Patents by Inventor Teru Sakakibara

Teru Sakakibara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROTECTIVE COMPOSITION
    Publication number: 20220145094
    Abstract: A protective composition is used to form a protective coating on a metal and contains a water-soluble polyester resin.
    Type: Application
    Filed: March 9, 2020
    Publication date: May 12, 2022
    Inventors: Teru SAKAKIBARA, Shinya KOMABIKI, Koji MAEDA
  • Method for fabricating semiconductor device chips and protective composition
    Patent number: 11319458
    Abstract: A protective composition contains a water-soluble polyester resin including a polyvalent carboxylic acid residue and a polyvalent alcohol residue. The polyvalent carboxylic acid residue includes: a polyvalent carboxylic acid residue having a metal sulfonate group; and a naphthalene dicarboxylic acid residue. The proportion of the polyvalent carboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 25 mol % to 70 mol %. The proportion of the naphthalene dicarboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 30 mol % to 75 mol %.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: May 3, 2022
    Assignees: GOO CHEMICAL CO., LTD., PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Teru Sakakibara, Shinya Komabiki, Koji Maeda, Hidehiko Karasaki
  • METHOD FOR FABRICATING SEMICONDUCTOR DEVICE CHIPS AND PROTECTIVE COMPOSITION
    Publication number: 20210324226
    Abstract: A protective composition contains a water-soluble polyester resin including a polyvalent carboxylic acid residue and a polyvalent alcohol residue. The polyvalent carboxylic acid residue includes: a polyvalent carboxylic acid residue having a metal sulfonate group; and a naphthalene dicarboxylic acid residue. The proportion of the polyvalent carboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 25 mol % to 70 mol %. The proportion of the naphthalene dicarboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 30 mol % to 75 mol %.
    Type: Application
    Filed: March 9, 2020
    Publication date: October 21, 2021
    Inventors: Teru SAKAKIBARA, Shinya KOMABIKI, Koji MAEDA, Hidehiko KARASAKI
  • Polyester resin, hot melt adhesive, and hot melt adhesive solution
    Patent number: 9951258
    Abstract: The polyester resin for a hot melt adhesive includes polycarboxylic acid residues and polyhydric alcohol residues. The polycarboxylic acid resides contain aliphatic polycarboxylic acid residues in a proportion within the range of 50 to 80 mol %. The polyhydric alcohol residues contain propylene glycol residues in a proportion within the range 5 to 60 mol %.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: April 24, 2018
    Assignee: GOO CHEMICAL CO., LTD.
    Inventors: Teru Sakakibara, Koji Maeda, Yusuke Numamoto
  • POLYESTER RESIN, HOT MELT ADHESIVE, AND HOT MELT ADHESIVE SOLUTION
    Publication number: 20160194533
    Abstract: The polyester resin for a hot melt adhesive includes polycarboxylic acid residues and polyhydric alcohol residues. The polycarboxylic acid resides contain aliphatic polycarboxylic acid residues in a proportion within the range of 50 to 80 mol %. The polyhydric alcohol residues contain propylene glycol residues in a proportion within the range 5 to 60 mol %.
    Type: Application
    Filed: July 30, 2013
    Publication date: July 7, 2016
    Inventors: Teru Sakakibara, Koji Maeda, Yusuke Numamoto