Patents by Inventor Thomas P. Russell

Thomas P. Russell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953953
    Abstract: An avionics unit assembly for an aircraft can include an avionics unit (e.g., an underwater locator device, “ULD”), and a battery to power the avionics unit. The avionics unit assembly can further include a housing that encases the avionics unit and the battery. The housing includes a vent port for exhausting an emission from the housing during a failure of the avionics unit. The avionics unit assembly can further include one or more of a suppressor that filters the emission, a shield element that is resistant to chemical and/or thermal effects of the emission, and a bracket for mounting the avionics unit to a surface. A method integrating the avionics unit assembly onto a forward aircraft bulkhead at a mount location under an aircraft radome and for manufacturing the avionics unit, and an aircraft including the avionics unit are also described.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: April 9, 2024
    Assignee: THE BOEING COMPANY
    Inventors: Ramon L. Cuenca, Shellini P. Dowell, Thomas A. Jessett, Fadl I. Khalil, Warren S. Ng, Scott B. Vacknitz, Collis M. Walker, Archibald A. Gray, James C. Russell, Charles O. Adler
  • Patent number: 11345786
    Abstract: A method for preparing a stabilized assembly includes combining a first liquid phase including nanoparticles and a second, immiscible liquid phase, dissolving in the second phase a first end-functionalized polymer having a first molecular weight, and a second end-functionalized polymer having a second molecular weight, wherein the second molecular weight is greater than the first molecular weight, applying a shearing external deformation field to increase the surface area of the first phase to create a new interface, wherein the nanoparticle surfactants form a disordered, jammed assembly at the new interface, and releasing the shearing external deformation field. The polymer and the nanoparticles can interact at an interface through ligand interactions to form nanoparticle surfactants and upon releasing the external deformation field the jammed assembly at the new interface traps the first phase in a deformed state having the first liquid phase and the second liquid phase as interpenetrating domains.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: May 31, 2022
    Assignees: THE UNIVERSITY OF MASSACHUSETTS, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Caili Huang, Joseph William Forth, Brett Anthony Helms, Thomas P. Russell
  • Patent number: 10793649
    Abstract: A method of forming a microphase separated block copolymer includes exposing a block copolymer to acid vapor under conditions effective to provide the microphase separated block copolymer. The block copolymer includes a first hydrophobic block and a second hydrophobic block that is acid-sensitive. The microphase separated block copolymer includes the first hydrophobic block and a hydrophilic block derived from the second hydrophobic block. Exposing the block copolymer to the acid vapor is conducted in the solid state.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: October 6, 2020
    Assignees: THE UNIVERSITY OF MASSACHUSETTS, THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK
    Inventors: Thomas P. Russell, Duk Man Yu, Javid Rzayev, Jose Kenneth D. Mapas
  • Publication number: 20200024375
    Abstract: A method of forming a microphase separated block copolymer includes exposing a block copolymer to acid vapor under conditions effective to provide the microphase separated block copolymer. The block copolymer includes a first hydrophobic block and a second hydrophobic block that is acid-sensitive. The microphase separated block copolymer includes the first hydrophobic block and a hydrophilic block derived from the second hydrophobic block. Exposing the block copolymer to the acid vapor is conducted in the solid state.
    Type: Application
    Filed: November 2, 2018
    Publication date: January 23, 2020
    Inventors: Thomas P. Russell, Duk Man Yu, Javid Rzayev, Jose Kenneth D. Mapas
  • Publication number: 20190375898
    Abstract: A method for preparing a stabilized assembly includes combining a first liquid phase including nanoparticles and a second, immiscible liquid phase, dissolving in the second phase a first end-functionalized polymer having a first molecular weight, and a second end-functionalized polymer having a second molecular weight, wherein the second molecular weight is greater than the first molecular weight, applying a shearing external deformation field to increase the surface area of the first phase to create a new interface, wherein the nanoparticle surfactants form a disordered, jammed assembly at the new interface, and releasing the shearing external deformation field. The polymer and the nanoparticles can interact at an interface through ligand interactions to form nanoparticle surfactants and upon releasing the external deformation field the jammed assembly at the new interface traps the first phase in a deformed state having the first liquid phase and the second liquid phase as interpenetrating domains.
    Type: Application
    Filed: May 31, 2019
    Publication date: December 12, 2019
    Inventors: Caili Huang, Joseph William Forth, Brett Anthony Helms, Thomas P. Russell
  • Patent number: 10147553
    Abstract: The invention provides novel hydrophilic conjugated polymers, e.g., hydrophilic poly(arylene vinylenes) or PAVs, and preparation thereof, and methods and devices for their application in photovoltaics, and the resulting improved solar cells.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: December 4, 2018
    Assignee: University of Massachusetts
    Inventors: Todd Emrick, Zachariah A. Page, Yao Liu, Thomas P. Russell
  • Patent number: 10056554
    Abstract: The invention provides novel materials, methods and designs to enable improved power conversion efficiencies of organic photovoltaics (OPVs). In particular, the invention provides novel materials and interlayers for polymer-based solar cells. Novel functional fullerene-based interlayers are disclosed that enable high efficiency devices in conjunction with numerous active layer and electrode materials.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: August 21, 2018
    Assignee: University of Massachusetts
    Inventors: Zachariah Page, Yao Liu, Thomas P. Russell, Todd Emrick
  • Patent number: 9878296
    Abstract: A stabilized assembly including a first liquid phase of non-spherical droplets in a second liquid phase, wherein the second liquid phase is immiscible with the first phase, and nanoparticle surfactants assembled at an interface of the non-spherical droplets and the second phase is disclosed. The nanoparticle surfactants include nanoparticles and end-functionalized polymers that can interact through ligand type interactions, and the first phase is stabilized by a disordered, jammed layer of nanoparticle surfactants. A method of preparing a stabilized assembly is also disclosed.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: January 30, 2018
    Assignee: THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Thomas P. Russell, Mengmeng Cui, Todd Emrick
  • Publication number: 20170263385
    Abstract: The invention provides novel hydrophilic conjugated polymers, e.g., hydrophilic poly(arylene vinylenes) or PAVs, and preparation thereof, and methods and devices for their application in photovoltaics, and the resulting improved solar cells.
    Type: Application
    Filed: March 13, 2017
    Publication date: September 14, 2017
    Inventors: Todd Emrick, Zachariah A. Page, Yao Liu, Thomas P. Russell
  • Patent number: 9718094
    Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: August 1, 2017
    Assignees: UNIST ACADEMY-INDUSTRY, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Thomas P. Russell, Sung Woo Hong, Dong Hyun Lee, Soojin Park, Ting Xu
  • Publication number: 20170133163
    Abstract: Perovskite-containing solar cells are described herein. An inverted perovskite solar includes an anode substrate, a photoactive layer including a perovskite, a hole transport layer disposed between the anode substrate and the photoactive layer, an electron transport layer, a metal cathode layer, and an interlayer disposed between the electron transport layer and the metal cathode layer. A tandem solar cell includes a first sub-cell, a second sub-cell, and an interconnecting layer disposed between the first sub-cell and the second sub-cell. The first sub cell includes a perovskite layer having a thickness of 50 to 200 nanometers. The second sub-cell includes a photoactive layer and an interlayer disposed on the photoactive layer. The interlayers and the interconnecting layer each include a fullerpyrrolidine having a structure as defined herein.
    Type: Application
    Filed: October 27, 2016
    Publication date: May 11, 2017
    Inventors: Thomas P. Russell, Todd Emrick, Yao Liu, Zachariah A. Page
  • Patent number: 9636887
    Abstract: Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 2, 2017
    Assignee: THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Thomas P. Russell, Soojin Park, Jia-Yu Wang, Bokyung Kim
  • Publication number: 20170047520
    Abstract: The invention provides novel materials, methods and designs to enable improved power conversion efficiencies of organic photovoltaics (OPVs). In particular, the invention provides novel materials and interlayers for polymer-based solar cells. Novel functional fullerene-based interlayers are disclosed that enable high efficiency devices in conjunction with numerous active layer and electrode materials.
    Type: Application
    Filed: May 6, 2015
    Publication date: February 16, 2017
    Applicant: University of Massachusetts
    Inventors: Zachariah Page, Yao Liu, Thomas P. Russell, Todd Emrick
  • Publication number: 20160359096
    Abstract: The invention provides for a nanostructured silicon or holey silicon (HS) that has useful thermoelectric properties. The invention also provides for a device comprising the nanostructured silicon or HS. The HS can be placed between two electrodes and used for thermoelectric power generation or thermoelectric cooling.
    Type: Application
    Filed: June 7, 2016
    Publication date: December 8, 2016
    Inventors: Peidong Yang, Jinyao Tang, Hung-Ta Wang, Thomas P. Russell, Dong-Hyun Lee
  • Publication number: 20160236439
    Abstract: Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces.
    Type: Application
    Filed: April 26, 2016
    Publication date: August 18, 2016
    Inventors: Thomas P. Russell, Soojin Park, Jia-Yu Wang, Bokyung Kim
  • Patent number: 9382387
    Abstract: The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: July 5, 2016
    Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Yan Xia, Benjamin R Sveinbjornsson, Robert H Grubbs, Raymond Weitekamp, Garret M Miyake, Harry A Atwater, Victoria Piunova, Christopher Scot Daeffler, Sung Woo Hong, Weiyin Gu, Thomas P. Russell
  • Patent number: 9358750
    Abstract: Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces.
    Type: Grant
    Filed: July 17, 2013
    Date of Patent: June 7, 2016
    Assignee: THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Thomas P. Russell, Soojin Park, Jia-Yu Wang, Bokyung Kim
  • Patent number: 9335629
    Abstract: Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
    Type: Grant
    Filed: July 11, 2012
    Date of Patent: May 10, 2016
    Assignees: THE UNIVERSITY OF MASSACHUSETTS, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Thomas P. Russell, Soojin Park, Dong Hyun Lee, Ting Xu
  • Publication number: 20150375262
    Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
    Type: Application
    Filed: September 4, 2015
    Publication date: December 31, 2015
    Applicants: THE UNIVERSITY OF MASSACHUSETTS, UNIST ACADEMY-INDUSTRY RESEARCH CORPORATION, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Thomas P. Russell, Sung Woo Hong, Dong Hyun Lee, Soojin Park, Ting Xu
  • Patent number: 9156682
    Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: October 13, 2015
    Assignees: THE UNIVERSITY OF MASSACHUSETTS, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, UNIST ACADEMY-INDUSTRY RESEARCH CORPORATION
    Inventors: Thomas P. Russell, Sung Woo Hong, Doug Hyun Lee, Soojin Park, Ting Xu