Patents by Inventor Takayuki OSANAI

Takayuki OSANAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210307150
    Abstract: An extreme ultraviolet light generation apparatus includes a chamber device, a concentrating mirror, an exhaust port, and a central gas supply port. The exhaust port is formed at the chamber device and is formed on the side lateral to a focal line and opposite to the reflection surface with respect to the plasma generation region. The central gas supply port is formed on the side opposite to the exhaust port with respect to the plasma generation region on the supply line passing through the exhaust port, the plasma generation region, and an inner side of a peripheral portion of the reflection surface. The central gas supply port supplies the gas toward the exhaust port along the supply line through the plasma generation region.
    Type: Application
    Filed: January 28, 2021
    Publication date: September 30, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Koichiro KOGE, Atsushi UEDA, Takayuki OSANAI
  • Publication number: 20210298160
    Abstract: An extreme ultraviolet light generation apparatus may include a chamber device, a concentrating mirror, a central gas supply port configured to supply gas along a focal line passing through a first focal point and a second focal point from the center side of the reflection surface, and a first peripheral gas supply port disposed at a peripheral portion of the reflection surface and configured to supply gas in a direction from the outer side of the reflection surface toward the inner side of the reflection surface. The first peripheral gas supply port may supply gas, when viewed along the focal line, in an inclined direction inclined to a tangential direction side of the peripheral portion at the peripheral portion where the first peripheral gas supply port is located with respect to a first straight line passing through the first peripheral gas supply port and the focal line.
    Type: Application
    Filed: January 22, 2021
    Publication date: September 23, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Takayuki OSANAI, Atsushi UEDA, Koichiro KOGE, Akihiro OHSAWA, Toshiya SHINTANI, Yoshiaki YOSHIDA, Yuki ISHIDA, Yosuke TAKADA
  • Publication number: 20210289611
    Abstract: A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.
    Type: Application
    Filed: January 22, 2021
    Publication date: September 16, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Atsushi UEDA, Takayuki OSANAI, Koichiro KOGE