Patents by Inventor Tamotsu Oowada

Tamotsu Oowada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11693318
    Abstract: A black photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) carbon black, and (C) a photoacid generator is coated onto a substrate to form a photosensitive resin coating which has improved reliability with respect to adhesion and crack resistance, resolution and flexibility while maintaining satisfactory light shielding properties.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: July 4, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada
  • Publication number: 20230178412
    Abstract: A temporary adhesion method for temporarily adhering a wafer to a support via a temporary adhesive layer, the wafer having a first main surface including a circuit and a second main surface to be processed, the second main surface being located on an opposite side to the first main surface, wherein a temporary adhesion between the first main surface of the wafer and the support is performed via the temporary adhesive layer including a dry adhesive fiber structure having a plurality of pillar structures.
    Type: Application
    Filed: April 26, 2021
    Publication date: June 8, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tamotsu OOWADA, Shohei TAGAMI, Mitsuo MUTO, Masahito TANABE
  • Publication number: 20230030194
    Abstract: A photosensitive resin composition containing (A) an acid-crosslinkable group-containing silicone resin, (B) a photo-acid generator, and (C) quantum dot particles. Thus, a photosensitive resin composition is capable of easily forming a film having favorable heat resistance, lithography resolution, and luminous properties; a photosensitive resin film and a photosensitive dry film are obtained by using the photosensitive resin composition; patterning processes use these; and a light emitting device is obtained by using the photosensitive resin composition.
    Type: Application
    Filed: November 12, 2020
    Publication date: February 2, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi MARUYAMA, Tamotsu OOWADA
  • Patent number: 11294284
    Abstract: A white photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) a white pigment has a sufficient reflectivity, good reliability with respect to adhesion and crack resistance, resolution, flexibility, and light resistance.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: April 5, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada
  • Patent number: 11161932
    Abstract: A resin composition including the following (A) to (D): (A) a resin containing epoxy groups in the range of 140 to 5000 g/eq as an epoxy equivalent; (B) a phenolic curing agent; (C) a curing accelerator; and (D) at least one compound selected among what is expressed by the following formulae (0-1) to (0-5). This provides a resin composition having small warpage and excellent adhesive force, a high adhesion resin composition film made into a film form from the composition, a semiconductor laminate having a cured product of the film and its production method, a semiconductor device obtained by dicing the semiconductor laminate into individual chips and its production method.
    Type: Grant
    Filed: January 2, 2020
    Date of Patent: November 2, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoichiro Ichioka, Tamotsu Oowada
  • Publication number: 20200231743
    Abstract: A resin composition including the following (A) to (D): (A) a resin containing epoxy groups in the range of 140 to 5000 g/eq as an epoxy equivalent; (B) a phenolic curing agent; (C) a curing accelerator; and (D) at least one compound selected among what is expressed by the following formulae (0-1) to (0-5). This provides a resin composition having small warpage and excellent adhesive force, a high adhesion resin composition film made into a film form from the composition, a semiconductor laminate having a cured product of the film and its production method, a semiconductor device obtained by dicing the semiconductor laminate into individual chips and its production method.
    Type: Application
    Filed: January 2, 2020
    Publication date: July 23, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoichiro ICHIOKA, Tamotsu OOWADA
  • Publication number: 20200157348
    Abstract: A photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) hollow silica is provided. The photosensitive resin composition has satisfactory reliability, flexibility, lithographic resolution and light resistance while maintaining the function of an antireflection film.
    Type: Application
    Filed: October 28, 2019
    Publication date: May 21, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada
  • Publication number: 20200026190
    Abstract: A black photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) carbon black, and (C) a photoacid generator is coated onto a substrate to form a photosensitive resin coating which has improved reliability with respect to adhesion and crack resistance, resolution and flexibility while maintaining satisfactory light shielding properties.
    Type: Application
    Filed: July 3, 2019
    Publication date: January 23, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada
  • Publication number: 20200026189
    Abstract: A white photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) a white pigment has a sufficient reflectivity, good reliability with respect to adhesion and crack resistance, resolution, flexibility, and light resistance.
    Type: Application
    Filed: July 2, 2019
    Publication date: January 23, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada