Patents by Inventor Tamotsu Watanabe
Tamotsu Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240077466Abstract: A first synthesized characteristic value calculated based on a first blending ratio of constituent materials contained in a first composite material and on a first characteristic value corresponding to the constituent materials contained in the first composite material, as well as first blending information of the constituent materials contained in the first composite material are used as input parameters (explanatory variables) for an approximate function to estimate a value of physical quantity (objective variable) for the first composite material.Type: ApplicationFiled: August 31, 2023Publication date: March 7, 2024Inventors: Daisuke SHANAI, Tomonori WATANABE, Takahiro SUZUKI, Tamotsu KIBE, Takehiko TANI
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Publication number: 20240070937Abstract: According to one embodiment, a medical image processing apparatus includes processing circuitry. The processing circuitry is configured to acquire three-dimensional thermographic image data by imaging a subject irradiated with infrared rays. The processing circuitry is configured to acquire a plurality of items of projection data by imaging the subject with tomosynthesis. The processing circuitry is configured to execute reconstruction based on the plurality of items of projection data and the three-dimensional thermographic image data.Type: ApplicationFiled: August 23, 2023Publication date: February 29, 2024Applicant: Canon Medical Systems CorporationInventors: Yoshimasa KOBAYASHI, Daisuke SATO, Tomio MAEHAMA, Risa HAYASHI, Tamotsu INO, Katsunori KOJIMA, Yoshinori SAITO, Naoto WATANABE
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Publication number: 20190269935Abstract: To provide a hair restoration/growth stimulating device that stably provides a sufficient hair restoration/growth stimulating effect without using ultra-narrow hand light, there is provided a hair restoration/growth stimulating device comprising: a casing to be worn on a user's head; and a plurality of light emitting diodes that are attached inside the casing and emit light having a peak wavelength hand between 630 nm and 660 nm, both inclusive, and a full width at half maximum between 15 nm and 20 nm, both inclusive, wherein the plurality of light emitting diodes emit the light to directly irradiate the user's head.Type: ApplicationFiled: October 2, 2017Publication date: September 5, 2019Inventors: Sotaro KURATA, Shigeki INUI, Tamotsu WATANABE
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Patent number: 9075306Abstract: A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 ?m, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized.Type: GrantFiled: March 29, 2011Date of Patent: July 7, 2015Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takanobu Takeda, Tamotsu Watanabe, Ryuji Koitabashi, Keiichi Masunaga, Akinobu Tanaka, Osamu Watanabe
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Publication number: 20140053469Abstract: A glass run includes a main body portion attached to a mounting portion provided along an inner periphery of a door frame of a vehicle with an approximately U-shape in a cross section, the main body portion including a base bottom portion, an interior sidewall portion, and an exterior sidewall portion extending from the base bottom portion, and an interior seal lip and an exterior seal lip extending from front ends of the interior sidewall portion and the exterior sidewall portion to an inside of the main body portion. An entire longitudinal area of the glass run is integrally formed by molding to be provided with an upper side portion corresponding to an upper edge portion of a door glass and a front vertical side portion and a rear vertical side portion corresponding to a front edge portion and a rear edge portion of the door glass.Type: ApplicationFiled: August 22, 2013Publication date: February 27, 2014Applicant: TOYODA GOSEI CO., LTD.Inventors: Yoshihisa Kubo, Atsushi Sumida, Tatsuhiko Nagata, Soichiro Yamamoto, Tamotsu Watanabe, Masatoshi Hotta
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Patent number: 8578587Abstract: A method for producing a weather strip, includes an extrusion step for extruding a non-vulcanized and non-foamed rubber into a predetermined shape, a coating step for coating a treatment liquid containing a simple sulfur, a sulfur compound, or both of the simple sulfur and the sulfur compound on an outer surface of a sealing part of a non-vulcanized and non-foamed intermediate molded body that is molded by the extrusion step, and a vulcanizing and foaming step for forming a skin layer in a non-foamed state by heating and vulcanizing a surface of the treatment liquid, and forming a sponge layer by vulcanizing and foaming the non-vulcanized and non-foamed rubber that is internal from the skin layer by passing the intermediate molded body on which the treatment liquid has been coated during the coating step through a heating zone, the steps being performed when molding the extruded part.Type: GrantFiled: July 19, 2011Date of Patent: November 12, 2013Assignee: Toyoda Gosei Co., Ltd.Inventors: Masatoshi Hotta, Tamotsu Watanabe
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Patent number: 8394577Abstract: In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1,400-5,000 pbw of the solvent is present per 100 pbw of the base resin, and the solvent comprises at least 60 wt % of PGMEA and ethyl lactate, and 0.2-20 wt % of a high-boiling solvent. A resist pattern is formed by coating the resist composition on a substrate, prebaking, patternwise exposure, post-exposure baking, development, and heat treatment.Type: GrantFiled: April 8, 2010Date of Patent: March 12, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Akinobu Tanaka, Tamotsu Watanabe, Satoshi Watanabe
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Patent number: 8367295Abstract: Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present invention is for preparing a chemically amplified resist composition containing a binder, an acid generator, a nitrogenous basic substance and a solvent and it has steps of selecting, as the solvent, a solvent having a peroxide content not greater than an acceptable level, and mixing constituent materials of the resist composition in the selected solvent.Type: GrantFiled: April 28, 2008Date of Patent: February 5, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Keiichi Masunaga, Takanobu Takeda, Tamotsu Watanabe, Satoshi Watanabe, Ryuji Koitabashi, Osamu Watanabe
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Patent number: 8343694Abstract: A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity.Type: GrantFiled: August 11, 2011Date of Patent: January 1, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ryuji Koitabashi, Satoshi Watanabe, Takanobu Takeda, Keiichi Masunaga, Tamotsu Watanabe
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Patent number: 8193307Abstract: A polymer for use in photoresist compositions is synthesized by effecting polymerization reaction to form a polymerization product mixture and subjecting the mixture to molecular weight fractionation by a liquid phase separation technique using a good solvent and a poor solvent. The fractionation step is iterated at least twice, and one iteration of fractionation includes adding a good solvent which is different from the good solvent added in the other iteration of fractionation.Type: GrantFiled: July 22, 2008Date of Patent: June 5, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Takeda, Tamotsu Watanabe
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Patent number: 8110335Abstract: There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid labile group, and an indene unit, and/or an acenaphthalene unit, wherein the polymer has the weight-average molecular weight of 4,000 to 7,000, and in particular, 4,500 to 5,500. One of the currently existing problems to be solved is the line edge roughness. To solve this problem by an acid-generator and a basic compound, there is a problem of the trade-off relationship with a resolution power. There can be provided a resist composition having a high resolution containing a base polymer such as hydroxystyrene that is protected by an acid labile group, a resist patterning process with a pattern rule of 65 nanometers or less having a reduced line edge roughness.Type: GrantFiled: June 15, 2009Date of Patent: February 7, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Takeda, Satoshi Watanabe, Tamotsu Watanabe, Akinobu Tanaka, Keiichi Masunaga, Ryuji Koitabashi
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Publication number: 20110294047Abstract: A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity.Type: ApplicationFiled: August 11, 2011Publication date: December 1, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Ryuji Koitabashi, Satoshi Watanabe, Takanobu Takeda, Keiichi Masunaga, Tamotsu Watanabe
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Publication number: 20110277388Abstract: A method for producing a weather strip, includes an extrusion step for extruding a non-vulcanized and non-foamed rubber into a predetermined shape, a coating step for coating a treatment liquid containing a simple sulfur, a sulfur compound, or both of the simple sulfur and the sulfur compound on an outer surface of a sealing part of a non-vulcanized and non-foamed intermediate molded body that is molded by the extrusion step, and a vulcanizing and foaming step for forming a skin layer in a non-foamed state by heating and vulcanizing a surface of the treatment liquid, and forming a sponge layer by vulcanizing and foaming the non-vulcanized and non-foamed rubber that is internal from the skin layer by passing the intermediate molded body on which the treatment liquid has been coated during the coating step through a heating zone, the steps being performed when molding the extruded part.Type: ApplicationFiled: July 19, 2011Publication date: November 17, 2011Applicant: Toyoda Gosei Co., Ltd.Inventors: Masatoshi Hotta, Tamotsu Watanabe
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Publication number: 20110177464Abstract: A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 ?m, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized.Type: ApplicationFiled: March 29, 2011Publication date: July 21, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takanobu Takeda, Tamotsu Watanabe, Ryuji Koitabashi, Keiichi Masunaga, Akinobu Tanaka, Osamu Watanabe
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Patent number: 7977027Abstract: A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from collapsing after development, and has improved etch resistance.Type: GrantFiled: October 22, 2007Date of Patent: July 12, 2011Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Takeda, Osamu Watanabe, Satoshi Watanabe, Youichi Ohsawa, Ryuji Koitabashi, Tamotsu Watanabe
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Patent number: 7914355Abstract: First electrodes partially configuring light-emitting elements are patterned in the form of stripes on a first major surface of a transparent substrate. Next, piezoelectric elements functioning a SAW touch sensor are formed on a second major surface of the transparent substrate. Next, the light-emitting elements forming step of forming light-emitting elements on the first electrodes which are patterned in advance is sequentially executed. After the formation of the piezoelectric elements, since the step of forming the light-emitting elements is executed, the light-emitting elements can be prevented from being damaged by receiving heat in the formation of the piezoelectric elements.Type: GrantFiled: February 8, 2006Date of Patent: March 29, 2011Assignees: Tohoku Pioneer Corporation, Fujitsu Limited, Fujitsu Component LimitedInventors: Fumihiko Nakazawa, Takashi Katsuki, Yuji Takahashi, Satoshi Sato, Satoshi Sasaki, Tamotsu Watanabe, Kunizo Ogoshi, Michiko Endo
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Publication number: 20100261123Abstract: In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1,400-5,000 pbw of the solvent is present per 100 pbw of the base resin, and the solvent comprises at least 60 wt % of PGMEA and ethyl lactate, and 0.2-20 wt % of a high-boiling solvent. A resist pattern is formed by coating the resist composition on a substrate, prebaking, patternwise exposure, post-exposure baking, development, and heat treatment.Type: ApplicationFiled: April 8, 2010Publication date: October 14, 2010Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Akinobu Tanaka, Tamotsu Watanabe, Satoshi Watanabe
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Patent number: 7762614Abstract: A glass run includes a main body portion and a pair of seal lips. Further, the glass run is constituted by a vehicle exterior side molded member and a vehicle interior side molded member divided at a bottom portion of the main body portion. Further, the vehicle exterior side molded member and the vehicle interior side molded member include engaging portions for engaging to be integrated with each other. By integrating the vehicle exterior side molded member and the vehicle interior side molded member by the engaging portions, the vehicle exterior side molded member is restricted from being shifted to move relative to the vehicle interior side molded member in a vehicle width direction and in a longitudinal direction of the vehicle interior side molded member.Type: GrantFiled: September 27, 2007Date of Patent: July 27, 2010Assignee: Toyoda Gosei Co., Ltd.Inventors: Yoshihisa Kubo, Atsushi Sumida, Tatsuhiko Nagata, Soichiro Yamamoto, Tamotsu Watanabe, Masatoshi Hotta
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Publication number: 20100009271Abstract: There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid labile group, and an indene unit, and/or an acenaphthalene unit, wherein the polymer has the weight-average molecular weight of 4,000 to 7,000, and in particular, 4,500 to 5,500. One of the currently existing problems to be solved is the line edge roughness. To solve this problem by an acid-generator and a basic compound, there is a problem of the trade-off relationship with a resolution power. There can be provided a resist composition having a high resolution containing a base polymer such as hydroxystyrene that is protected by an acid labile group, a resist patterning process with a pattern rule of 65 nanometers or less having a reduced line edge roughness.Type: ApplicationFiled: June 15, 2009Publication date: January 14, 2010Applicant: SHIN-ETSU CHEMICAL CO., LTDInventors: Takanobu Takeda, Satoshi Watanabe, Tamotsu Watanabe, Akinobu Tanaka, Keiichi Masunaga, Ryuji Koitabashi
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Publication number: 20090156083Abstract: First electrodes partially configuring light-emitting elements are patterned in the form of stripes on a first major surface of a transparent substrate. After the step of forming the first electrodes, piezoelectric elements functioning a SAW touch sensor is formed on a second major surface of the transparent substrate. Furthermore, after the step of forming the piezoelectric elements, the light-emitting elements forming step of forming light-emitting elements on the first electrodes which are patterned in advance is sequentially executed. Since the first electrodes are formed in the form of stripes, the piezoelectric elements can be prevented from being damaged by an etching solution used at this time. After the formation of the piezoelectric elements, since the step of forming the light-emitting elements is executed, the light-emitting elements can be prevented from being damaged by receiving heat in the formation of the piezoelectric elements.Type: ApplicationFiled: February 8, 2006Publication date: June 18, 2009Applicants: TOHOKU PIONEER CORPORATION, FUJITSU LIMITED, FUJITSU COMPONENT LIMITEDInventors: Fumihiko Nakazawa, Takashi Katsuki, Yuji Takahashi, Satoshi Sato, Satoshi Sasaki, Tamotsu Watanabe, Kunizo Ogoshi, Michiko Endo