Abstract: There is provided a glass substrate for magnetic recording media, which enables damage to a magnetic recording medium using the glass substrate to be prevented. The glass substrate is a donut-shaped glass substrate comprising major surfaces, an outer peripheral edge surface, an inner peripheral edge surface, and chamfered surfaces, each connecting between one of the major surfaces and one of the outer peripheral edge surface and the inner peripheral edge surface. Each of the chamfered surfaces comprises a conical surface part and an annular curved surface part connected to one another, and for each of the chamfered surfaces, a percentage ratio of a length of an outline of the annular curved surface part to a length of an outline of the chamfered surface in a cross section of the glass substrate including a central axis of the glass substrate is not less than a predetermined value.

Abstract: A photocurable composition comprising (A) 100 parts by weight of a compound having an ethylenically unsaturated group, (B) from 0.001 to 5 parts by weight of a cationic dye having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm represented by formula (1: D+·A1−  (1) wherein D+ represents a cation having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm, and A1 31 represents an anion, and (C) from 0.

Abstract: The present invention provides a polymerizable composition comprising (a) an alicyclic alkane having at least one oxetanyl group and at least one epoxy group within the same molecule and (b) a compound capable of initiating cationic polymerization under irradiation of an active energy ray and/or under heat exhibits high activity in the photo- or heat-cationic ring-opening polymerization exhibiting high activity, e.g., rapid polymerizability, rapid curability, under irradiation of an active energy ray and/or under heat. The present invention also provides a polymerization product thereof.

Abstract: There are provided a method of manufacturing a glass substrate for information recording media that allows the inner and outer peripheral edge surfaces of the glass substrate for information recording media to be smoothed easily and inexpensively, a glass substrate for information recording media manufactured using this method, and an information recording medium using this glass substrate. A donut-shaped glass disk for information recording media having an outer peripheral edge surface and an inner peripheral edge surface is prepared. At least one of the outer peripheral edge surface and the inner peripheral edge surface of the glass disk is smoothed by melt-heating to a temperature at or above the softening point of the glass by irradiating with at least one laser beam.

Abstract: A photocurable prepreg sheet for waterproofing includes (1) a fiber-reinforced resin layer which comprises a sheet-shaped inorganic or organic fibrous reinforcing material impregnated with a resin composition comprising: (A) an unsaturated polyester resin and/or vinyl ester resin: 100 parts by weight, and (B) at least two photopolymerization initiators having photosensitivity in different wavelength ranges from ultraviolet range to near infrared range: 0.01 to 10 parts by weight, and which is treated with light of a specific wavelength to thereby undergo prepolymerization which causes at least one of the polymerization initiators and radical-polymerizable unsaturated groups to remain partially intact; and (2) film which covers an upper surface and a back surface of the fiber-reinforced resin layer.

Abstract: A photocurable prepreg composition which is characterized by easy control of a B stage state of a thermosetting resin such as an unsaturated polyester resin or an epoxy acrylate resin, excellent storage stability, and remarkable curability after being shaped; as well as a production method therefor. A photocurable prepreg composition which contains an unsaturated polyester resin and/or an epoxy acrylate resin; at least two photopolymerization initiators with photosensitivity in different wavelength ranges; and an inorganic or an organic fiber-reinforcing material and/or filler, and which composition is treated with light of a specific wavelength such that at least one photopolymerization initiator and radical-polymerizable unsaturated groups remain partially in said resin; a production method therefor; and formed articles produced therefrom.

Abstract: Color reversion of photocured products which have been photocured with cationic dyes and quaternary organo borates can be notably suppressed by addition of phenolic compounds, aromatic thiol compounds, amine compounds and/or phosphorous compounds.

Abstract: A photocurable composition comprising an ultraviolet radical polymerization initiator, a cationic dye with absorptions in the visible light region, a quaternary boron salt and optionally a polymerization accelerator, is irradiated with ultraviolet light and visible light either simultaneously or separately, to achieve adequate hardening in air of both the surface and the interior of the cured product, and to provide a cured product with an excellent appearance and without production of coloring substances derived from the polymerization initiator.

Abstract: A process for manufacturing derivatives of 2-phenyl-4,5-oxazoledione 4-phenylhyrazone is disclosed. The process comprises reacting a derivative of a benezenediazonium salt, a hippuric acid derivative, and acetic anhydride in the presence of a neutralizing agent to effect the cyclization reaction for the formation of the oxazolone ring and the succeeding diazo-coupling reaction. The process does not require the conventional separate, independent step for the preparation of a solution of a hippuric acid derivative and acetic anhydride, thus eliminating the quick heating and quenching procedures and further avoiding the loss of the hippuric acid derivative due to decomposition of the oxazolone derivative. There is thus obtained a high yield of the desired product in a short period of time.

Abstract: A process for the manufacture of 1-(substituted or unsubstituted)phenyl-5-(substituted or unsubstituted)-phenyl-1H-1,2,4-triazole-3-carboxamide of the formula (I), which comprises heating 2-(substituted or unsubstituted)phenyl-4,5-oxazoledione 4-(substituted or unsubstituted)phenylhydrazone of the formula (II) and ammonia in water according to the following reaction formula, ##STR1## wherein A and B individually represent one or more substituted or unsubstituted phenyl groups. The target compound can be manufactured at a high purity and a high yield without using an organic solvent or an acidic compound.

Abstract: In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yieldings of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.

Abstract: In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.

Abstract: Disclosed herein are the derivative of benzyl ether represented by the formula (I) ##STR1## which is useful as an intermediate compound of the derivatives of 1,5-diphenyl-1H-1,2,4- triazole-3-carboxamide represented by the formula (II), ##STR2## wherein R is a straight-chain alkyl group having 1 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a branched alkyl group having 3 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a cyclic alkyl group having 3 to 10 carbon atoms, an alkyl group having 1 to 3 carbon atoms which is substituted with an alicyclic structure having 3 to 7 carbon atoms, a phenyl group or an aralkyl group having 7 to 9 carbon atoms; X.sup.1 is a halogen or an alkyl group having 1 to 3 carbon atoms; X.sup.2 is a hydrogen, a halogen or an alkyl group having 1 to 3 carbon atoms; Y.sup.1 is a hydrogen or a fluorine; Y.sup.2 is a hydrogen or a fluorine; and Z is a nitro group or an amino group.

Abstract: Disclosed herein is a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the following formula (I): ##STR1## wherein R represents an alkyl group of 2 to 10 carbon atoms, which is substituted by fluorine atom(s), and X represents a hydrogen atom or a fluorine atom, a process for producing the derivative and a herbicidal compositions containing the derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide as an active ingredient.

Abstract: Disclosed herein is a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the following formula (I): ##STR1## wherein R represents an alkyl group of 2 to 10 carbon atoms, which is substituted by fluorine atom(s), and X represents a hydrogen atom or a fluorine atom, a process for producing the derivative and herbicidal compositions containing the derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide as an active ingredient.

Abstract: Disclosed herein is a 4,5-dihydro-1H-1,2,4-triazole-3-carboxamide derivative represented by the formula (I): ##STR1## wherein R represents a straight-chain alkyl group having 1 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms or a branched alkyl group having 3 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms; X.sup.1 represents a halogen atom or an alkyl group having 1 to 3 carbon atoms; X.sup.2 represents hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms; Y.sup.1 represents hydrogen atom or fluorine atom; and Y.sup.2 represents hydrogen atom or fluorine atom. The derivatives of the formula (I) have high herbicidal activities and also show a excellent selectivity in their actions for killing weeds alone while doing any practical harm to the crops such as rice, wheat and corn.

Abstract: Disclosed herein is a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the formula (I): ##STR1## wherein R is a straight-chain alkyl group having 1 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a branched alkyl group having 3 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a cyclic alkyl group having 3 to 10 carbon atoms, an alkyl group having 1 to 3 carbon atoms which is substituted with an alicyclic structure having 3 to 7 carbon atoms, a phenyl group or an aralkyl group having 7 to 9 carbon atoms; X.sup.1 is a halogen or an alkyl group having 1 to 3 carbon atoms; X.sup.2 is a hydrogen, a halogen or an alkyl group having 1 to 3 carbon atoms; Y.sup.1 is a hydrogen or a fluorine; and Y.sup.2 is a hydrogen or a fluorine, and the herbicidal compositions containing said derivatives as active ingredient therefor.

Abstract: Disclosed herein is a phenylhydrazone derivative of oxamide represented by the formula (I): ##STR1## wherein R.sup.1 is straight-chain alkyl group having 2 to 10 carbon atoms, branched alkyl group or cyclic alkyl group having 3 to 10 carbon atoms, alkyl group having 1 to 3 carbon atoms which is substituted with an alicyclic structure having 3 to 7 carbon atoms, phenyl group, halogen-substituted phenyl group, aralkyl group having 7 to 9 carbon atoms, alkenyl group having 3 to 6 carbon atoms, alkyl group having 2 to 4 carbon atoms which is substituted with alkoxy group having 1 to 4 carbon atoms, or alkyl group having 2 to 10 carbon atoms which is substituted with 1 to 19 fluorine atoms; and R.sup.2 is hydrogen, fluorine, chlorine, methyl group or methoxy group, and a herbicidal composition containing the derivative as active ingredient.

Abstract: Disclosed herein are a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the formula (I): ##STR1## wherein R.sup.1 represents a straight-chain alkyl group of 2 to 10 carbon atoms; a branched-chain alkyl group or cycloalkyl group of 3 to 10 carbon atoms; a (cycloalkyl)alkyl group of 4 to 10 carbon atoms; a non-substituted- or halogen-substituted phenyl group; an aralkyl group of 7 to 9 carbon atoms; an alkenyl group of 3 to 6 carbon atoms or an alkyl group of 2 to 10 carbon atoms, which has been substituted by 1 to 19 fluorine atoms, and R.sup.2 represents a fluorine atom, a chlorine atom, a methyl group or a methoxy group and a herbicidal composition containing the derivative represented by the formula (I) as an active ingredient.

Abstract: Disclosed herein are a derivative of dihydrotriazole represented by the general formula (I): ##STR1## wherein R.sup.1 represents an amino group, lower alkoxy group, or lower alkyl amino group, R.sup.2 represents a hydrogen atom, halogen atom, or lower alkyl group and R.sup.3 represents a hydrogen atom, lower alkyl group, benzyl group, furyl group, phenyl group or phenyl group substituted with a halogen atom, hydroxyl group, carboxyl group, methoxycarbonyl group, lower alkyl group or lower alkoxy group, and a herbicidal composition containing as an active ingredient at least one of the derivatives of dihydrotriazole.