Patents by Inventor Takashi Sakuma

Takashi Sakuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230250415
    Abstract: The present disclosure provides a technique for introducing an antigen receptor-encoding nucleic acid into a definite site in a nucleic acid that is contained in an immune cell of a target organism. In the technique according to the present disclosure, a vector, which contains an antigen receptor-encoding nucleic acid, and a nuclease are introduced into an immune cell. The nuclease cleaves the vector and the genome sequence of the immune cell. The vector can be configured so that, when cleaved with the nuclease, a sequence, which is an antigen receptor-encoding sequence and which is introduced by microhomology-mediated end-joining (MMEJ) at the nuclease cleavage site of the genome sequence of the immune cell, is formed.
    Type: Application
    Filed: November 13, 2020
    Publication date: August 10, 2023
    Inventors: Tatsuo Ichinohe, Takashi Yamamoto, Tetsushi Sakuma, Yasuko Honjo, Takakazu Kawase, Masatoshi Nishizawa, Ryuji Suzuki, Kenta Magoori, Hiroyuki Sato
  • Patent number: 11626290
    Abstract: A method of etching silicon oxide on a surface of a substrate is provided. The method comprises alternately repeating heating the substrate to a heating temperature of 60° C. or higher, supplying hydrogen fluoride gas and ammonia gas onto the substrate to react with the silicon oxide, and modifying the silicon oxide to obtain a reaction product, and removing at least a portion of the reaction product from the substrate while stopping the supply of the above gases and continuing to heat the substrate at the heating temperature; and when a process gas that is at least one of the hydrogen fluoride gas and the ammonia gas is supplied, while continuing to supply the process gas from an upstream side of a flow path, closing a valve disposed in the flow path to pressurize the process gas in the flow path, and then opening the valve.
    Type: Grant
    Filed: August 9, 2021
    Date of Patent: April 11, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Osamu Yokoyama, Kwangpyo Choi, Kazuki Hashimoto, Rio Shimizu, Takashi Kobayashi, Takashi Sakuma, Shinya Okabe
  • Publication number: 20230094053
    Abstract: A substrate processing method includes: preparing a substrate which includes a base having an epitaxial layer formed by epitaxial growth, and an insulating film formed on the base and having a penetration portion that exposes the epitaxial layer; forming a silicon film on a surface of the epitaxial layer exposed from the penetration portion rather than a side wall of the penetration portion; and forming a metal film on the silicon film formed on the surface of the epitaxial layer rather than the side wall of the penetration portion, and causing the silicon film to react with the metal film to form a metal silicide film.
    Type: Application
    Filed: September 23, 2022
    Publication date: March 30, 2023
    Inventors: Yuichiro WAGATSUMA, Masahisa WATANABE, Mayuko NAKAMURA, TAKASHI SAKUMA, Osamu YOKOYAMA, Kwangpyo CHOI
  • Patent number: 11471855
    Abstract: The present invention provides a composition that includes a silicotitanate that has a sitinakite structure, the composition having higher cesium adsorptivity than conventional compositions. The present invention also provides a production method for the composition that includes a silicotitanate that has a sitinakite structure. The production method does not require the use of hazardous or deleterious materials, can generate a product using a compound that is easily acquired, and can use a general-purpose autoclave. Also provided is a silicotitanate composition that has higher strontium adsorptivity than the present invention. Provided is a silicotitanate composition that contains niobium and a silicotitanate that has a sitinakite structure, the composition having at least two or more diffraction peaks selected from the group consisting of 2?=8.8°±0.5°, 2?=10.0°±0.5°, and 2?=29.6°±0.5°.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: October 18, 2022
    Assignee: TOSOH CORPORATION
    Inventors: Yoju Shimizu, Hajime Funakoshi, Keisuke Tokunaga, Shigeru Hirano, Takashi Sakuma, Makoto Komatsu, Takeshi Izumi
  • Patent number: 11446631
    Abstract: Provided is a particulate alkaline earth metal ion adsorbent having a large adsorption capacity. The particulate alkaline earth metal ion adsorbent comprising: a potassium hydrogen dititanate hydrate represented by a chemical formula K2-xHxO·2TiO2·nH2O, wherein x is 0.5 or more and 1.3 or less, and n is greater than 0; and no binder, wherein the particulate alkaline earth metal ion adsorbent has a particle size range of 150 ?m or more and 1000 ?m or less.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: September 20, 2022
    Assignee: TITAN KOGYO KABUSHIKI KAISHA
    Inventors: Takashi Sakuma, Makoto Komatsu, Takeshi Izumi, Takayasu Tanaka, Takafumi Tanaka, Hidenori Ishioka, Ayaka Ando, Tomoko Yoshimi, Nobuyuki Hashimoto, Hiroaki Uchida, Shigeru Nagaoka
  • Patent number: 11409256
    Abstract: This information processing device is provided with an editing unit and a storage unit. The editing unit performs editing on one or more controller data sets that contain control programs to be executed on a control device. The storage unit stores a sharing setting table indicative of sharing settings of the control programs included in the respective controller data sets. When the control program for a first controller data set and the control program for a second controller data set that are included in the plurality of controller data sets are set to be shared, the editing unit synchronizes the edited content for the control program for the first controller data set with the control program for the second controller data set.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: August 9, 2022
    Assignee: OMRON Corporation
    Inventors: Takashi Sakuma, Kenjiro Nagao, Chieko Sato, Naoto Hasegawa
  • Patent number: 11400432
    Abstract: Provided are a silicotitanate molded body having high strength and reduced generation of fine powder, a production method thereof, an adsorbent comprising the silicotitanate molded body, and a decontamination method of radioactive cesium and/or radioactive strontium by using the adsorbent. The silicotitanate molded body comprises: crystalline silicotitanate particles that have a particle size distribution in which 90% or more, on volume basis, of the particles have a particle size within a range of 1 ?m or more and 10 ?m or less and that are represented by a general formula of A2Ti2O3(SiO4).nH2O wherein A represents one or two alkali metal elements selected from Na and K, and n represents a number of 0 to 2; and an oxide of one or more elements selected from the group consisting of aluminum, zirconium, iron, and cerium.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: August 2, 2022
    Assignee: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
    Inventors: Takashi Sakuma, Makoto Komatsu, Takeshi Izumi, Shinsuke Miyabe, Takeshi Sakamoto, Eiji Noguchi, Kaori Sugihara
  • Publication number: 20220176340
    Abstract: Provided are a cobalt ion adsorption material which has a large adsorption capacity and which tends not to generate fine powder, and a method for producing the same. This cobalt ion adsorption material is a powder with a particle diameter of 100-1,000 ?m, and contains 0.3-8.0 parts by mass of a binder constituted of a water-insoluble metal oxide or metal hydroxide fine particles with respect to 100 parts by mass of a cobalt adsorption main agent constituted of potassium hydrogen dititanate hydrate.
    Type: Application
    Filed: April 7, 2020
    Publication date: June 9, 2022
    Applicant: TITAN KOGYO KABUSHIKI KAISHA
    Inventors: Takeshi IZUMI, Takashi SAKUMA, Makoto KOMATSU, Hedenori ISHIOKA, Takafumi TANAKA, Nobuyuki HASHIMOTO, Ayaka ANDO, Tomoko YSHIMI
  • Publication number: 20220051901
    Abstract: A method of etching silicon oxide on a surface of a substrate is provided. The method comprises alternately repeating heating the substrate to a heating temperature of 60° C. or higher, supplying hydrogen fluoride gas and ammonia gas onto the substrate to react with the silicon oxide, and modifying the silicon oxide to obtain a reaction product, and removing at least a portion of the reaction product from the substrate while stopping the supply of the above gases and continuing to heat the substrate at the heating temperature; and when a process gas that is at least one of the hydrogen fluoride gas and the ammonia gas is supplied, while continuing to supply the process gas from an upstream side of a flow path, closing a valve disposed in the flow path to pressurize the process gas in the flow path, and then opening the valve.
    Type: Application
    Filed: August 9, 2021
    Publication date: February 17, 2022
    Inventors: Osamu YOKOYAMA, Kwangpyo CHOI, Kazuki HASHIMOTO, Rio SHIMIZU, Takashi KOBAYASHI, Takashi SAKUMA, Shinya OKABE
  • Publication number: 20220020568
    Abstract: A plasma processing apparatus is provided to perform plasma processing on a substrate. The plasma processing apparatus includes a processing chamber, a substrate support disposed in the processing chamber to place thereon the substrate, a grounded lower electrode provided in the substrate support, an upper electrode disposed to face the lower electrode, a gas supply unit to supply a processing gas to a space between the upper electrode and the substrate support, and a radio frequency power supply to apply RF power to the upper electrode to generate plasma of the processing gas. The plasma processing apparatus further includes a voltage waveform shaping unit provided between the RF power supply and the upper electrode to shape a voltage waveform of the RF power supply to suppress a positive voltage of the RF voltage applied to the upper electrode.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 20, 2022
    Inventors: Takahiro SHINDO, Seiichi OKAMOTO, Hiroshi OTOMO, Takamichi KIKUCHI, Tatsuo MATSUDO, Yasushi MORITA, Takashi SAKUMA
  • Patent number: 11213799
    Abstract: An adsorbent capable of adsorbing radioactive antimony, radioactive iodine and radioactive ruthenium, the adsorbent containing cerium(IV) hydroxide in a particle or granular form having a particle size of 250 ?m or more and 1200 ?m or less; and a treatment method of radioactive waste water containing radioactive antimony, radioactive iodine and radioactive ruthenium, the treatment method comprising passing the radioactive waste water containing radioactive antimony, radioactive iodine and radioactive ruthenium through an adsorption column packed with the adsorbent, to adsorb the radioactive antimony, radioactive iodine and radioactive ruthenium on the adsorbent, wherein the absorbent is packed to a height of 10 cm or more and 300 cm or less of the adsorption column, and wherein the radioactive waste water is passed through the adsorption column at a linear velocity (LV) of 1 m/h or more and 40 m/h or less and a space velocity (SV) of 200 h?1 or less.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: January 4, 2022
    Assignees: EBARA CORPORATION, NIPPON CHEMICAL INDUSTRIAL CO., LTD.
    Inventors: Takashi Sakuma, Makoto Komatsu, Takeshi Izumi, Shinsuke Miyabe, Yutaka Kinose, Kiyoshi Satou, Kenta Kozasu, Mari Tokutake, Takeshi Sakamoto, Kaori Sugihara
  • Publication number: 20210316296
    Abstract: The present invention provides a particulate cobalt ion adsorbent which has a high adsorption capacity. A particulate cobalt ion adsorbent which contains potassium hydrogen dititanate hydrate represented by chemical formula K2-XHxO.2TiO2.nH2O (wherein x is 0.5 or more and 1.3 or less, and n is greater than 0), and no binder, wherein the particulate cobalt ion adsorbent has a particle size range of 150 ?m or more and 1000 ?m or less.
    Type: Application
    Filed: September 3, 2019
    Publication date: October 14, 2021
    Applicant: TITAN KOGYO KABUSHIKI KAISHA
    Inventors: Takashi SAKUMA, Makoto KOMATSU, Takeshi IZUMI, Nobuyuki HASHIMOTO, Toshimasa SEKI, Takafumi TANAKA, Hidenori ISHIOKA
  • Patent number: 11110430
    Abstract: The present invention provides a treatment method of a radioactive iodine-containing fluid, comprising passing the radioactive iodine-containing fluid through an adsorbent for iodine consisting of a silver-containing binderless zeolite molded body having a silver content of 50 mass % or less, to adsorb the radioactive iodine on the adsorbent for iodine.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: September 7, 2021
    Assignees: EBARA CORPORATION, TOSOH CORPORATION
    Inventors: Takashi Sakuma, Makoto Komatsu, Takeshi Izumi, Keisuke Tokunaga, Shigeru Hirano
  • Publication number: 20210054503
    Abstract: There is provided a substrate processing method which includes placing a substrate on a stage provided inside a processing container, and forming a ruthenium film on the substrate, wherein forming the ruthenium film includes repeating a cycle including: supplying a ruthenium-containing gas and a CO gas into the processing container; and stopping the supply of the ruthenium-containing gas and the CO gas into the processing container and exhausting a gas within the processing container.
    Type: Application
    Filed: August 18, 2020
    Publication date: February 25, 2021
    Inventors: Masato ARAKI, Kohichi SATOH, Tadahiro ISHIZAKA, Takashi SAKUMA
  • Publication number: 20200225633
    Abstract: This information processing device is provided with an editing unit and a storage unit. The editing unit performs editing on one or more controller data sets that contain control programs to be executed on a control device. The storage unit stores a sharing setting table indicative of sharing settings of the control programs included in the respective controller data sets. When the control program for a first controller data set and the control program for a second controller data set that are included in the plurality of controller data sets are set to be shared, the editing unit synchronizes the edited content for the control program for the first controller data set with the control program for the second controller data set.
    Type: Application
    Filed: August 28, 2018
    Publication date: July 16, 2020
    Applicant: OMRON Corporation
    Inventors: Takashi SAKUMA, Kenjiro NAGAO, Chieko SATO, Naoto HASEGAWA
  • Patent number: 10705500
    Abstract: The purpose of the invention is the simplification of a task of changing a control program upon a control device which is in use. A support device comprises: a computing part computing, for each unit program which configures a control program, identification information according to the content of each of the unit programs; a first transferring part transferring the unit programs and the identification information which is associated with the unit programs to a control device; a generating part generating changed unit programs according to a change operation upon any of the unit programs which configure the control program; and a second transferring part transferring the changed unit programs to a control device which is in use on condition that identification information is present on the control device which is identical to the identification information which is associated with the unit programs which configure the control program.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: July 7, 2020
    Assignee: OMRON Corporation
    Inventors: Takashi Unno, Takashi Sakuma
  • Publication number: 20200129956
    Abstract: Provided are a silicotitanate molded body having high strength and reduced generation of fine powder, a production method thereof, an adsorbent comprising the silicotitanate molded body, and a decontamination method of radioactive cesium and/or radioactive strontium by using the adsorbent. The silicotitanate molded body comprises: crystalline silicotitanate particles that have a particle size distribution in which 90% or more, on volume basis, of the particles have a particle size within a range of 1 ?m or more and 10 ?m or less and that are represented by a general formula of A2Ti2O3(SiO4).nH2O wherein A represents one or two alkali metal elements selected from Na and K, and n represents a number of 0 to 2; and an oxide of one or more elements selected from the group consisting of aluminum, zirconium, iron, and cerium.
    Type: Application
    Filed: July 3, 2018
    Publication date: April 30, 2020
    Inventors: Takashi SAKUMA, Makoto KOMATSU, Takeshi IZUMI, Shinsuke MIYABE, Takeshi SAKAMOTO, Eiji NOGUCHI, Kaori SUGIHARA
  • Publication number: 20200016570
    Abstract: Provided is a particulate alkaline earth metal ion adsorbent having a large adsorption capacity. The particulate alkaline earth metal ion adsorbent comprising: a potassium hydrogen dititanate hydrate represented by a chemical formula K2-xHxO.2TiO2.nH2O, wherein x is 0.5 or more and 1.3 or less, and n is greater than 0; and no binder, wherein the particulate alkaline earth metal ion adsorbent has a particle size range of 150 ?m or more and 1000 ?m or less.
    Type: Application
    Filed: March 1, 2018
    Publication date: January 16, 2020
    Inventors: Takashi SAKUMA, Makoto KOMATSU, Takeshi IZUMI, Takayasu TANAKA, Takafumi TANAKA, Hidenori ISHIOKA, Ayaka ANDO, Tomoko YOSHIMI, Nobuyuki HASHIMOTO, Hiroaki UCHIDA, Shigeru NAGAOKA
  • Publication number: 20190375903
    Abstract: The present invention relates to a filler-reinforced resin structure, and the structure is a structure containing a carbodiimide-modified polyolefin (A) having a carbodiimide group content of 1 to 200 mmol/100 g; or a structure containing a carbodiimide-modified polyolefin (A) having a carbodiimide group content of 1 to 200 mmol/100 g, a polypropylene resin, and a carbon fiber, and the structure containing 0.0001 to 140 mmol of the carbodiimide group based on 100 g of resin components in the structure.
    Type: Application
    Filed: March 8, 2018
    Publication date: December 12, 2019
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Ryohei SHIGA, Takashi SAKUMA, Shigeyuki YASUI
  • Patent number: 10449510
    Abstract: An adsorbent is provided to adsorb ruthenium from aqueous solution for recovery and/or reuse or removal of said ruthenium, and a method for purifying, for example, sea water and/or water containing sodium ions, magnesium ions, calcium ions, chlorine ions or other ions, polluted with a radioactive element, using said adsorbent. The ruthenium adsorbent includes manganese in the form of oxides thereof. The adsorbent can further include at least one additional transition metal element other than manganese, such as copper. The adsorbent soaked in water removes radioactive ruthenium or the like through adsorption, and thereby can purify, for example, sea water and/or water containing sodium ions, magnesium ions, calcium ions, chlorine ions or other ions.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: October 22, 2019
    Assignees: Clariant Catalysts (Japan) K.K., Ebara Corporation
    Inventors: Tadahito Nakashima, Hyun-Joong Kim, Takashi Sakuma, Makoto Komatsu, Takeshi Izumi