Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

Abstract: An extreme ultraviolet light generating system includes a chamber; a target supply unit configured to successively output, toward a predetermined region in the chamber, a plurality of droplets including a first droplet and a second droplet of a target substance; a trajectory correcting laser apparatus configured to apply a trajectory correcting laser beam to each of the droplets moving from the target supply unit toward the predetermined region; a drive laser apparatus configured to apply a drive laser beam to each droplet having reached the predetermined region to generate plasma; and a control unit configured to control the trajectory correcting laser apparatus such that intensity of the trajectory correcting laser beam applied to the first droplet is different from intensity of the trajectory correcting laser beam applied to the second droplet.

Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

Abstract: An extreme ultraviolet light generating system includes a chamber; a target supply unit configured to successively output, toward a predetermined region in the chamber, a plurality of droplets including a first droplet and a second droplet of a target substance; a trajectory correcting laser apparatus configured to apply a trajectory correcting laser beam to each of the droplets moving from the target supply unit toward the predetermined region; a drive laser apparatus configured to apply a drive laser beam to each droplet having reached the predetermined region to generate plasma; and a control unit configured to control the trajectory correcting laser apparatus such that intensity of the trajectory correcting laser beam applied to the first droplet is different from intensity of the trajectory correcting laser beam applied to the second droplet.

Abstract: An extreme ultraviolet light generation method according to one aspect of the present disclosure includes outputting a droplet to a first laser light irradiation region that is a region different from a plasma generation region, irradiating the droplet that reaches the first laser light irradiation region with first laser light to generate a deformed liquid target, irradiating the deformed liquid target that reaches a second laser light irradiation region that is a region different from the plasma generation region with second laser light to generate a fragment jet target, and irradiating at least a part of the fragment jet target that reaches the plasma generation region with third laser light that propagates in a direction intersecting a propagation direction of the second laser light.

Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract: A Thomson scattering measurement system according to the present disclosure includes: a transfer optical system provided on an optical path of a slit light beam group generated by division through a slit array and configured to transfer the slit light beam group to a plurality of transfer image groups separated from each other; and a second slit provided on an optical path of light from the transfer image groups and configured to selectively allow light from a plurality of transfer images positioned on a straight line extending in a direction corresponding to a first direction to pass through the second slit, the transfer images corresponding to slit light beams at positions different from each other in a second direction in the slit light beam group among transfer images included in the transfer image groups.

Abstract: An extreme ultraviolet light generating apparatus includes a target supply unit configured to output a target toward a predetermined region, a laser system configured to output a first laser beam with which the target is irradiated, a second laser beam with which the target is irradiated after being irradiated with the first laser beam, and a third laser beam with which the target is irradiated after being irradiated with the second laser beam, and an optical system configured to cause an irradiation beam diameter of the second laser beam at the target to be larger than an irradiation beam diameter of the third laser beam at the target.

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

Abstract: A Thomson scattering measurement system according to the present disclosure includes: a transfer optical system provided on an optical path of a slit light beam group generated by division through a slit array and configured to transfer the slit light beam group to a plurality of transfer image groups separated from each other; and a second slit provided on an optical path of light from the transfer image groups and configured to selectively allow light from a plurality of transfer images positioned on a straight line extending in a direction corresponding to a first direction to pass through the second slit, the transfer images corresponding to slit light beams at positions different from each other in a second direction in the slit light beam group among transfer images included in the transfer image groups.

Abstract: An extreme ultraviolet light generation apparatus includes: a target supply unit configured to output a target toward a predetermined region; a laser system configured to output a first laser beam to be applied to the target, a second laser beam to be applied to the target irradiated with the first laser beam, and a third laser beam to be applied to the target irradiated with the second laser beam; and a control unit configured to control the laser system such that the third laser beam is applied to the target after ions of elements constituting the target are eliminated from at least an optical path of the third laser beam.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: An extreme ultraviolet light generation method according to one aspect of the present disclosure includes outputting a droplet to a first laser light irradiation region that is a region different from a plasma generation region, irradiating the droplet that reaches the first laser light irradiation region with first laser light to generate a deformed liquid target, irradiating the deformed liquid target that reaches a second laser light irradiation region that is a region different from the plasma generation region with second laser light to generate a fragment jet target, and irradiating at least a part of the fragment jet target that reaches the plasma generation region with third laser light that propagates in a direction intersecting a propagation direction of the second laser light.

Abstract: A droplet detector preferably includes: an application unit configured to emit a pulsed beam at a predetermined cycle and apply a plurality of pulsed beams to a droplet moving in a detection region on a trajectory; and a light receiving unit configured to receive a scattered pulsed beam that is generated from the plurality of pulsed beams applied to the droplet and scattered by the droplet.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.