Patents by Inventor Theresa Kramer Guarini

Theresa Kramer Guarini has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090162570
    Abstract: The present invention generally provides apparatus and methods for processing a semiconductor substrate. Particularly, the present invention provides an inductively coupled plasma reactor having improved process uniformity. One embodiment of the present invention provides an apparatus for processing a substrate comprising a chamber body defining a process volume configured to process the substrate therein, an adjustable coil assembly coupled to the chamber body outside the process volume, a supporting pedestal disposed in the process volume and configured to support the substrate therein, and a gas injection assembly configured to supply a process gas towards a first process zone and a second process zone independently.
    Type: Application
    Filed: December 19, 2007
    Publication date: June 25, 2009
    Inventors: Johanes F. Swenberg, Wei Liu, Hanh D. Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini, Michael J. Mark, Theresa Kramer Guarini, Woong Choi
  • Publication number: 20080003702
    Abstract: Aspects of the present invention include methods and apparatuses that may be used for monitoring and adjusting plasma in a substrate processing system by using a plasma data monitoring assembly. For example, an optical instrument adapted to measure properties of light over a specific portion of the electromagnetic spectrum may be used to detect one or more wavelength intensities from the plasma. Then, an electronic device, for example a computer software may analyze the wavelength intensities and a match circuit may then be adjusted. In this way, consistent plasma may be obtained. In other embodiments, the present invention may utilize the relationship between chamber pressure, substrate temperature, coil currents and/or the plasma in order to adjust and maintain a repeatable plasma process.
    Type: Application
    Filed: June 28, 2006
    Publication date: January 3, 2008
    Inventors: James P. Cruse, Theresa Kramer Guarini, Jeffrey Charles Pierce