Patents by Inventor Tetsuya Akashi

Tetsuya Akashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190295817
    Abstract: An electron microscope that measures electromagnetic field information separates an electric field distribution and a magnetic field distribution of a specimen with high precision to measure the electromagnetic field information.
    Type: Application
    Filed: March 13, 2017
    Publication date: September 26, 2019
    Inventors: Toshiaki TANIGAKI, Akira SUGAWARA, Tetsuya AKASHI
  • Publication number: 20190027338
    Abstract: Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.
    Type: Application
    Filed: July 9, 2018
    Publication date: January 24, 2019
    Applicant: HITACHI, LTD.
    Inventors: Akira SUGAWARA, Yoshio TAKAHASHI, Tetsuya AKASHI, Toshiaki TANIGAKI
  • Patent number: 7872755
    Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: January 18, 2011
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7816648
    Abstract: In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
    Type: Grant
    Filed: March 7, 2005
    Date of Patent: October 19, 2010
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda
  • Patent number: 7750298
    Abstract: An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle ? among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth ? of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth ? of the interference fringes.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: July 6, 2010
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7655905
    Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: February 2, 2010
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20090273789
    Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.
    Type: Application
    Filed: January 27, 2006
    Publication date: November 5, 2009
    Applicant: RIKEN
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7538323
    Abstract: The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprisms 9u, 9b are used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.
    Type: Grant
    Filed: January 7, 2005
    Date of Patent: May 26, 2009
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20090045339
    Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
    Type: Application
    Filed: May 11, 2006
    Publication date: February 19, 2009
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Publication number: 20080302965
    Abstract: In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
    Type: Application
    Filed: March 7, 2005
    Publication date: December 11, 2008
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda
  • Publication number: 20080258058
    Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double-biprism electron interferometer, however, is the same as the optical system of the single electron biprism interferometer in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.
    Type: Application
    Filed: January 27, 2006
    Publication date: October 23, 2008
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 4114670
    Abstract: At least one screw means provided with an angular stepped neck by certain distance from the bearing surface of a screw head thereof is fastened firmly onto a metal plate having at least one opening of a shape corresponding to that of the stepped neck through the opening at the surface of a receiving means having at least one hole bored therethrough to insert a screw body of the screw means thereinto by pressing the stepped neck and the receiving means against each other to cause the stepped neck and the opening to be deformed plastically so that the metal plate is tightly clamped between the deformed stepped neck and the screw head to form the fastened assembly of the metal plate and the screw means.When fastening a plurality of screw means onto the metal plate, a receiving means having a plurality of holes corresponding to the screw bodies respectively is used for upsetting operation.
    Type: Grant
    Filed: July 19, 1976
    Date of Patent: September 19, 1978
    Assignee: Topura Co., Ltd. (Kabushiki Kaisha Tohpura)
    Inventors: Tetsuya Akashi, Akio Nikawa