Patents by Inventor Takayuki Ohmura

Takayuki Ohmura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11189474
    Abstract: A sample support body is for ionization of a sample. The sample support body includes a substrate including a first surface and a second surface on sides opposite to each other, and a conduction layer provided at least on the first surface. A plurality of through-holes opening on the first surface and the second surface are formed in an effective region of the substrate, the effective region being for ionizing components of the sample. A width of a first opening on the first surface side is larger than a width of a second opening on the second surface side in each of the plurality of through-holes.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: November 30, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11189476
    Abstract: Provided is a sample support body for ionization of a sample. The sample support body includes a substrate including a first surface and a second surface on sides opposite to each other, a first conductive layer provided on the first surface, and a second conductive layer provided on the second surface. A plurality of through-holes opening on the first surface and the second surface are formed in a predetermined region of the substrate, the predetermined region being for ionizing components of the sample. A width of a first opening on the first surface side is larger than a width of a second opening on the second surface side in each of the plurality of through-holes.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: November 30, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11170985
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: November 9, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Publication number: 20210319991
    Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a frame body provided in a peripheral portion of the substrate to surround an ionization region in which a sample is ionized when viewed in a thickness direction of the substrate, in which a marker for recognizing a position in the ionization region is provided in the frame body.
    Type: Application
    Filed: July 25, 2019
    Publication date: October 14, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Miu TAKIMOTO, Takayuki OHMURA, Masahiro KOTANI
  • Patent number: 11139155
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which a plurality of through holes opening to a first surface and a second surface facing each other are formed, and a conductive layer provided on at least the first surface; a second step of introducing a sample and a solvent having refractoriness in a vacuum into the plurality of through holes; and a third step of ionizing a component of the sample by irradiating the first surface with laser beam while applying a voltage to the conductive layer.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: October 5, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Takayuki Ohmura, Masahiro Kotani
  • Patent number: 11127577
    Abstract: A laser desorption/ionization method includes a first process of preparing a sample support body. The sample support body includes a substrate, an ionization substrate, and a support that supports the ionization substrate with respect to the substrate such that a first surface of the ionization substrate is separated from the substrate. A plurality of through-holes are formed at least in measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. Further, the laser desorption/ionization method includes a second process of dropping the sample on the measurement regions of the ionization substrate, and a third process of, after the sample has infiltrated into the ionization substrate, ionizing components of the sample by applying a laser beam to the second surface while applying a voltage to the conductive layer.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: September 21, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Takayuki Ohmura, Masahiro Kotani
  • Patent number: 11120981
    Abstract: A laser desorption/ionization method includes: a first process of preparing a sample support body that includes a substrate in which a plurality of through-holes are formed and a conductive layer that is provided on the first surface of the substrate; a second process of mounting a frozen sample on a mounting surface of a mount under a sub-freezing atmosphere, and fixing the sample support body to the mount in a state in which the second surface is in contact with the frozen sample; a third process of thawing the sample, and moving components of the thawed sample toward the first surface via the plurality of through-holes due to a capillary phenomenon; and a fourth process of irradiating the first surface with a laser beam while applying a voltage to the conductive layer, and ionizing the components that have moved toward the first surface.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: September 14, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11101122
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which plurality of through holes opening to a first surface and a second surface facing each other are formed, and a conductive layer provided on at least the first surface; a second step of mounting a sample on a mounting surface of a mounting portion, and of disposing the sample support body on the sample such that the second surface is in contact with the sample; a third step of introducing a matrix solution into the plurality of through holes; and a fourth step of ionizing a component of the sample that is mixed with the matrix solution and is moved to the first surface side from the second surface side through the through hole by irradiating the first surface with laser light while a voltage is applied to the conductive layer.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: August 24, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11101124
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which a plurality of through holes opening to a first surface and a second surface facing each other are formed, a conductive layer provided on at least the first surface, and a matrix provided in the plurality of through holes; a second step of mounting a sample on a mounting surface of a mounting portion, and of disposing the sample support body on the sample such that the second surface is in contact with the sample; and a third step of ionizing a component of the sample that is mixed with the matrix and is moved to the first surface side from the second surface side through the through hole by irradiating the first surface with laser light while a voltage is applied to the conductive layer.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: August 24, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Publication number: 20210257201
    Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.
    Type: Application
    Filed: June 19, 2019
    Publication date: August 19, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Miu TAKIMOTO, Takayuki OHMURA, Masahiro KOTANI
  • Publication number: 20210231610
    Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.
    Type: Application
    Filed: April 14, 2021
    Publication date: July 29, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Takayuki OHMURA, Masahiro KOTANI
  • Patent number: 11047827
    Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: June 29, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Takayuki Ohmura, Masahiro Kotani
  • Patent number: 11031228
    Abstract: A mass spectrometry device according to one aspect of the invention includes: a sample stage on which a sample is placed and on which a sample support having a substrate, in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided, and a conductive layer, which covers at least a portion of the one surface which is not provided with the through-holes, is placed such that the other surface faces the sample; a laser beam application unit that controls application of a laser beam such that the laser beam is applied to an imaging target region on the one surface; and a detector that detects the sample ionized by the application of the laser beam in a state where a positional relation of the sample in the imaging target region is maintained.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: June 8, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11016058
    Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: May 25, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Takayuki Ohmura, Masahiro Kotani
  • Patent number: 10971345
    Abstract: A mass spectrometer includes: a chamber; a support that, in a state in which, in a sample support body that includes a substrate in which a plurality of through-holes open in first and second surfaces are formed and a conductive layer that is at least provided on the first surface, the second surface thereof is in contact with a sample, supports the sample and the sample support body; a laser beam irradiation part that irradiates the first surface with a laser beam; a voltage application part that applies a voltage to the conductive layer; an ion detection part that, detects the ionized components of the sample in a space inside the chamber; a first light irradiation part that irradiates the sample with a first light from a side of the substrate; and an imaging part that obtains a reflected light image of the sample by the first light.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: April 6, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro Kotani, Takayuki Ohmura
  • Publication number: 20210057198
    Abstract: A sample support body is for ionization of a sample. The sample support body includes a substrate including a first surface and a second surface on sides opposite to each other, and a conduction layer provided at least on the first surface. A plurality of through-holes opening on the first surface and the second surface are formed in an effective region of the substrate, the effective region being for ionizing components of the sample. A width of a second opening on the second surface side is larger than a width of a first opening on the first surface side in each of the plurality of through-holes.
    Type: Application
    Filed: January 16, 2019
    Publication date: February 25, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro KOTANI, Takayuki OHMURA
  • Publication number: 20210050201
    Abstract: A sample support body is a sample support body for ionizing a sample, including: a substrate having an irregular porous structure formed to communicate a first surface and a second surface opposite to each other; and a conductive layer provided at least on the first surface.
    Type: Application
    Filed: November 30, 2018
    Publication date: February 18, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro KOTANI, Takayuki OHMURA, Takamasa IKEDA
  • Publication number: 20210050202
    Abstract: An ionization method includes: a first process of preparing a sample support that includes a substrate formed with a plurality of through-holes opening to a first surface and a second surface and a conduction layer provided on at least the first surface; a second process of dropping a solution including a sample to the second surface in a state in which the sample support is supported such that the second surface is located above; a third process of moving components of the sample from a side of the second surface into the plurality of through-holes in the state in which the sample support is supported such that the second surface is located above, and drying the components of the sample; and a fourth process of applying a laser beam to the first surface while applying a voltage to the conductive layer, and thus ionizing the components of the sample.
    Type: Application
    Filed: January 30, 2019
    Publication date: February 18, 2021
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Masahiro KOTANI, Takayuki OHMURA
  • Patent number: D936857
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: November 23, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Takayuki Ohmura, Masahiro Kotani
  • Patent number: D936858
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: November 23, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Takayuki Ohmura, Masahiro Kotani