Patents by Inventor Takashi Otsuka

Takashi Otsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020128736
    Abstract: [Object]
    Type: Application
    Filed: August 9, 2001
    Publication date: September 12, 2002
    Inventors: Hirotada Yoshida, Takashi Otsuka, Koji Yamaguchi, Masanori Kimura
  • Publication number: 20020038632
    Abstract: In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means, a plurality of impedance regulation means for regulating impedances on the side of the reactor and on the side of the high-frequency power supply means are provided correspondingly to the impedances of a plurality of reactors, and the high-frequency power is supplied into the reactors via the impedance regulation means corresponding to the reactors. Plasma treatment can be made in a good efficiency and a low cost on a plurality of reactors having different impedances.
    Type: Application
    Filed: July 6, 2001
    Publication date: April 4, 2002
    Inventors: Toshiyasu Shirasuna, Tatsuyuki Aoike, Kazuyoshi Akiyama, Hitoshi Murayama, Takashi Otsuka, Daisuke Tazawa, Kazuto Hosoi, Yukihiro Abe
  • Publication number: 20020038630
    Abstract: In order to make possible formation of a deposited film of a relatively large area at a treatment rate which could not accomplished by the plasma process of the prior art, and in order to make possible stable production of the deposited film without variation in film quality, in an apparatus and a method for forming a deposited film, a part of a reaction vessel is formed of a dielectric member, at least one high-frequency electrode is arranged so as to face at least one substrate with interposition of the dielectric member, an earth shield is arranged so as to cover the reaction vessel and the high-frequency electrode, plasma is generated between the high-frequency electrode and the substrate, and a deposited film is formed under the conditions in which the following equation:
    Type: Application
    Filed: May 10, 2001
    Publication date: April 4, 2002
    Inventors: Takashi Otsuka, Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuyoshi Akiyama, Hitoshi Murayama, Daisuke Tazawa, Kazuto Hosoi
  • Patent number: 6250251
    Abstract: An object of the present invention is to provide a vacuum processing apparatus and a vacuum processing method capable of effectively preventing film peeling generated in a reaction vessel to provide a deposited film of excellent quality with reduced spherical projections. The present invention provides a vacuum processing apparatus or method utilizing a vessel, means for supplying a gas into the vessel and means for supplying an electric power and in which the gas is decomposed by the electric power to generate a discharge, wherein the surface of a member confronted with the discharge satisfies the conditions of (1) the ten-point mean roughness Rz with respect to a reference length of 2.5 mm according to the JIS standard being in a range of not smaller than 5 &mgr;m and not larger than 200 &mgr;m, and (2) the mean spacing S of adjacent local peaks according to the JIS standard being in a range of not smaller than 5 &mgr;m and not larger than 100 &mgr;m.
    Type: Grant
    Filed: March 31, 1999
    Date of Patent: June 26, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuyoshi Akiyama, Tatsuyuki Aoike, Toshiyasu Shirasuna, Hitoshi Murayama, Takashi Otsuka, Daisuke Tazawa, Kazuto Hosoi
  • Patent number: 5821625
    Abstract: The present invention reduces crosstalk, which occurs as a result of interference between signals running in each of respective wiring layers of a first semiconductor chip and a second semiconductor chip stacked surface to surface with a small gap. The semiconductor device includes a first semiconductor chip 1 having a first electrode pad 2 and a first wiring layer 9 in the main surface, and a second semiconductor chip 5 having a second electrode pad 6 and a second wiring layer 10 in the main surface confronting the first semiconductor chip. A bump 4 is provided for electrically coupling the first electrode pad 2 and the second electrode pad 6 together. An insulation layer 8 is disposed between the main surfaces of first semiconductor chip 1 and second semiconductor chip 5. An electro-conductive layer 7 is disposed between the main confronting surfaces of the first semiconductor chip and the second semiconductor chip.
    Type: Grant
    Filed: April 23, 1996
    Date of Patent: October 13, 1998
    Assignees: Matsushita Electric Industrial Co., Ltd., Matsushita Electronics Corp.
    Inventors: Takayuki Yoshida, Takashi Otsuka, Hiroaki Fujimoto, Tadaaki Mimura, Ichiro Yamane, Takio Yamashita, Toshio Matsuki, Yoshiaki Kasuga
  • Patent number: 5767009
    Abstract: The present invention reduces crosstalk noise, which occurs as a result of interference between signals running in each of respective wiring layers of a first semiconductor chip and a second semiconductor chip stacked surface to surface with a small gap. The semiconductor device includes a first semiconductor chip (1) having a first electrode pad (2) and a first wiring layer (9), and a second semiconductor chip (5) having a second electrode pad (6) and a second wiring layer (10). A bump (4) is provided for electrically coupling the first electrode pad (2) and the second electrode pad (6). An insulation layer 8 is disposed between confronting surfaces of the first semiconductor chip (1) and the second semiconductor chip (5). An electro-conductive layer (7) is disposed between the confronting surfaces of the first semiconductor chip and the second semiconductor chip.
    Type: Grant
    Filed: February 10, 1997
    Date of Patent: June 16, 1998
    Assignees: Matsushita Electric Industrial Co., Ltd., Matsushita Electronics Corp.
    Inventors: Takayuki Yoshida, Takashi Otsuka, Hiroaki Fujimoto, Tadaaki Mimura, Ichiro Yamane, Takio Yamashita, Toshio Matsuki, Yoshiaki Kasuga
  • Patent number: 5742570
    Abstract: A cartridge auto-changer includes a main unit (12) within which a vertical array of shelves (4a) and disc drives (6a) are arranged, and a carrier (2) positioned behind the shelves and disc drives and moved in a vertical direction. An extension unit (22) includes a vertical array of shelves (4b), and disc drives (6b). The extension unit is removably attached to the back of the main unit through an attachment mechanism (23). This arrangement allows for mounting of additional shelves and disc drives, as may be needed.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: April 21, 1998
    Assignee: Sony Corporation
    Inventors: Yoshitsugu Taki, Takashi Otsuka, Taketoshi Yamagishi
  • Patent number: 5697243
    Abstract: A shape scrap processing apparatus adapted to be situated next to a conveying table for conveying a continuous shape cut in a regular size. The apparatus comprises: conveying means for conveying shape scraps, which are discharged from the conveying table, intermittently by a regular length at a time in a longitudinal direction; pressing means disposed contiguously to the conveying means downstream thereof, and operable while the conveying of the shape scraps is stopped, for pressing the shape scraps into a regular size; cutting means disposed side by side to the pressing means for cutting the shape scraps into a regular size in response to the operation of the pressing means; and discharging means for discharging the cut scraps pressed by the pressing means and cut by the cutting means.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: December 16, 1997
    Assignee: YKK Corporation
    Inventors: Toshinobu Ueda, Takashi Otsuka, Tamotsu Ohashi
  • Patent number: 5613545
    Abstract: This invention relates to an inert gas injecting plate brick or nozzle brick for use in a sliding gate valve apparatus of molten metal, characterised in that said plate brick or insert nozzle brick is horizontally split into at least two parts, and a number of small diameter pipes are sealingly arranged and secured in said split surfaces. According to such a plate brick or nozzle brick, it is possible to prevent leakage of injection gas in such kind of apparatus, it is possible to carry out a stable casting working, and complicated, high cost, additional processes such as cutting working, boring working and connecting working of said bricks can be saved.
    Type: Grant
    Filed: October 26, 1994
    Date of Patent: March 25, 1997
    Assignee: Shinagawa Refractories Co. Ltd.
    Inventors: Takashi Otsuka, Kenji Yamamoto, Mototsugu Osada, Tadao Taniguchi, Yoshifumi Shigeta
  • Patent number: 5316271
    Abstract: The present invention relates to a discharge regulator of molten metal, which can be disposed approximately vertically at the bottom portion of a molten metal vessel, characterized in that the regulator consists of a rotary nozzle, a nozzle carrying brick and a sleeve or of a rotary nozzle and a nozzle carrying brick, two or more recessed notches or openings are provided in at least either one of said nozzle carrying brick and said sleeve, the surface of said nozzle opening of the rotary nozzle, which pierces through at least one nozzle hole, is supported slidably to and in close contact with the inner peripheral surface of said nozzle carrying brick or said sleeve, and said rotary nozzle is equipped with a rotary mechanism mounted in such a manner that the upper portion of said rotary nozzle is brought into contact with the molten metal.
    Type: Grant
    Filed: November 6, 1991
    Date of Patent: May 31, 1994
    Assignee: Shinagawa Refractories Co., Ltd.
    Inventors: Takashi Otsuka, Kenji Yamamoto, Mototsugu Osada, Tadao Taniguchi, Yoshifumi Shigeta
  • Patent number: 5175134
    Abstract: The ceramic tile using sludge slag of the present invention comprises:______________________________________ sludge slag from 5 to 70 wt. %, agalmatolite from 20 to 90 wt. %, clay from 5 to 50 wt. %, and the balance being incidental impurities. ______________________________________The sludge slag is obtained by separating sludge from sewage, burning the thus separated sludge into ash, melting the resultant ash and solidifying the thus melted ash. The sludge slag consists essentially of: ______________________________________ silicon dioxide (SiO.sub.2) from 10 to 50 wt. %, aluminum oxide (Al.sub.2 O.sub.3) from 3 to 20 wt. %, phosphorous pentoxide (P.sub.2 O.sub.5) from 1 to 30 wt. %, calcium oxide (CaO) from 10 to 70 wt. %, magnesium oxide (MgO) from 0.5 to 20 wt. %, and iron oxide (Fe.sub.2 O.sub.3) from 5 to 25 wt. %.
    Type: Grant
    Filed: August 19, 1991
    Date of Patent: December 29, 1992
    Assignees: Senji Kaneko, Takashi Shindo, NKK Corporation, Shinagawa Shirorenga K.K.
    Inventors: Senji Kaneko, Takashi Shindo, Atsuo Inokawa, Yasushi Hoshino, Takashi Otsuka, Katsuhiro Wakasugi, Masaru Takikawa
  • Patent number: 4990926
    Abstract: A suspended line feed type planar antenna has a substrate sandwiched between a top plate and a bottom plate, in which a number of protrusions are formed on the top plate and the bottom plate at a plurality of corresponding positions by deforming the top plate and the bottom plate by means of a press-process or press-treatment, so that the substrate is supported by the protrusions.
    Type: Grant
    Filed: October 17, 1988
    Date of Patent: February 5, 1991
    Assignee: Sony Corporation
    Inventors: Takashi Otsuka, Junichi Kajikuri
  • Patent number: 4914448
    Abstract: A microwave planar antenna having an antenna body sandwiched between a radome and a rear cover, a plurality of clips for clipping the peripheral portions of the radome and the rear cover at a plurality of different points and then protective trims for covering the clips and the peripheral portion of the radome and the rear cover without using screws. Thus, productivity of assembly parts, such as the rear cover, protective trims and so on can be increased, efficiency in the assembly process can be increased and the waterproof property can be improved. In addition, it becomes possible to avoid having the protective trims become displaced.
    Type: Grant
    Filed: November 29, 1988
    Date of Patent: April 3, 1990
    Assignee: Sony Corporation
    Inventors: Takashi Otsuka, Toshihiro Kikuchi, Katushiro Yamashita, Tomohiko Haga
  • Patent number: 4913314
    Abstract: An opening element for an insert nozzle of a slide gate valve apparatus, wherein a dead weight having an outside diameter smaller than the inside diameter of the melt passage opening of the slide gate valve apparatus is connected to a refractory cap by means of a steel wire, or by a refractory or metallic coupling rod and a method of opening said slide gate valve apparatus wherein said opening element is set in said respective passage openings of the insert nozzle and of a bottom plate connected to the nozzle, and said opening element is opened by the impact load exerted when said dead weight falls down due to the opening of the slide gate valve apparatus.
    Type: Grant
    Filed: December 20, 1988
    Date of Patent: April 3, 1990
    Assignee: Shinagawa Refractories Co., Ltd.
    Inventors: Takashi Otsuka, Masaru Terao, Masahiko Nose, Kenji Yamamoto, Mototsugu Osada
  • Patent number: 4914449
    Abstract: A suspended line feed type planar antenna is arranged with a number of antenna elements formed on a film-shaped substrate, and the film-shaped substrate is sandwiched between a plastic radome and a plastic rear cover, a conductive surface is plated on the rear surface of the plastic radome at its portion except the portions opposing the antenna elements and/or a conductive surface is plated on the whole front surface of the rear cover. The conductive surfaces and the antenna elements constitute resonance type printed path radiators, whereby the planar antenna of the invention can be simplified in construction and reduced in cost, thickness and weight, and the planar antenna of the invention can be increased in productivity and reliability.
    Type: Grant
    Filed: November 29, 1988
    Date of Patent: April 3, 1990
    Assignee: Sony Corporation
    Inventors: Keiji Fukuzawa, Takashi Otsuka, Shinobu Tsurumaru, Junichi Kajikuri, Fumihiro Ito
  • Patent number: 4840296
    Abstract: A clamping and fixing apparatus of a refractory-made plate 7 for a slide gate valve for controlling a molten steel flow comprising:providing plate-clamping fixtures 12, 12 rotatably in its plane direction and in contact with the inner side of a casing 13 and a guide piece 11, at both the ends at the plate side, of the guide piece 11 being supported by at least one guide 16 provided within the longer edge sides of the casing 13 which houses the refractory-made plate 7;inserting idly a nut 10 into a dovetail groove recess 11a provided in the other area of said guide piece 11;mounting to said nut 10 a bolt 9 which is rotatable passing through said casing 13; andproviding said fixtures 12, 12 with respective surfaces of contacting the plate 7.
    Type: Grant
    Filed: March 30, 1988
    Date of Patent: June 20, 1989
    Assignee: Shinagawa Refractories Co., Ltd.
    Inventors: Takashi Otsuka, Masahiko Nose, Kenji Yamamoto, Tadao Taniguchi, Yoshifumi Shigeta, Mototsugu Osada
  • Patent number: 4609338
    Abstract: A fluid operated press having opposed first and second fluid chambers is employed for compressing a mixture of desired brick ingredients in a mold. Pressurized fluid, preferably hydraulic oil, is first delivered to the first fluid chamber of the press to cause the same to exert a prescribed pressure on the mixture. Then, with this prescribed pressure maintained, the pressurized fluid is directed alternately into the first and second fluid chambers at rapid intervals, with the result that the press imparts vibratory motion to the mixture being held under pressure. In a preferred embodiment, the selective delivery of the pressurized fluid to the fluid chambers of the press is controlled by a servomechanism, constantly comparing a reference pressure signal with an actual pressure signal representative of the actual pressure being exerted by the press and actuating a servovalve so as to make the difference between the reference and actual pressure signals zero.
    Type: Grant
    Filed: January 31, 1985
    Date of Patent: September 2, 1986
    Assignee: Shinagawa Shirorenga Kabushiki Kaisha
    Inventors: Shinji Nishida, Takashi Otsuka, Yoshio Nakamori, Mitsukuni Sato
  • Patent number: D341110
    Type: Grant
    Filed: August 28, 1991
    Date of Patent: November 9, 1993
    Assignee: Bridgestone Corporation
    Inventors: Toshiaki Kobayashi, Takashi Otsuka
  • Patent number: D341112
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: November 9, 1993
    Assignee: Bridgestone Corporation
    Inventors: Toshiaki Kobayashi, Takashi Otsuka