Patents by Inventor Tanuj Aggarwal
Tanuj Aggarwal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11769982Abstract: Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates.Type: GrantFiled: October 6, 2020Date of Patent: September 26, 2023Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Patent number: 11050213Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: June 24, 2020Date of Patent: June 29, 2021Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Publication number: 20210021094Abstract: Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates.Type: ApplicationFiled: October 6, 2020Publication date: January 21, 2021Inventor: Tanuj Aggarwal
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Patent number: 10892594Abstract: In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.Type: GrantFiled: December 26, 2018Date of Patent: January 12, 2021Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Patent number: 10833471Abstract: Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates.Type: GrantFiled: November 17, 2017Date of Patent: November 10, 2020Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Publication number: 20200321746Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: June 24, 2020Publication date: October 8, 2020Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 10727642Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: September 11, 2017Date of Patent: July 28, 2020Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 10627724Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.Type: GrantFiled: August 23, 2016Date of Patent: April 21, 2020Assignees: ASML Netherlands B.V., CYMER, LLCInventors: Frank Everts, Wilhelmus Patrick Elisabeth Maria Op 't Root, Herman Philip Godfried, Joshua Jon Thornes, Kevin Michael O'Brien, Leon Pieter Paul Saanen, Tanuj Aggarwal
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Publication number: 20190190229Abstract: In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.Type: ApplicationFiled: December 26, 2018Publication date: June 20, 2019Inventor: Tanuj Aggarwal
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Publication number: 20190155170Abstract: Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates.Type: ApplicationFiled: November 17, 2017Publication date: May 23, 2019Inventor: Tanuj Aggarwal
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Patent number: 10218147Abstract: In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.Type: GrantFiled: March 13, 2017Date of Patent: February 26, 2019Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Patent number: 10096969Abstract: A method and apparatus for controlling a dose of radiation generated by a laser light source is disclosed. In one embodiment, a dose controller receives measurements of the deviation of output energy from an expected output energy, or “energy sigma,” and the standard deviation of the error in the dose received by the item being processed from the desired dose. The ratio of the energy sigma to the standard deviation of dose error is calculated, and the laser controller adjusts the controller gain based upon the calculated ratio so as to adjust the voltage determined by the controller, and consequently the output energy and thus the dose to the item. This is an improvement over the prior art, in which the controller gain is adjusted based upon sending a voltage dither to the laser and correlating it to its response in energy at only one frequency.Type: GrantFiled: September 14, 2017Date of Patent: October 9, 2018Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Patent number: 10090629Abstract: A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.Type: GrantFiled: April 24, 2017Date of Patent: October 2, 2018Assignee: Cymer, LLCInventors: Rahul Ahlawat, Tanuj Aggarwal
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Publication number: 20180253014Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.Type: ApplicationFiled: August 23, 2016Publication date: September 6, 2018Applicants: ASML Netherlands B.V., Cymer, LLCInventors: Frank EVERTS, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Herman Philip GODFRIED, Joshua Jon THORNES, Kevin Michael O"BRIEN, Leon Pieter Paul SAANEN, Tanuj AGGARWAL
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Patent number: 10036963Abstract: An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.Type: GrantFiled: September 12, 2016Date of Patent: July 31, 2018Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Patent number: 9939732Abstract: A lithography system includes an optical source configured to emit a pulsed light beam; a lithography apparatus including an optical system, the optical system being positioned to receive the pulsed light beam from the optical source at a first side of the optical system and to emit the pulsed light beam at a second side of the optical system; and a control system coupled to the optical source and the optical lithography apparatus, the control system configured to: receive an indication of an amount of energy in the pulsed light beam at the second side of the optical system, determine an energy error, access an initial control sequence, the initial control sequence being associated with the optical source, determine a second control sequence based on the determined energy error and the initial control sequence, and apply the second control sequence to the optical source.Type: GrantFiled: October 27, 2015Date of Patent: April 10, 2018Assignee: Cymer, LLCInventor: Tanuj Aggarwal
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Publication number: 20180074412Abstract: An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.Type: ApplicationFiled: September 12, 2016Publication date: March 15, 2018Inventor: Tanuj Aggarwal
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Publication number: 20180006425Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: September 11, 2017Publication date: January 4, 2018Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 9819136Abstract: A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.Type: GrantFiled: April 19, 2016Date of Patent: November 14, 2017Assignee: Cymer, LLCInventors: Rahul Ahlawat, Tanuj Aggarwal
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Patent number: 9762023Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: December 21, 2015Date of Patent: September 12, 2017Assignees: CYMER, LLC, ASML NETHERLANDS B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt