Patents by Inventor Takamitsu Kobayashi
Takamitsu Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240091998Abstract: Provided is an after-cure type laminated film having a low reflectance. A laminated film comprising: a transparent support substrate, an uncured hard coat layer formed on at least one surface of the transparent support substrate, and an uncured optical interference layer formed on the uncured hard coat layer, wherein the uncured hard coat layer comprises an active energy ray-curable composition for forming a hard coat layer, the uncured optical interference layer comprises an active energy ray-curable composition for forming an optical interference layer, the transparent support substrate has a thickness of 50 ?m or more and 600 ?m or less, a stretch ratio of the laminated film at 160° C. is 50% or more, and the laminated film heat-treated at a temperature of 90° C. for 30 minutes has a minimum value RAH of a reflectance taken between wavelengths of 380 nm and 780 nm of 2% or less and measured from a side of the uncured optical interference layer.Type: ApplicationFiled: December 3, 2021Publication date: March 21, 2024Applicant: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.Inventors: Jumpei TAKAHASHI, Takuma OKADA, Kei TAKIGAWA, Kazuhito KOBAYASHI, Takeki HOSOKAWA, Takamitsu WATANABE
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Patent number: 11923492Abstract: An apparatus for manufacturing a bagged electrode includes a conveying unit, a first bonding unit, a second bonding unit, and a separating unit. The conveying unit conveys an electrode in a manner interposed between a pair of long separator materials unwound from a pair of rolls. The first bonding unit bonds the pair of long separator materials outside the electrode along a conveyance direction without stopping conveyance of the electrode and the pair of long separator materials. The second bonding unit bonds the pair of long separator materials outside the electrode along a direction intersecting the conveyance direction without stopping conveyance of the electrode and the pair of long separator materials. The separating unit cuts the pair of long separator materials along the direction intersecting the conveyance direction to cut off the bagged electrode without stopping conveyance of the electrode and the pair of long separator materials.Type: GrantFiled: February 27, 2020Date of Patent: March 5, 2024Assignee: Kabushiki Kaisha ToshibaInventors: Yuko Kobayashi, Misato Ishikawa, Shunsuke Hattori, Takamitsu Sunaoshi, Takahiro Kokubo
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Patent number: 11718579Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of acetonitrile and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of acetonitrile/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.Type: GrantFiled: December 23, 2020Date of Patent: August 8, 2023Assignee: SHOWA DENKO K.K.Inventors: Takamitsu Kobayashi, Naoyuki Tanaka
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Publication number: 20220251026Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer including 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of 1,2-dimethoxyethane and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of 1,2-dimethoxyethane/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.Type: ApplicationFiled: December 23, 2020Publication date: August 11, 2022Applicant: SHOWA DENKO K.K.Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
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Publication number: 20220227697Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass% of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of acetonitrile and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of acetonitrile/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.Type: ApplicationFiled: December 23, 2020Publication date: July 21, 2022Applicant: SHOWA DENKO K.K.Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
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Publication number: 20220220064Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of toluene and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of toluene/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.Type: ApplicationFiled: December 23, 2020Publication date: July 14, 2022Applicant: SHOWA DENKO K.K.Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
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Publication number: 20220220063Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer including 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation, and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in step (A) in a mixed solvent of methyl ethyl ketone and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product, wherein a mass ratio of methyl ethyl ketone/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.Type: ApplicationFiled: December 23, 2020Publication date: July 14, 2022Applicant: SHOWA DENKO K.K.Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
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Publication number: 20220213025Abstract: A method for producing a highly polymerizable N-vinyl carboxylic acid amide monomer includes (A) melting a crude N-vinyl carboxylic acid amide monomer comprising 50 to 88 mass % of an N-vinyl carboxylic acid amide monomer by heating, followed by cooling for precipitation, and subjecting precipitated N-vinyl carboxylic acid amide monomer crystals to solid-liquid separation (step (A)), and (B) further dissolving the N-vinyl carboxylic acid amide monomer crystals separated in the step (A) in a mixed solvent of ethyl acetate and an aliphatic hydrocarbon having 6 to 7 carbon atoms, then performing crystallization, performing solid-liquid separation, and recovering an N-vinyl carboxylic acid amide monomer purified product (step (B)), wherein a mass ratio of ethyl acetate/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.01 to 0.5, and a mass ratio of aliphatic hydrocarbon having 6 to 7 carbon atoms/N-vinyl carboxylic acid amide monomer crystal in step (B) is 0.5 to 3.0.Type: ApplicationFiled: December 23, 2020Publication date: July 7, 2022Applicant: SHOWA DENKO K.K.Inventors: Naoyuki TANAKA, Katsumi MIKAMI, Takamitsu KOBAYASHI
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Patent number: 11319278Abstract: Provided is a method for producing glycine, in which on synthesizing glycine from glycinonitrile, glycine can be obtained in a higher yield than that in the conventional method. The present invention relates to a method for producing glycine, including allowing glycinonitrile and water to react with each other in the presence of a cerium compound, optionally adding ammonia thereto, to obtain glycine.Type: GrantFiled: July 11, 2017Date of Patent: May 3, 2022Assignee: SHOWA DENKO K.K.Inventors: Takanori Aoki, Akira Shibuya, Takamitsu Kobayashi, Hideo Miyata, Shinya Tsukamoto, Manabu Kuwajima, Motoki Murai
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Publication number: 20220112155Abstract: The present invention relates to a composition for producing an N-vinylcarboxylic acid amide, the composition including (A) an N-(1-alkoxyethyl)carboxylic acid amide and (B) a carboxylic acid amide other than the N-(1-alkoxyethyl)carboxylic acid amide and the N-vinylcarboxylic acid amide, and satisfying the following conditions (1) to (4): (1) the composition has a melting point of 0 to 30° C.; (2) a water content is 0 to 1.00% by mass in a total amount of the composition; (3) a content ratio of the component (A) to the component (B) is 4.0 to 20.0 in terms of a molar ratio; and (4) a 5% by mass aqueous solution of the composition has a pH of 4.0 to 8.0. The present invention also relates to a method for producing an N-vinylcarboxylic acid amide, the method including thermally decomposing or catalytically decomposing the composition for producing an N-vinylcarboxylic acid amide.Type: ApplicationFiled: December 23, 2019Publication date: April 14, 2022Applicant: SHOWA DENKO K.K.Inventors: Takamitsu KOBAYASHI, Naoyuki TANAKA
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Publication number: 20210292273Abstract: Provided is a method for producing glycine, in which on synthesizing glycine from glycinonitrile, glycine can be obtained in a higher yield than that in the conventional method. The present invention relates to a method for producing glycine, including allowing glycinonitrile and water to react with each other in the presence of a cerium compound, optionally adding ammonia thereto, to obtain glycine.Type: ApplicationFiled: July 11, 2017Publication date: September 23, 2021Applicant: SHOWA DENKO K.K.Inventors: Takanori AOKI, Akira SHIBUYA, Takamitsu KOBAYASHI, Hideo MIYATA, Shinya TSUKAMOTO, Manabu KUWAJIMA, Motoki MURAI
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Patent number: 10774037Abstract: The present invention relates to a method for producing a specified ?-amino acid, the method including allowing a specified ?-amino acid amide and water to react with each other in the presence of a zirconium compound which contains zirconium and at least one metal element selected from the group consisting of lithium, nickel, copper, zinc, cesium, barium, hafnium, tantalum, cerium, and dysprosium.Type: GrantFiled: July 25, 2017Date of Patent: September 15, 2020Assignee: SHOWA DENKO K.K.Inventors: Takanori Aoki, Akira Shibuya, Takamitsu Kobayashi, Hideo Miyata, Shinya Tsukamoto, Manabu Kuwajima, Motoki Murai
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Publication number: 20190161434Abstract: The present invention relates to a method for producing a specified ?-amino acid, the method including allowing a specified ?-amino acid amide and water to react with each other in the presence of a zirconium compound which contains zirconium and at least one metal element selected from the group consisting of lithium, nickel, copper, zinc, cesium, barium, hafnium, tantalum, cerium, and dysprosium.Type: ApplicationFiled: July 25, 2017Publication date: May 30, 2019Applicant: SHOWA DENKO K.K.Inventors: Takanori AOKI, Akira SHIBUYA, Takamitsu KOBAYASHI, Hideo MIYATA, Shinya TSUKAMOTO, Manabu KUWAJIMA, Motoki MURAI
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Publication number: 20170342133Abstract: To solve the above-mentioned problems, the present inventors introduced site-specific mutations into sc(Fv)2 and examined the stabilizing effects on sc(Fv)2. As a result, they succeeded for the first time in significantly increasing the Tm value of sc(Fv)2 by amino acid substitutions. Furthermore, they discovered that sc(Fv)2 is stabilized by introducing site-specific mutations into sc(Fv)2.Type: ApplicationFiled: May 15, 2017Publication date: November 30, 2017Applicant: CHUGAI SEIYAKU KABUSHIKI KAISHAInventors: Tomoyuki Igawa, Hiroyuki Tsunoda, Takamitsu Kobayashi, Shoujiro Kadono
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Patent number: 8993791Abstract: To provide an efficient method of producing an epoxy compound comprising reacting hydrogen peroxide and acetonitrile with the carbon-carbon double bond of an organic compound having a carbon-carbon double bond. A method of producing an epoxy compound comprising epoxidizing the carbon-carbon double bond of an organic compound having a carbon-carbon double bond in the presence of acetonitrile by using hydrogen peroxide as an oxidizing agent, wherein the reaction proceeds while controlling the acetonitrile concentration in the reaction system in the range of 0.6-5 mol/L by using a solvent containing an alcohol.Type: GrantFiled: December 17, 2010Date of Patent: March 31, 2015Assignee: Showa Denko K.K.Inventors: Hiroshi Uchida, Takamitsu Kobayashi, Naoya Fukumoto
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Publication number: 20120302775Abstract: To provide an efficient method of producing an epoxy compound comprising reacting hydrogen peroxide and acetonitrile with the carbon-carbon double bond of an organic compound having a carbon-carbon double bond. A method of producing an epoxy compound comprising epoxidizing the carbon-carbon double bond of an organic compound having a carbon-carbon double bond in the presence of acetonitrile by using hydrogen peroxide as an oxidizing agent, wherein the reaction proceeds while controlling the acetonitrile concentration in the reaction system in the range of 0.6-5 mol/L by using a solvent containing an alcohol.Type: ApplicationFiled: December 17, 2010Publication date: November 29, 2012Applicant: SHOWA DENKO K.K.Inventors: Hiroshi Uchida, Takamitsu Kobayashi, Naoya Fukumoto
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Patent number: 8207134Abstract: Provided are a compound represented by Formula (I): wherein R1, R2, R3, and R4 are each independently selected from a hydrogen atom, a C1-6 alkyl group which may be substituted, a C7-14 aralkyl group which may be substituted and —C(?O)Rx; n denotes an integer selected from 1 and 2; and ring Ar is selected from the groups represented by the following Formula (a) to (f). or a prodrug thereof or a pharmaceutically acceptable salt thereof as well as a pharmaceutical agent and a pharmaceutical composition containing such a compound or a prodrug thereof, or a pharmaceutically acceptable salt thereof.Type: GrantFiled: July 27, 2007Date of Patent: June 26, 2012Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Tsutomu Sato, Yoshihito Ohtake, Masahiro Nishimoto, Takashi Emura, Takamitsu Kobayashi, Marina Yamaguchi, Kyouko Takami
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Publication number: 20100286423Abstract: A nickel-containing film-forming material including a compound represented by a structure of the following formula (1). In the formula (1), R1 and R2 are each independently a hydrogen atom or a group represented by a structure of the following formula (2), a and b are each an integer of 0 to 4, and a and b satisfy the condition of 0<a+b?4 with the exception of a case where R1 and R2 are both hydrogen atoms. In the formula (2), R3, R4 and R5 are each independently an alkyl group of 1 to 2 carbon atoms.Type: ApplicationFiled: December 16, 2008Publication date: November 11, 2010Applicant: Showa Denko K.K.Inventors: Toshitaka Hiro, Takamitsu Kobayashi
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Publication number: 20100234609Abstract: Provided are a compound represented by Formula (I): wherein R1, R2, R3, and R4 are each independently selected from a hydrogen atom, a C1-6 alkyl group which may be substituted, a C7-14 aralkyl group which may be substituted and —C(?O)Rx; n denotes an integer selected from 1 and 2; and ring Ar is selected from the groups represented by the following Formula (a) to (f). or a prodrug thereof or a pharmaceutically acceptable salt thereof as well as a pharmaceutical agent and a pharmaceutical composition containing such a compound or a prodrug thereof, or a pharmaceutically acceptable salt thereof.Type: ApplicationFiled: July 27, 2007Publication date: September 16, 2010Inventors: Tsutomu Sato, Yoshihito Ohtake, Masahiro Nishimoto, Takashi Emura, Takamitsu Kobayashi, Marina Yamaguchi, Kyouko Takami
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Patent number: 7767651Abstract: The present invention provides a compound of Formula (I): wherein R1, R2, R3 and R4 are each independently selected from a hydrogen atom, an optionally substituted C1-C6 alkyl group, an optionally substituted C7-C14 aralkyl group and —C(?O)Rx; Rx represents an optionally substituted C1-C6 alkyl group, an optionally substituted aryl group, an optionally substituted heteroaryl group, an optionally substituted C1-C6 alkoxy group or —NReRf; Ar1 represents an optionally substituted aromatic carbocyclic ring or an optionally mono-substituted aromatic heterocyclic ring; Q represents —(CH2)m-(L)p- or -(L)p-(CH2)m—; m represents an integer selected from 0 to 2, n represents an integer selected from 1 and 2, and p represents an integer selected from 0 and 1; L represents —O—, —S— or —NR5—; and A represents an optionally substituted aryl group or an optionally substituted heteroaryl group, a prodrug thereof and a pharmaceutically acceptable salt thereof, as well as a pharmaceutical preparation or pharmaceutical coType: GrantFiled: January 27, 2006Date of Patent: August 3, 2010Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Takamitsu Kobayashi, Tsutomu Sato, Masahiro Nishimoto