Patents by Inventor Takayuki Tomoeda
Takayuki Tomoeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5965200Abstract: A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.Type: GrantFiled: September 25, 1997Date of Patent: October 12, 1999Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Kiyohisa Tateyama, Masafumi Nomura, Takayuki Tomoeda
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Patent number: 5887604Abstract: Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.Type: GrantFiled: November 5, 1996Date of Patent: March 30, 1999Assignees: Tokyo Electron Limited, Tokyo Electron Saga LimitedInventors: Shinya Murakami, Yuuji Kamikawa, Sinichiro Izumi, Noriyuki Anai, Takami Satoh, Hirofumi Shiraishi, Koji Harada, Takayuki Tomoeda, Hiroshi Tanaka
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Patent number: 5871584Abstract: A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.Type: GrantFiled: September 15, 1997Date of Patent: February 16, 1999Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Kiyohisa Tateyama, Masafumi Nomura, Takayuki Tomoeda
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Patent number: 5782990Abstract: A washing method for washing objects includes the steps of supplying a washing liquid to a washing vessel and immersing objects in the washing liquid contained in the washing vessel. The method also includes the steps of discharging the liquid at least once from the washing vessel, and starting to apply the washing liquid to the objects when the objects are partly exposed to air as the liquid is discharged from the washing vessel. The washing liquid application is continued during exposure of the objects to the air to prevent the surface of the objects from being dried and stained.Type: GrantFiled: January 27, 1997Date of Patent: July 21, 1998Assignees: Tokyo Electron Limited, Tokyo Electron Saga LimitedInventors: Shinya Murakami, Yuuji Kamikawa, Sinichiro Izumi, Noriyuki Anai, Takami Satoh, Hirofumi Shiraishi, Koji Harada, Takayuki Tomoeda, Hiroshi Tanaka
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Patent number: 5779796Abstract: The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step.Type: GrantFiled: December 17, 1996Date of Patent: July 14, 1998Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Takayuki Tomoeda, Masaaki Murakami, Kenichi Nishioka
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Patent number: 5759614Abstract: The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step.Type: GrantFiled: April 29, 1996Date of Patent: June 2, 1998Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Takayuki Tomoeda, Masaaki Murakami, Kenichi Nishioka
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Patent number: 5671764Abstract: Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.Type: GrantFiled: November 20, 1995Date of Patent: September 30, 1997Assignees: Tokyo Electron Limited, Tokyo Electron Saga LimitedInventors: Shinya Murakami, Yuuji Kamikawa, Sinichiro Izumi, Noriyuki Anai, Takami Satoh, Hirofumi Shiraishi, Koji Harada, Takayuki Tomoeda, Hiroshi Tanaka
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Patent number: 5626913Abstract: A invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step.Type: GrantFiled: March 9, 1995Date of Patent: May 6, 1997Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Takayuki Tomoeda, Masaaki Murakami, Kenichi Nishioka
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Patent number: 5518552Abstract: A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.Type: GrantFiled: June 29, 1994Date of Patent: May 21, 1996Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Kouichi Tanoue, Shinzi Kitamura, Noriyuki Anai, Takami Satoh, Takayuki Tomoeda, Tatsuya Iwasaki, Kengo Mizosaki
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Patent number: 5488964Abstract: Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.Type: GrantFiled: May 7, 1992Date of Patent: February 6, 1996Assignees: Tokyo Electron Limited, Tokyo Electron Saga LimitedInventors: Shinya Murakami, Yuji Kamikawa, Sinichiro Izumi, Noriyuki Anai, Takami Satoh, Hirofumi Shiraishi, Koji Harada, Takayuki Tomoeda, Hiroshi Tanaka
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Patent number: 5345639Abstract: A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.Type: GrantFiled: May 28, 1993Date of Patent: September 13, 1994Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu LimitedInventors: Kouichi Tanoue, Shinzi Kitamura, Noriyuki Anai, Takami Satoh, Takayuki Tomoeda, Tatsuya Iwasaki, Kengo Mizosaki