphery of the lens component, and a surface roughened region having a surface roughness greater than that of another region in the base material portion is provided in at least a portion of the gap region.Type: ApplicationFiled: March 22, 2022Publication date: September 29, 2022Applicant: DAICEL CORPORATIONInventors: Hiroyuki HANATO, Takahiro IWAHAMA
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Patent number: 11404847Abstract: The present disclosure provides an optical member for use in a laser module that includes a surface emitting laser, the optical member being capable of detecting damage (cracking, peeling, and the like), a method for manufacturing the optical member, a laser module including the optical member, and a laser device.Type: GrantFiled: December 24, 2020Date of Patent: August 2, 2022Assignee: DAICEL CORPORATIONInventors: Takahiro Iwahama, Takeshi Fujikawa, Sadayuki Fukui
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Publication number: 20210175686Abstract: The present disclosure provides an optical member for use in a laser module that includes a surface emitting laser, the optical member being capable of detecting damage (cracking, peeling, and the like), a method for manufacturing the optical member, a laser module including the optical member, and a laser device.Type: ApplicationFiled: December 24, 2020Publication date: June 10, 2021Applicant: Daicel CorporationInventors: Takahiro Iwahama, Takeshi Fujikawa, Sadayuki Fukui
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Patent number: 10696782Abstract: Provided is a photosensitive resin composition that is, after being applied to an adherend surface, rapidly cured by photoirradiation to form a cured product having excellent light-shielding ability and adhesiveness (preferably, further having excellent reflow heat resistance). The photosensitive resin composition includes components (A), (C), and (D) and preferably further includes a component (B) as follows: (A) a cationically polymerizable compound at least including a compound containing an alicyclic epoxy group and devoid of ester bonds; (B) a hydroxyl-containing compound having a molecular weight of 500 or more; (C) a photo-cationic polymerization initiator; and (D) a light-shielding material.Type: GrantFiled: March 12, 2013Date of Patent: June 30, 2020Assignee: DAICEL CORPORATIONInventors: Tamaki Son, Takashi Kubo, Takahiro Iwahama
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Publication number: 20150018447Abstract: Provided is a photosensitive resin composition that is, after being applied to an adherend surface, rapidly cured by photoirradiation to form a cured product having excellent light-shielding ability and adhesiveness (preferably, further having excellent reflow heat resistance). The photosensitive resin composition includes components (A), (C), and (D) and preferably further includes a component (B) as follows: (A) a cationically polymerizable compound at least including a compound containing an alicyclic epoxy group and devoid of ester bonds; (B) a hydroxyl-containing compound having a molecular weight of 500 or more; (C) a photo-cationic polymerization initiator; and (D) a light-shielding material.Type: ApplicationFiled: March 12, 2013Publication date: January 15, 2015Applicant: DAICEL CORPORATIONInventors: Tamaki Son, Takashi Kubo, Takahiro Iwahama
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Patent number: 8680267Abstract: A process produces an amide or lactam by subjecting an oxime compound to rearrangement in a solvent in the presence of: at least one catalyst selected from the group consisting of an aromatic compound (A1) containing a leaving group bound to a carbon atom constituting the aromatic ring, the aromatic ring including, as a constitutive atom thereof, a heteroatom or including, as a constitutive atom thereof, a carbon atom bound to an electron-withdrawing group, and a compound (A2) containing a structure of Formula (1): -G-LA (1) wherein G represents P, N, S, B or Si atom; and LA represents a leaving group, wherein G is bound to one or more atoms or groups in addition to LA; and a co-catalyst including a halogen-containing organic acid, to give the corresponding amide or lactam, wherein, when the aromatic compound (A1) alone is used as the catalyst, the solvent is at least one solvent selected typically from hydrocarbon solvents.Type: GrantFiled: June 10, 2009Date of Patent: March 25, 2014Assignee: Daicel Chemical Industries, Ltd.Inventors: Takahiro Iwahama, Tatsuya Nakano, Yasutaka Ishii
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Publication number: 20130102734Abstract: A photosemiconductor protective material comprising a chain olefin-cyclic olefin copolymer elastomer composed of a chain olefin and a cyclic olefin as polymerizable components is prepared. The elastomer may comprise an ?-chain C2-4olefin and a polycyclic olefin as polymerizable components, and the molar ratio of the ?-chain C2-4olefin relative to the polycyclic olefin may be 80/20 to 99/1 in a ratio of the ?-chain C2-4olefin/the polycyclic olefin. The photosemiconductor protective material may further contain an organic silicon compound having a hydrolytically condensable group. The organic silicon compound may be a silane coupling agent having a (meth)acryloyl group. A photosemiconductor protective material 1 as the protective material is suitable as a solar cell encapsulant or filler 3 for encapsulating a solar cell 4. The photosemiconductor protective material has a high transparency and a high weather resistance and a proper elasticity and effectively protects a photosemiconductor.Type: ApplicationFiled: April 13, 2011Publication date: April 25, 2013Applicant: DAICEL CORPORATIONInventors: Akira Takaragi, Takahiro Iwahama, Takahiro Tei, Ryuta Tomoyose
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Patent number: 8236971Abstract: A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.Type: GrantFiled: October 8, 2010Date of Patent: August 7, 2012Assignee: Daicel Chemical Industries, Ltd.Inventors: Keizo Inoue, Takahiro Iwahama, Masamichi Nishimura, Kiyoharu Tsutsumi
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Patent number: 7985866Abstract: Disclosed is an oxetane-containing vinyl ether compound including one or more aromatic or non-aromatic carbocycles and/or two or more vinyl ether structures, such as a compound of Formula: wherein Ring Z1 is non-aromatic carbocycle; Ra is vinyl group of Formula: wherein each of R1, R2, and R3 is hydrogen or C1-C4 alkyl; Wa is single bond or organic group having a valence of (m+1); X1 is, for example, hydrocarbon; “m” and “q” are each 1 or 2; and “p” is 0 to 5. Also disclosed is an alicyclic epoxy-containing vinyl ether compound of Formula: wherein Ring Z2 is non-aromatic carbocycle; Rb is vinyl group of Formula: wherein R4, R5 and R6 are each hydrogen or C1-C4 alkyl; Wb is single bond or organic group having a valence of (r+1); Rc and Rd are hydrogen or alkyl; and “r” and “s” are 1 or 2.Type: GrantFiled: March 20, 2008Date of Patent: July 26, 2011Assignee: Daicel Chemical Industries, Ltd.Inventors: Takahiro Iwahama, Tatsuya Nakano, Keizo Inoue, Hiroto Miyake, Tsukasa Yoshida, Mitsuru Ohno, Yoshinori Funaki
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Publication number: 20110092699Abstract: A process produces an amide or lactam by subjecting an oxime compound to rearrangement in a solvent in the presence of: at least one catalyst selected from the group consisting of an aromatic compound (A1) containing a leaving group bound to a carbon atom constituting the aromatic ring, the aromatic ring including, as a constitutive atom thereof, a heteroatom or including, as a constitutive atom thereof, a carbon atom bound to an electron-withdrawing group, and a compound (A2) containing a structure of Formula (1): -G-LA (1) wherein G represents P, N, S, B or Si atom; and LA represents a leaving group, wherein G is bound to one or more atoms or groups in addition to LA; and a co-catalyst including a halogen-containing organic acid, to give the corresponding amide or lactam, wherein, when the aromatic compound (A1) alone is used as the catalyst, the solvent is at least one solvent selected typically from hydrocarbon solvents.Type: ApplicationFiled: June 10, 2009Publication date: April 21, 2011Inventors: Takahiro Iwahama, Tatsuya Nakano
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Publication number: 20110071314Abstract: A process for producing an aromatic polycarboxylic acid in which all alkyl groups are converted into carboxyl groups in a high yield by decreasing a residual amount of an intermediate product is provided. The process comprises oxygen-oxidizing an aromatic compound having a plurality of alkyl groups (e.g., durene) in the presence of a catalyst containing a cyclic imino unit having an N—OR group (wherein R represents a hydrogen atom or a protecting group for a hydroxyl group) and a transition metal co-catalyst (e.g., a cobalt compound, a manganese compound, and a zirconium compound) under heating in a lower-temperature zone and a higher-temperature zone to produce an aromatic polycarboxylic acid in which a plurality of alkyl groups are oxidized into carboxyl groups. In an initial stage of the reaction, the reaction may be conducted in a first lower-temperature zone (a reaction temperature of 60 to 120° C.Type: ApplicationFiled: June 10, 2009Publication date: March 24, 2011Inventors: Akihiro Shibamoto, Takahiro Iwahama
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Publication number: 20110028743Abstract: A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.Type: ApplicationFiled: October 8, 2010Publication date: February 3, 2011Inventors: Keizo Inoue, Takahiro Iwahama, Masamichi Nishimura, Kiyoharu Tsutsumi
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Patent number: 7834114Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.Type: GrantFiled: December 1, 2009Date of Patent: November 16, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Keizo Inoue, Takahiro Iwahama, Masamichi Nishimura, Kiyoharu Tsutsumi
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Patent number: 7750101Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.Type: GrantFiled: September 26, 2006Date of Patent: July 6, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Keizo Inoue, Takahiro Iwahama, Masamichi Nishimura, Kiyoharu Tsutsumi
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Patent number: 7745654Abstract: A vinyl- or allyl-containing compound represented by following Formula (3): wherein R2, R3, R4, R5, and R6 each represent hydrogen atom or a nonmetallic atom-containing group; R7 represents a nonmetallic atom-containing group; Y represents a group selected from the group consisting of —Si(R8)(R9)—, —Si(R10)(R11)—O—, the left hand of which is combined with R7, and —NR12—, wherein R8, R9, R10, R11, and R12 each represent hydrogen atom or a nonmetallic atom-containing group; and “n” represents 0 or 1, is prepared by reacting a vinyl or allyl ester compound represented by following Formula (1): wherein R1 represents hydrogen atom or a nonmetallic atom-containing group; R2, R3, R4, R5, R6, and “n” are as defined above, with a compound represented by following Formula (2): R7—Y—H ??(2) wherein R7 and Y are as defined above, in the presence of a transition element compound.Type: GrantFiled: March 2, 2007Date of Patent: June 29, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama
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Patent number: 7741514Abstract: A catalyst of the invention includes an imide compound having a N-substituted cyclic imide skeleton represented by following Formula (I): wherein R is a hydroxyl-protecting group. Preferred R is a hydrolyzable protecting group. R may be a group obtained from an acid by eliminating an OH group therefrom. Such acids include, for example, carboxylic acids, sulfonic acids, carbonic acid, carbamic acid, sulfuric acid, nitric acid, phosphoric acids and boric acids. The catalyst may include the imide compound and a metallic compound in combination. In the presence of the catalyst, (A) a compound capable of forming a radical is allowed to react with (B) a radical scavenging compound and thereby yields an addition or substitution reaction product of the compound (A) and the compound (B) or a derivative thereof. This catalyst can produce an organic compound with a high selectivity in a high yield as a result of, for example, an addition or substitution reaction under mild conditions.Type: GrantFiled: August 15, 2006Date of Patent: June 22, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama, Naruhisa Hirai
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Patent number: 7732645Abstract: Aromatic vinyl ether compounds represented by Formula (1) or by Formula (2) wherein each R and R? is a hydrogen atom or a group represented by Formula (3) and wherein the remaining variables are as defined in the specification, provided that at least one pR in Formula (1) and at least one uR in Formula (2) is a Formula (3) group. These aromatic vinyl ether compounds are useful as, e.g., curing agents for cationic polymerization.Type: GrantFiled: December 4, 2008Date of Patent: June 8, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Takahiro Iwahama, Tatsuya Nakano