Patents by Inventor Tean-mu Shen

Tean-mu Shen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9204950
    Abstract: A plasma generator, a surface treatment method using the same, and a surface treatment method using the same for bio-tissue are provided. The plasma generator comprises a plasma tube, a reaction source tube, a first electrode and a second electrode. The plasma tube has a plasma outlet. The reaction source tube is disposed within the plasma tube, and has a reaction outlet. The first electrode and the second electrode are disposed on the plasma tube, wherein the second electrode is closer to the plasma outlet than the first electrode is. The plasma outlet of the reaction source is not projected beyond a lower portion of the first electrode.
    Type: Grant
    Filed: December 27, 2013
    Date of Patent: December 8, 2015
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Hung Liu, Muh-Wang Liang, Shen-Bin Wu, Tean-Mu Shen
  • Publication number: 20150050614
    Abstract: A plasma generator, a surface treatment method using the same, and a surface treatment method using the same for bio-tissue are provided. The plasma generator comprises a plasma tube, a reaction source tube, a first electrode and a second electrode. The plasma tube has a plasma outlet. The reaction source tube is disposed within the plasma tube, and has a reaction outlet. The first electrode and the second electrode are disposed on the plasma tube, wherein the second electrode is closer to the plasma outlet than the first electrode is. The plasma outlet of the reaction source is not projected beyond a lower portion of the first electrode.
    Type: Application
    Filed: December 27, 2013
    Publication date: February 19, 2015
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Hung LIU, Muh-Wang LIANG, Shen-Bin WU, Tean-Mu SHEN
  • Publication number: 20120240855
    Abstract: The deposition apparatus has a plurality of said transmission mechanisms arranged therein in a symmetrical manner. Each transmission mechanism comprises: a drive shaft, formed with a tapered end; a driving wheel, configured with a shaft hole for the tapered end to bore coaxially therethrough; a plurality of slide pieces, radially mounted to the driving wheel; a first elastic member, mounted enabling the plural slide pieces to be ensheathed thereby; a second elastic member, disposed between the first elastic member and the first axial end of the drive shaft while being mounted to the periphery of the driving wheel; an enclosure, configured with an opening; wherein, the driving wheel that is moving in a reciprocating manner drives the sliding pieces to slide in radial directions, thereby, causing the outer diameter of the first elastic member to change accordingly and enabling the opening of the enclosure to open or close in consequence.
    Type: Application
    Filed: July 6, 2011
    Publication date: September 27, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chen-Chung Du, Ming-Tung Chiang, Muh-Wang Liang, Kuan-Chou Chen, Tean-Mu Shen, Jung-Chen Ho
  • Patent number: 8198793
    Abstract: A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: June 12, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Fu-Ching Tung, Tean-Mu Shen, Jung-Chen Ho, Pei-Shan Wu, Chia-Ming Chen, Kuan-Chou Chen, Jung-Chen Chien, Muh-Wang Liang
  • Publication number: 20120132366
    Abstract: A plasma processing apparatus is disclosed, which includes: a cathode module comprising a plurality of first channels which generate plasma; an anode having a chamber which contains the cathode and having at least one plasma outlet corresponding to the first channels; an electrode connected to a high-frequency electrical power and the cathode; and a plurality of second channels penetrating through the anode; wherein each first channel and each second channel are disposed alternately. A first gas is introduced into the first channels ionized under high frequency electrical power. In the first channels, the free electrons collided brings high density of plasma. The generated plasma is expelled through the plasma outlet to form a plasma diffusion region. A second gas is introduced into the plasma diffusion region through the second channels to take part in the reaction of plasma.
    Type: Application
    Filed: June 10, 2011
    Publication date: May 31, 2012
    Applicant: Industrial Technology Research Institute
    Inventors: Pei-Shan Wu, Fu-Ching Tung, Jung-Chen Ho, Tean-Mu Shen, Chia-Ming Chen
  • Patent number: 8146923
    Abstract: A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: April 3, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Kuan-Chou Chen, Fu-Ching Tung, Chia-Ming Chen, Pei-Shan Wu, Tean-Mu Shen, Jung-Chen Ho
  • Publication number: 20120070590
    Abstract: This prevent disclosure provides a plasma enhanced atomic layer deposition apparatus and the controlling method thereof. The plasma enhanced atomic layer deposition apparatus includes: a plurality of reaction chambers, each of the reaction chambers having a first reaction space and a second reaction space; an adjustable partition unit controlled to separate or communicate the first and the second reaction spaces; and a plurality of heating carriers respectively disposed in the plurality of reaction chambers. The method manipulates the movement of the partition plate, leading to separation or communication between the first and second reaction spaces, so as to avoid the interference or inter-reaction between process gases and the resultant particles contaminating the substrates.
    Type: Application
    Filed: December 16, 2010
    Publication date: March 22, 2012
    Applicant: Industrial Technology Research Institute
    Inventors: Jen-Rong Huang, Tean-Mu Shen, Kang-Feng Lee, Chin-Chong Chiang, Sheng-Lang Lee, Jung-Chen Ho, Ching-Chiun Wang
  • Publication number: 20110079963
    Abstract: A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
    Type: Application
    Filed: November 10, 2009
    Publication date: April 7, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuan-Chou Chen, Fu-Ching Tung, Chia-Ming Chen, Pei-Shan Wu, Tean-Mu Shen, Jung-Chen Ho
  • Publication number: 20110073038
    Abstract: The present invention provides a gas distribution plate for providing at least two gas flowing channel. In one embodiment, the gas distribution plate has a first flowing channel, at least a second flowing channel disposed around the first flowing channel, and a tapered opening communicating with the first and the second flowing channel. In another embodiment, the gas distribution plate has a first flowing channel passing through a first and a second surface of the gas distribution plate, a second flowing channel paralleling to the first surface and a third flowing channel disposed at the second surface and communicating with the second flowing channel. The ends of the first and the third flowing channel have a tapered opening respectively. Besides, the present further provides a gas distribution apparatus for allowing at least two separate gases to be delivered independently into a process chamber while enabling the gases to be mixed completely after entering the processing chamber.
    Type: Application
    Filed: November 11, 2009
    Publication date: March 31, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jung-Chen CHIEN, Jun-Chin Liu, Hung-Jen Yang, Tean-Mu Shen, Muh-Wang Liang
  • Patent number: 7721673
    Abstract: The present invention provides a hollow cathode discharging apparatus including a hollow anode electrode, a hollow cathode electrode insulatedly fixed in the hollow anode electrode, a gas distribution pipe fixed in the hollow cathode electrode. The hollow anode electrode and the hollow cathode electrode are formed with anode openings and cathode openings respectively. Defined by the gas distribution pipe and the hollow cathode electrode and along the axis thereof is a spiral pathway winding through the cathode openings, so as to form a plurality of continuous and communicated reaction chambers. The gas distribution pipe is disposed with gas separation apertures communicated and adapted to introduce a reactive gas into the reaction chambers. The communicated reaction chambers enable uniform distribution of the reactive gas and thereby facilitate scale-up of the apparatus in axial. Accordingly, the present invention overcomes drawbacks of the prior art.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: May 25, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Chen-Chung Du, Ming-Tung Chiang, Fu-Ching Tung, Chin-Feng Cheng, Tean-Mu Shen
  • Publication number: 20100123381
    Abstract: A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
    Type: Application
    Filed: March 26, 2009
    Publication date: May 20, 2010
    Applicant: Industrial Technology Research Institute
    Inventors: FU-CHING TUNG, Tean-Mu Shen, Jung-Chen Ho, Pei-Shan Wu, Chia-Ming Chen, Kuan-Chou Chen, Jung-Chen Chien, Muh-Wang Liang
  • Publication number: 20090151637
    Abstract: A microwave-excited plasma source using a ridged wave-guide line-type microwave plasma reactor is disclosed. The microwave-excited plasma source comprises a reaction chamber, a ridged wave-guide and a separation plate. The ridged wave-guide is disposed on the reaction chamber, and comprises a frame portion, a ridge portion and a line-shaped slot. The line-shaped slot is disposed on a first side of the frame portion, and the ridge portion facing the line-shaped slot is disposed on a second side of the frame portion. The separation plate is disposed on the line-shaped slot. Moreover, the ridged wave-guide is suitable for concentrating microwave power, which is transmitted to the reaction chamber through the line-shaped slot in order to excite plasma.
    Type: Application
    Filed: May 29, 2008
    Publication date: June 18, 2009
    Applicant: Industrial Technology Research Institute
    Inventors: CHIH-CHEN CHANG, TUNG-CHUAN WU, FU-CHING TUNG, MUH-WANG LIANG, CHING-HUEI WU, CHAN-HSING LO, TEAN-MU SHEN, JUNG-CHEN CHIEN, JUNG-CHEN HO
  • Patent number: 7425710
    Abstract: An anode layer particle beam device includes a base, at least an anode placed on top of the base, an insulation layer set between the anode and the base, at least one magnetic pole, made of magnetic and conductive material and can be used as a cathode, an electric discharge channel, positioned between the anode and the magnetic pole, and an insulating material, placed in the electric discharge channel to serve as an insulator between the anode and the magnetic pole. The magnetic pole is positioned on top of the base and on an somewhat elevated outer periphery of the aforementioned anode (with the center of the later also as its center). An orifice is also set on the radiation path of the anode. Accordingly, a process gas stream can be directed into the electric discharge channel and, after being applied with a biased electric field, with the aide of the anode and the magnetic pole device, a particle beam can be generated and radiated out of the channel.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: September 16, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Ping-Chun Liu, Ming-Te Hsiung, Ming-Hsin Liu, Tean-Mu Shen
  • Publication number: 20080106202
    Abstract: The present invention provides a hollow cathode discharging apparatus including a hollow anode electrode, a hollow cathode electrode insulatedly fixed in the hollow anode electrode, a gas distribution pipe fixed in the hollow cathode electrode. The hollow anode electrode and the hollow cathode electrode are formed with anode openings and cathode openings respectively. Defined by the gas distribution pipe and the hollow cathode electrode and along the axis thereof is a spiral pathway winding through the cathode openings, so as to form a plurality of continuous and communicated reaction chambers. The gas distribution pipe is disposed with gas separation apertures communicated and adapted to introduce a reactive gas into the reaction chambers. The communicated reaction chambers enable uniform distribution of the reactive gas and thereby facilitate scale-up of the apparatus in axial. Accordingly, the present invention overcomes drawbacks of the prior art.
    Type: Application
    Filed: January 31, 2007
    Publication date: May 8, 2008
    Inventors: Chen-Chung Du, Ming-Tung Chiang, Fu-Ching Tung, Chin-Feng Cheng, Tean-Mu Shen
  • Patent number: 7278839
    Abstract: A multi-stage vacuum pump includes a plurality of casings connected in series and each casing defining a respective compression chamber, a plurality of partition plates each set in between each two casings. When compressed by rotors at shafts in one compression chamber, compressed air passes through the air path formed in the corresponding partition plate to the next compression chamber for further compression, and finally compressed air passes to the last compression chamber through the air path formed in the last partition plate. Because the invention is designed to let compressed air directly pass through the air path in each partition plate, the outer diameter and volume of the multi-stage vacuum pump can be minimized to reduce the weight and the manufacturing cost.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: October 9, 2007
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Hsin Liu, Hong-Sheng Fang, Tean-Mu Shen, Jung-Chen Chien, Jiun-Hung Chen
  • Publication number: 20060138342
    Abstract: An anode layer particle beam device includes a base, at least an anode placed on top of the base, an insulation layer set between the anode and the base, at least one magnetic pole, made of magnetic and conductive material and can be used as a cathode, an electric discharge channel, positioned between the anode and the magnetic pole, and an insulating material, placed in the electric discharge channel to serve as an insulator between the anode and the magnetic pole. The magnetic pole is positioned on top of the base and on an somewhat elevated outer periphery of the aforementioned anode (with the center of the later also as its center). An orifice is also set on the radiation path of the anode. Accordingly, a process gas stream can be directed into the electric discharge channel and, after being applied with a biased electric field, with the aide of the anode and the magnetic pole device, a particle beam can be generated and radiated out of the channel.
    Type: Application
    Filed: June 6, 2005
    Publication date: June 29, 2006
    Inventors: Ping-Chun Liu, Ming-Te Hsiung, Ming-Hsin Liu, Tean-Mu Shen
  • Publication number: 20050089424
    Abstract: A multi-stage vacuum pump includes a plurality of casings connected in series and each casing defining a respective compression chamber, a plurality of partition plates each set in between each two casings. When compressed by rotors at shafts in one compression chamber, compressed air passes through the air path formed in the corresponding partition plate to the next compression chamber for further compression, and finally compressed air passes to the last compression chamber through the air path formed in the last partition plate. Because the invention is designed to let compressed air directly pass through the air path in each partition plate, the outer diameter and volume of the multi-stage vacuum pump can be minimized to reduce the weight and the manufacturing cost.
    Type: Application
    Filed: January 29, 2004
    Publication date: April 28, 2005
    Inventors: Ming-Hsin Liu, Hong-Sheng Fang, Tean-Mu Shen, Jung-Chen Chien, Jiun-Hung Chen
  • Patent number: 6508639
    Abstract: A combination double screw rotor assembly includes a first and a second screw rotor arranged in parallel in a casing, two sets of bearings respectively mounted in the casing near the outlet to support the shafts, and a plurality of locking means respectively fastened to the shafts near the inlet. The first and the second screw rotor each has a low pressure screw rotor element, a high pressure screw rotor element, and a spiral thread formed of a first spiral thread segment at the high pressure screw rotor element and a second spiral thread segment at the low pressure screw rotor element, the first spiral thread segment having an uniform short pitch, the second spiral thread segment having an uniform long pitch, the first spiral thread segment and second spiral thread segment of the first and the second screw rotor being respectively meshed together.
    Type: Grant
    Filed: September 6, 2001
    Date of Patent: January 21, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Chun-chien Chen, Tean-mu Shen, Jung-chen Chien, Ming-Hsin Liu
  • Publication number: 20020031439
    Abstract: A combination double screw rotor assembly includes a first and a second screw rotor arranged in parallel in a casing, two sets of bearings respectively mounted in the casing near the outlet to support the shafts, and a plurality of locking means respectively fastened to the shafts near the inlet. The first and the second screw rotor each has a low pressure screw rotor element, a high pressure screw rotor element, and a spiral thread formed of a first spiral thread segment at the high pressure screw rotor element and a second spiral thread segment at the low pressure screw rotor element, the first spiral thread segment having an uniform short pitch, the second spiral thread segment having an uniform long pitch, the first spiral thread segment and second spiral thread segment of the first and the second screw rotor being respectively meshed together.
    Type: Application
    Filed: September 6, 2001
    Publication date: March 14, 2002
    Inventors: Chun-Chien Chen, Tean-Mu Shen, Jung-Chen Chien, Ming-Hsin Liu
  • Patent number: 6341951
    Abstract: A combination double screw rotor assembly includes a first screw rotor and a second screw rotor arranged in parallel in a casing, the first screw rotor and the second screw rotor each having a low pressure screw rotor element, a high pressure screw rotor element, and a spiral thread formed of a first spiral thread segment at the high pressure screw rotor element and a second spiral thread segment at the low pressure screw rotor element, the first spiral thread segment having an uniform short pitch, the second spiral thread segment having an uniform long pitch, the upper spiral thread segment and second spiral thread segment of the first screw rotor being respectively meshed with the first spiral thread segment and second spiral thread segment of the second screw rotor.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: January 29, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Chun-chien Chen, Tean-mu Shen, Jung-chen Chein, Ming-Hsin Liu