Patents by Inventor Theodorus Marinus Modderman
Theodorus Marinus Modderman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150331334Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: ApplicationFiled: July 23, 2015Publication date: November 19, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich BANINE, Theodorus Hubertus Josephus BISSCHOPS, Marcel Mathijs Theodore Marie DIERICHS, Theodorus Marinus MODDERMAN
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Patent number: 9116443Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.Type: GrantFiled: July 21, 2011Date of Patent: August 25, 2015Assignee: ASML NETHERLANDS B.V.Inventor: Theodorus Marinus Modderman
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Patent number: 9110389Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: GrantFiled: September 23, 2011Date of Patent: August 18, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
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Patent number: 9091940Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: GrantFiled: December 20, 2012Date of Patent: July 28, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Joeri Lof, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Alexander Straaijer, Bob Streefkerk, Joannes Theodoor De Smit, Helmar Van Santen
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Publication number: 20150192864Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.Type: ApplicationFiled: March 18, 2015Publication date: July 9, 2015Applicant: ASML NETHERLANDS B.V.Inventor: Theodorus Marinus MODDERMAN
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Publication number: 20150009479Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.Type: ApplicationFiled: September 29, 2014Publication date: January 8, 2015Applicant: ASML NETHERLANDS B.V.Inventor: Theodorus Marinus MODDERMAN
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Patent number: 8797503Abstract: In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.Type: GrantFiled: May 31, 2011Date of Patent: August 5, 2014Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20130301017Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: December 20, 2012Publication date: November 14, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Joeri Lof, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Alexander Straaijer, Bob Streefkerk, Joannes Theodoor De Smit, Helmar Van Santen
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Patent number: 8462312Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.Type: GrantFiled: July 22, 2011Date of Patent: June 11, 2013Assignee: ASML Netherlands B.V.Inventor: Theodorus Marinus Modderman
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Publication number: 20130128256Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.Type: ApplicationFiled: December 3, 2012Publication date: May 23, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
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Patent number: 8363208Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: GrantFiled: February 4, 2010Date of Patent: January 29, 2013Assignee: ASML Netherlands B.V.Inventors: Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Theodorus Marinus Modderman, Marcel Mathijs Theodore Marie Dierichs
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Patent number: 8344341Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.Type: GrantFiled: August 9, 2010Date of Patent: January 1, 2013Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
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Patent number: 8233137Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.Type: GrantFiled: December 3, 2008Date of Patent: July 31, 2012Assignee: ASML Netherlands B.V.Inventor: Theodorus Marinus Modderman
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Patent number: 8208120Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: GrantFiled: April 9, 2008Date of Patent: June 26, 2012Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
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Publication number: 20120013872Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: ApplicationFiled: September 23, 2011Publication date: January 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich BANINE, Theodorus Hubertus Josephus BISSCHOPS, Marcel Mathijs Theodore Marie DIERICHS, Theodorus Marinus MODDERMAN
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Publication number: 20120008117Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.Type: ApplicationFiled: September 22, 2011Publication date: January 12, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
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Publication number: 20110279806Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.Type: ApplicationFiled: July 21, 2011Publication date: November 17, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Theodorus Marinus Modderman
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Publication number: 20110279804Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.Type: ApplicationFiled: July 22, 2011Publication date: November 17, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Theodorus Marinus Modderman
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Publication number: 20110228241Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: May 31, 2011Publication date: September 22, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Patent number: 7982850Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: GrantFiled: May 15, 2008Date of Patent: July 19, 2011Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen