Patents by Inventor Tetsuo Yamamoto

Tetsuo Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190218664
    Abstract: A substrate processing apparatus includes a substrate mounting table on which a substrate is mounted, a process chamber including the substrate mounting table, a gas supply unit configured to supply a gas into the process chamber, and a plasma generating unit configured to convert the gas supplied into the process chamber from the gas supply unit into a plasma state. The plasma generating unit includes a plasma generating chamber configured to serve as a flow path of the gas supplied into the process chamber from the gas supply unit, and a plasma generating conductor configured by a conductor disposed to surround the plasma generating chamber. The plasma generating conductor includes a plurality of main conductor parts extending along a mainstream direction of the gas within the plasma generating chamber, and a plurality of connection conductor parts configured to electrically connect the plurality of main conductor parts with each other.
    Type: Application
    Filed: March 27, 2019
    Publication date: July 18, 2019
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Tetsuo YAMAMOTO, Kazuyuki TOYODA, Shun MATSUI
  • Patent number: 10355441
    Abstract: A laser module includes: a photonic crystal surface-emitting laser element; a collimating lens array for producing a parallel optical beam; a condenser lens for condensing the optical beam; and an optical fiber which receives the optical beam on one end and transmits the optical beam to the outside. In the collimating lens array, an aperture portion corresponding to a collimating lens allows passage of the optical beam with an energy of not less than 94.0% and not more than 99.5% with respect to 100% of the energy of the optical beam incident on the collimating lens array.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: July 16, 2019
    Assignees: MITSUBISHI ELECTRIC CORPORATION, KYOTO UNIVERSITY, HAMAMATSU PHOTONICS KK., ROHM CO., LTD.
    Inventors: Tatsuya Yamamoto, Kazuki Kuba, Masato Kawasaki, Yoko Inoue, Tetsuo Kojima, Junichi Nishimae, Susumu Noda
  • Patent number: 10268175
    Abstract: A computer-implemented method includes obtaining one of image information of a recording medium placed in a sensing area and tag information attached to the recording medium; obtaining environmental control information corresponding to the obtained one of image information and tag information from a storage; and based on the obtained environmental control information, controlling one or more of a light-emitting device, a display device, an audio device, a temperature control device, an air-flow control device, a vibration device, and an aroma emitting device that are disposed around the sensing area.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: April 23, 2019
    Assignees: FUJITSU LIMITED, FUJTISU FACILITIES LIMITED
    Inventors: Yasushi Sugama, Yasushi Tateno, Masatoshi Kimura, Kazunori Maruyama, Tetsuo Yamamoto, Kota Ichinose
  • Publication number: 20190006218
    Abstract: A substrate processing technique includes: a first heating device configured to heat a substrate to a first processing temperature; a first process chamber provided with the first heating device; a second heating device configured to heat the substrate to a second processing temperature utilizing microwaves, the second processing temperature being higher than the first processing temperature; a second process chamber provided with the second heating device; a substrate placement portion configured to load and unload the substrate with respect to the first process chamber and the second process chamber by placing and rotating the substrate; and a controller configured to respectively control the first heating device, the second heating device, and the substrate placement portion.
    Type: Application
    Filed: August 14, 2018
    Publication date: January 3, 2019
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Kazuyuki TOYODA, Kazuhiro YUASA, Tetsuo YAMAMOTO
  • Patent number: 10019636
    Abstract: An object detection apparatus includes: an image processing circuit configured to: (i) derive optical flows based on feature points of captured images periodically captured by a camera that captures images of the surroundings of the vehicle; (ii) group the feature points relating to the optical flows based on positions of the feature points to derive one or more groups; and (iii) detect the object based on a size of each of the one or more groups; and a microcomputer that communicates with the image processing circuit and is configured to: (a) obtain a speed of the vehicle; and (b) set a parameter that affects the size of the one or more groups such that as the speed of the vehicle is slower, the size of the one or more groups is greater.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: July 10, 2018
    Assignee: FUJITSU TEN LIMITED
    Inventor: Tetsuo Yamamoto
  • Patent number: 9811741
    Abstract: An object detection circuit detects an object moving in a periphery of a vehicle by use of a shot image. A state judgment part changes a parameter relevant to a detection function so as to change whether the detection function of the object detection circuit is to be enabled or disabled while the object detection circuit is kept activated. Thus, even when the detection function of the object detection circuit is disabled, the object detection circuit is kept activated. Therefore, since there is no need to restart the object detection circuit in order to enable the detection function of the object detection circuit, a detection result by the object detection circuit is promptly obtained.
    Type: Grant
    Filed: January 15, 2014
    Date of Patent: November 7, 2017
    Assignee: FUJITSU TEN LIMITED
    Inventor: Tetsuo Yamamoto
  • Patent number: 9789820
    Abstract: An object detection apparatus that detects an object in a vicinity of a vehicle includes: (a) an image processing circuit configured to: (i) derive vectors representing movement of feature points in captured images acquired periodically by a camera that captures images of the vicinity of the vehicle; and (ii) detect the object based on the vectors; and (b) a controller configured to (i) acquire a velocity of the vehicle; and (ii) set a parameter that affects a number of the feature points based on the velocity of the vehicle.
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: October 17, 2017
    Assignee: FUJITSU TEN LIMITED
    Inventor: Tetsuo Yamamoto
  • Publication number: 20170271176
    Abstract: Cleaning processing of each of the inside of a shower head and the inside of a processing space can be sufficiently or appropriately performed even when gas supply is performed via the shower head. A substrate processing apparatus includes a processing space for processing a substrate, a shower head buffer chamber disposed adjacent to the processing space with a dispersion plate having through-holes therebetween, an inert gas supply system configured to supply an inert gas into the shower head buffer chamber to form a gas curtain in the shower head buffer chamber, a first cleaning gas supply system configured to supply a cleaning gas into the processing space, and a control member configured to control the inert gas supply system and the first cleaning gas supply system to concurrently supply the cleaning gas into the processing space and the inert gas into the shower head buffer chamber.
    Type: Application
    Filed: April 27, 2017
    Publication date: September 21, 2017
    Applicant: HITACHI KOKUSAI ELECTRIC, INC.
    Inventors: Takafumi SASAKI, Tetsuo Yamamoto
  • Publication number: 20170218474
    Abstract: A method of manufacturing a high-strength hot rolled steel sheet by hot rolling a steel having a chemical composition including, by mass %: C: more than 0.010% and not more than 0.06%, Si: not more than 0.3%, Mn: not more than 0.8%, P: not more than 0.03%, S: not more than 0.02%, Al: not more than 0.1%, N: not more than 0.01% and Ti: 0.05 to 0.10%, the balance including Fe and inevitable impurities, including: after the steel is heated to an austenite single phase region, the steel is finish rolled at a finishing delivery temperature of 860° C. to 1050° C., the steel sheet is cooled at an average cooling rate of not less than 30° C/s in a temperature range of from a temperature after the completion of the finish rolling to 750° C., and the steel sheet is coiled into a coil at a coiling temperature of 580° C. to 700° C.
    Type: Application
    Filed: April 11, 2017
    Publication date: August 3, 2017
    Inventors: Yoshimasa Funakawa, Tetsuo Yamamoto, Hiroshi Uchomae, Hiroshi Nakano, Taro Kizu
  • Publication number: 20170183775
    Abstract: The present disclosure provides a substrate processing apparatus capable of preventing a heating process from having adverse effects on an operation of supplying gas, even though a shower head is used to supply gas onto a substrate. The substrate processing apparatus includes: a process module having a process chamber where a substrate is processed; a substrate loading/unloading port; a cooling mechanism; a substrate support; a heating unit; a shower head including a dispersion plate made of a material having a first thermal expansion rate; a dispersion plate supporting unit made of a material having a second thermal expansion rate different from the first thermal expansion rate; a first position regulating part configured to regulate positions of the dispersion plate and the dispersion plate supporting unit; and a second position regulating part configured to regulate the positions of the dispersion plate and the dispersion plate supporting unit.
    Type: Application
    Filed: December 22, 2016
    Publication date: June 29, 2017
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventor: Tetsuo YAMAMOTO
  • Publication number: 20170159181
    Abstract: A substrate processing apparatus includes a substrate support part provided with a first heating part, configured to heat a substrate, a gas supply part installed above the substrate support part and configured to supply a process gas to the substrate, a first exhaust port configured to exhaust an atmosphere of a process space existing above the substrate support part, a gas distribution part installed to face the substrate support part, a lid part provided with a second exhaust port configured to exhaust a buffer space existing between the gas supply part, and the gas distribution part, a rectifying part installed within the buffer space and provided with a second heating part at least partially facing the second exhaust port, the rectifying part configured to rectify the process gas, and a control part configured to control the second heating part.
    Type: Application
    Filed: December 1, 2016
    Publication date: June 8, 2017
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kazuyuki TOYODA, Tetsuo YAMAMOTO
  • Patent number: 9657382
    Abstract: A high-strength hot rolled steel sheets with excellent stretch flangeability has small variations in mechanical properties in individual coils. Variations in strength from place to place in a coil are decreased by minimally reducing the Si and Mn contents to suppress the occurrence of problems such as segregation. Further, the microstructure of the steel sheets is configured such that a ferrite phase represents an area ratio of not less than 95%, the ferrite crystal grains have an average grain size of not less than 1 ?m, and the ferrite crystal grains contain TiC with an average particle size of not more than 7 nm dispersed in the crystal grains.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: May 23, 2017
    Assignee: JFE Steel Corporation
    Inventors: Yoshimasa Funakawa, Tetsuo Yamamoto, Hiroshi Uchomae, Hiroshi Nakano, Taro Kizu
  • Patent number: 9646821
    Abstract: A method of manufacturing a semiconductor device includes processing a substrate accommodated in a process container accommodated in a housing by supplying a process gas onto the substrate; and exhausting the process container using an exhaust system comprising a first exhaust pipe connected to the process container, the first exhaust pipe having circular or oval cross-section perpendicular to an exhausting direction thereof; and a second exhaust pipe connected to the first exhaust pipe, the second exhaust pipe having square or rectangular cross-section perpendicular to the exhausting direction, wherein at least a portion of the second exhaust pipe is disposed within the housing.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: May 9, 2017
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Tetsuo Yamamoto, Tsutomu Kato, Satoshi Okada, Yuji Takebayashi
  • Patent number: 9644265
    Abstract: Provided are a method of manufacturing semiconductor device, a substrate processing apparatus and a recording medium which are capable of efficiently removing a deposited film in a shower head and suppressing generation of particles. The method of manufacturing a semiconductor device includes (a) forming a film on a substrate by supplying a film forming gas and an inert gas to the substrate in a processing chamber via a shower head, and (b) removing a deposited film deposited in the shower head in (a) by supplying to the shower head an inert gas, which has a temperature lower than that of the inert gas supplied in (a), into the shower head without the substrate loaded in the processing chamber.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: May 9, 2017
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Takafumi Sasaki, Tetsuo Yamamoto
  • Publication number: 20170053173
    Abstract: An object detection apparatus includes: an image processing circuit configured to: (i) derive optical flows based on feature points of captured images periodically captured by a camera that captures images of the surroundings of the vehicle; (ii) group the feature points relating to the optical flows based on positions of the feature points to derive one or more groups; and (iii) detect the object based on a size of each of the one or more groups; and a microcomputer that communicates with the image processing circuit and is configured to: (a) obtain a speed of the vehicle; and (b) set a parameter that affects the size of the one or more groups such that as the speed of the vehicle is slower, the size of the one or more groups is greater.
    Type: Application
    Filed: June 28, 2016
    Publication date: February 23, 2017
    Applicant: FUJITSU TEN LIMITED
    Inventor: Tetsuo YAMAMOTO
  • Publication number: 20170031341
    Abstract: A computer-implemented method includes obtaining one of image information of a recording medium placed in a sensing area and tag information attached to the recording medium; obtaining environmental control information corresponding to the obtained one of image information and tag information from a storage; and based on the obtained environmental control information, controlling one or more of a light-emitting device, a display device, an audio device, a temperature control device, an air-flow control device, a vibration device, and an aroma emitting device that are disposed around the sensing area.
    Type: Application
    Filed: July 25, 2016
    Publication date: February 2, 2017
    Inventors: Yasushi Sugama, Yasushi Tateno, Masatoshi Kimura, Kazunori Maruyama, Tetsuo Yamamoto, Kota Ichinose
  • Patent number: 9502236
    Abstract: There is provided a method of manufacturing a semiconductor device by processing a substrate by alternately supplying a first processing gas and a second processing gas plasmatized by a plasma unit to a processing container. The method includes: starting a supply of an electric power to plasmatize the second processing gas to the plasma unit without supplying the second processing gas to the plasma unit; and starting a supply of the second processing gas with the electric power being supplied to the plasma unit.
    Type: Grant
    Filed: March 18, 2015
    Date of Patent: November 22, 2016
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Yukitomo Hirochi, Kazuyuki Toyoda, Kazuhiro Morimitsu, Taketoshi Sato, Tetsuo Yamamoto
  • Publication number: 20160276135
    Abstract: A substrate processing apparatus includes a substrate mounting table on which a substrate is mounted, a process chamber including the substrate mounting table, a gas supply unit configured to supply a gas into the process chamber, and a plasma generating unit configured to convert the gas supplied into the process chamber from the gas supply unit into a plasma state. The plasma generating unit includes a plasma generating chamber configured to serve as a flow path of the gas supplied into the process chamber from the gas supply unit, and a plasma generating conductor configured by a conductor disposed to surround the plasma generating chamber. The plasma generating conductor includes a plurality of main conductor parts extending along a mainstream direction of the gas within the plasma generating chamber, and a plurality of connection conductor parts configured to electrically connect the plurality of main conductor parts with each other.
    Type: Application
    Filed: January 26, 2016
    Publication date: September 22, 2016
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Tetsuo YAMAMOTO, Kazuyuki TOYODA, Shun MATSUI
  • Patent number: 9412582
    Abstract: A structure for constituting a process chamber in which a plurality of substrates is processed by reacting a predetermined precursor gas therein includes an outer tube having a cylindrical shape with an upper end portion closed and a lower end portion opened, and an inner tube, installed within the outer tube, including a first exhaust slit and a second exhaust slit through which the predetermined precursor gas is exhausted, the first exhaust slit located in a substrate arrangement region in which the plurality of substrates are arranged, and the second exhaust slit located in a region lower than the substrate arrangement region.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: August 9, 2016
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Takafumi Sasaki, Kazuhiro Morimitsu, Eisuke Nishitani, Tetsuo Yamamoto, Masanao Fukuda
  • Publication number: 20160180176
    Abstract: An object detection apparatus that detects an object in a vicinity of a vehicle includes: (a) an image processing circuit configured to: (i) derive vectors representing movement of feature points in captured images acquired periodically by a camera that captures images of the vicinity of the vehicle; and (ii) detect the object based on the vectors; and (b) a controller configured to (i) acquire a velocity of the vehicle; and (ii) set a parameter that affects a number of the feature points based on the velocity of the vehicle.
    Type: Application
    Filed: October 19, 2015
    Publication date: June 23, 2016
    Inventor: Tetsuo YAMAMOTO