Patents by Inventor Tamotsu Abe

Tamotsu Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10314152
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: June 4, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
  • Patent number: 10172225
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
    Type: Grant
    Filed: January 2, 2018
    Date of Patent: January 1, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Toru Suzuki, Tamotsu Abe, Osamu Wakabayashi, Tatsuya Yanagida
  • Patent number: 10126657
    Abstract: An extreme ultraviolet light generating apparatus, may include: a chamber, in which extreme ultraviolet light is generated by plasma being generated in the interior thereof; a window provided in a wall of the chamber; a light source provided at the exterior of the chamber, configured to output illuminating light to the interior of the chamber via the window; a light sensor, configured to detect the illuminating light which is output to the interior of the chamber via the window; a shielding member having an opening that the illuminating light may pass through, that shields the window from emissions from the plasma, provided in the interior of the chamber; and a mirror provided along an optical path of the illuminating light in the interior of the chamber between the window and the shielding member, having a reflective surface that reflects the illuminating light, constituted by a surface of a metal layer.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: November 13, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Hirokazu Hosoda, Tamotsu Abe
  • Patent number: 10102938
    Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.
    Type: Grant
    Filed: April 16, 2018
    Date of Patent: October 16, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Takayuki Yabu, Tamotsu Abe, Kenichi Miyao, Tooru Abe
  • Publication number: 20180253010
    Abstract: An extreme ultraviolet light generating apparatus, may include: a chamber, in which extreme ultraviolet light is generated by plasma being generated in the interior thereof; a window provided in a wall of the chamber; a light source provided at the exterior of the chamber, configured to output illuminating light to the interior of the chamber via the window; a light sensor, configured to detect the illuminating light which is output to the interior of the chamber via the window; a shielding member having an opening that the illuminating light may pass through, that shields the window from emissions from the plasma, provided in the interior of the chamber; and a mirror provided along an optical path of the illuminating light in the interior of the chamber between the window and the shielding member, having a reflective surface that reflects the illuminating light, constituted by a surface of a metal layer.
    Type: Application
    Filed: May 4, 2018
    Publication date: September 6, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Hirokazu HOSODA, Tamotsu ABE
  • Publication number: 20180240562
    Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.
    Type: Application
    Filed: April 16, 2018
    Publication date: August 23, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Takayuki YABU, Tamotsu ABE, Kenichi MIYAO, Tooru ABE
  • Patent number: 9986629
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: May 29, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Toru Suzuki, Tamotsu Abe, Osamu Wakabayashi, Tatsuya Yanagida
  • Publication number: 20180146536
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
    Type: Application
    Filed: January 2, 2018
    Publication date: May 24, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Toru SUZUKI, Tamotsu ABE, Osamu WAKABAYASHI, Tatsuya YANAGIDA
  • Patent number: 9942973
    Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: April 10, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Tamotsu Abe, Yoshifumi Ueno, Hirokazu Hosoda, Takashi Saito
  • Patent number: 9872372
    Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: January 16, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Shinji Nagai, Yoshifumi Ueno, Tamotsu Abe
  • Patent number: 9731848
    Abstract: A bread packaging apparatus for packaging bread in a bag, includes a first urging unit that comes into contact with a loaf of bread and conveys the loaf of bread along a conveying path; and a control unit for controlling a speed of the first urging unit. The control unit controls the speed of the first urging unit such that the speed when the first urging unit comes into contact with the loaf of bread is different from the speed when the first urging unit conveys the loaf of bread.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: August 15, 2017
    Assignee: OSHIKIRI MACHINERY LTD.
    Inventors: Minoru Suzuki, Masami Umetsu, Takahiro Hasegawa, Shigehisa Sakamoto, Tamotsu Abe, Takeshi Nakamura, Tasuku Fujita
  • Publication number: 20170215267
    Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
    Type: Application
    Filed: April 6, 2017
    Publication date: July 27, 2017
    Applicant: GIGAPHOTON INC.
    Inventors: Tamotsu ABE, Yoshifumi UENO, Hirokazu HOSODA, Takashi SAITO
  • Publication number: 20170094767
    Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
    Type: Application
    Filed: December 14, 2016
    Publication date: March 30, 2017
    Applicant: Gigaphoton Inc.
    Inventors: Atsushi UEDA, Shinji NAGAI, Yoshifumi UENO, Tamotsu ABE
  • Publication number: 20170064800
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Application
    Filed: November 9, 2016
    Publication date: March 2, 2017
    Applicant: GIGAPHOTON INC.
    Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
  • Publication number: 20170055336
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Application
    Filed: November 9, 2016
    Publication date: February 23, 2017
    Applicant: GIGAPHOTON INC.
    Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
  • Patent number: 9578730
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors.
    Type: Grant
    Filed: January 14, 2016
    Date of Patent: February 21, 2017
    Assignee: GIGAPHOTON INC.
    Inventors: Tamotsu Abe, Osamu Wakabayashi
  • Patent number: 9510433
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: November 29, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
  • Publication number: 20160234920
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
    Type: Application
    Filed: September 17, 2014
    Publication date: August 11, 2016
    Applicant: Gigaphoton Inc.
    Inventors: Toru SUZUKI, Tamotsu ABE, Osamu WAKABAYASHI, Tatsuya YANAGIDA
  • Publication number: 20160135276
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors.
    Type: Application
    Filed: January 14, 2016
    Publication date: May 12, 2016
    Applicant: Gigaphoton Inc.
    Inventors: Tamotsu ABE, Osamu WAKABAYASHI
  • Patent number: 9310686
    Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.
    Type: Grant
    Filed: July 29, 2013
    Date of Patent: April 12, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Takayuki Yabu, Tamotsu Abe