Patents by Inventor Thomas Jewell

Thomas Jewell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9230800
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: January 5, 2016
    Assignee: Novellus Systems, Inc.
    Inventors: Adrien LaVoie, Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh, Dennis M. Hausmann, Jon Henri, Thomas Jewell, Ming Li, Bryan Schlief, Antonio Xavier, Thomas W. Mountsier, Bart J. van Schravendijk, Easwar Srinivasan, Mandyam Sriram
  • Patent number: 8972751
    Abstract: A system may include a database configured to store information including characteristics of a plurality of components. The system may further include a server in communication with the database and configured to receive design parameters indicative of a plurality of loads of a multiple-load device; determine a plurality of power supply architectures that may be used to provide power supply solutions satisfying the plurality of loads, each power supply architecture including at least one position requiring a component configured to satisfy a load requirement; for each one of at least a subset of the plurality of power supply architectures, determine, based on the characteristics of the plurality of components, at least one component configured to satisfy the corresponding load requirement for each position of the one of the power supply architectures; and generate at least one power supply design in accordance with the power supply architectures and the determined components.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: March 3, 2015
    Assignee: National Semiconductor Corporation
    Inventors: Jeffrey R. Perry, Martin Garrison, Dien Mac, Howard Chen, Phil Gibson, Thomas Jewell
  • Publication number: 20140209562
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
    Type: Application
    Filed: March 31, 2014
    Publication date: July 31, 2014
    Applicant: Novellus Systems, Inc.
    Inventors: Adrien LaVoie, Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh, Dennis M. Hausmann, Jon Henri, Thomas Jewell, Ming Li, Bryan Schlief, Antonio Xavier, Thomas W. Mountsier, Bart J. van Schravendijk, Easwar Srinivasan, Mandyam Sriram
  • Patent number: 8728956
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
    Type: Grant
    Filed: April 11, 2011
    Date of Patent: May 20, 2014
    Assignee: Novellus Systems, Inc.
    Inventors: Adrien LaVoie, Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh, Dennis M. Hausmann, Jon Henri, Thomas Jewell, Ming Li, Bryan Schlief, Antonio Xavier, Thomas W. Mountsier, Bart J. van Schravendijk, Easwar Srinivasan, Mandyam Sriram
  • Publication number: 20110320848
    Abstract: A system may include a database configured to store information including characteristics of a plurality of components. The system may further include a server in communication with the database and configured to receive design parameters indicative of a plurality of loads of a multiple-load device; determine a plurality of power supply architectures that may be used to provide power supply solutions satisfying the plurality of loads, each power supply architecture including at least one position requiring a component configured to satisfy a load requirement; for each one of at least a subset of the plurality of power supply architectures, determine, based on the characteristics of the plurality of components, at least one component configured to satisfy the corresponding load requirement for each position of the one of the power supply architectures; and generate at least one power supply design in accordance with the power supply architectures and the determined components.
    Type: Application
    Filed: June 27, 2011
    Publication date: December 29, 2011
    Inventors: Jeffrey R. Perry, Martin Garrison, Dien Mac, Howard Chen, Phil Gibson, Thomas Jewell
  • Publication number: 20110256726
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
    Type: Application
    Filed: April 11, 2011
    Publication date: October 20, 2011
    Inventors: Adrien LaVoie, Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh, Dennis M. Hausmann, Jon Henri, Thomas Jewell, Ming Li, Bryan Schlief, Antonio Xavier, Thomas W. Mountsier, Bart J. van Schravendijk, Easwar Srinivasan, Mandyam Sriram
  • Patent number: 4097820
    Abstract: A laser resonator is combined with a circuitous detonation channel to which is fed a suitable explosive gas mixture. The gas mixture is ignited, thereby creating travelling detonation waves which are maintained in circulation around the detonation channel. A population inversion is produced in the detonation product by exhausting the products via a convergent-divergent supersonic expansion nozzle. The products then pass through the laser resonator. At least one substantially linear portion is formed in a detonation channel circuit with the supersonic expansion nozzle being formed in this section of the detonation channel. The optical axis of the laser resonator is oriented to be substantially parallel to a slit nozzle which forms the supersonic expansion nozzle to thereby achieve a large ratio of active length to diameter of the laser resonator.
    Type: Grant
    Filed: January 21, 1977
    Date of Patent: June 27, 1978
    Assignee: Rolls-Royce Limited
    Inventors: Roland John Hill, Robert Bryn Price, Norman Thomas Jewell
  • Patent number: 4013976
    Abstract: In a high-power laser system it is proposed that combustion or compressor gases be diverted from the normal flow path through a gas turbine engine into an auxiliary flowpath, and that their composition be subsequently adjusted by burning at least one hydrocarbon fuel in them and possibly also by adding other fuels and substances. Suitable aerodynamic expansion of the resultant gases produces a population inversion in the CO.sub.2 species, which can be utilized in a laser.
    Type: Grant
    Filed: January 21, 1975
    Date of Patent: March 22, 1977
    Assignee: Rolls-Royce (1971) Limited
    Inventors: Roland John Hill, Norman Thomas Jewell