Patents by Inventor Taro Inada

Taro Inada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10193141
    Abstract: An object of the present invention is to provide a positive electrode mixture capable of conducting stable charging and discharging with a less amount of gasses generated which has an operating voltage or an initial crystal phase transition voltage of not less than 4.5 V on the basis of lithium. The present invention relates to a positive electrode mixture comprising carbon black having a bulk density of not more than 0.1 g/cm3, a crystallite size of 10 to 40 ?, an iodine adsorption of 1 to 150 mg/g, a volatile content of not more than 0.1% and a metal impurity content of not more than 20 ppm, and a positive electrode active substance having an operating voltage or an initial crystal phase transition voltage of not less than 4.5 V on the basis of lithium.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: January 29, 2019
    Assignees: TODA KOGYO CORPORATION, DENKA COMPANY LIMITED
    Inventors: Akihisa Kajiyama, Teruaki Santoki, Daisuke Morita, Ryuta Masaki, Takahiko Sugihara, Tsuyoshi Wakiyama, Kazutoshi Matsumoto, Akira Yoda, Taro Inada, Hiroshi Yokota, Takashi Kawasaki
  • Patent number: 9884350
    Abstract: According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: February 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Masamitsu Itoh, Katsuya Okumura, Taro Inada, Jun Watanabe
  • Patent number: 9808841
    Abstract: There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layer 1 to be adhered to a chuck region of the reticle chuck; a support layer 2 laminated on the adhesive layer 1; and a substrate 3 having a shape capable of being carried to the reticle chuck, the support layer 2 and the substrate 3 being partially bonded together in an adhesive region 41 of a partial adhesive layer 4.
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: November 7, 2017
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshihito Kobayashi, Masamitsu Itoh, Taro Inada, Jun Watanabe
  • Publication number: 20150190851
    Abstract: According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
    Type: Application
    Filed: March 20, 2015
    Publication date: July 9, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Masamitsu ITOH, Katsuya OKUMURA, Taro INADA, Jun WATANABE
  • Patent number: 9034467
    Abstract: According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: May 19, 2015
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masamitsu Itoh, Katsuya Okumura, Taro Inada, Jun Watanabe
  • Publication number: 20140326278
    Abstract: There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layer 1 to be adhered to a chuck region of the reticle chuck; a support layer 2 laminated on the adhesive layer 1; and a substrate 3 having a shape capable of being carried to the reticle chuck, the support layer 2 and the substrate 3 being partially bonded together in an adhesive region 41 of a partial adhesive layer 4.
    Type: Application
    Filed: June 22, 2012
    Publication date: November 6, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshihito Kobayashi, Masamitsu Itoh, Taro Inada, Jun Watanabe
  • Publication number: 20120024318
    Abstract: According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
    Type: Application
    Filed: July 28, 2011
    Publication date: February 2, 2012
    Inventors: Masamitsu ITOH, Katsuya Okumura, Taro Inada, Jun Watanabe
  • Publication number: 20020142219
    Abstract: Provided is a lithium iron thiophosphate compound represented by a general formula: Li2xFe1-xPS3 wherein x is more than 0 and less than 1. This compound provides a lithium battery having high out put as well as high energy density when used as an electrode active material.
    Type: Application
    Filed: March 18, 2002
    Publication date: October 3, 2002
    Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Kazunori Takada, Shigeo Kondo, Mamoru Watanabe, Masaru Kouguchi, Akihisa Kajiyama, Taro Inada
  • Publication number: 20020098146
    Abstract: A lamellar sodium-cobalt-manganese oxide represented by the general formula NaxCoyMn1−yO2 (where 0.6≦x≦0.8, 0.4≦y≦0.6) is disclosed, which is obtained by the steps of: mixing a sodium salt, a cobalt salt and a manganese salt in an aqueous solution state so as to be a molar ratio of sodium, cobalt and manganese of x: y: 1−y (where 0.6≦x≦0.8, 0.4≦y≦0.6) and drying the obtained mixture, sintering the obtained dried body in an oxygen-containing gas at 700 to 900° C., and quenching the sintered body from a temperature between 700° C. and 800° C. The lamellar sodium-cobalt manganese oxide of the present invention has a uniform composition and a single crystal structure, which is useful as an electrode active material for a lithium ion secondary battery.
    Type: Application
    Filed: November 27, 2001
    Publication date: July 25, 2002
    Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Kazunori Takada, Shigeo Kondo, Mamoru Watanabe, Masaru Kouguchi, Akihisa Kajiyama, Taro Inada