Abstract: The invention concerns an application device for electrosurgical cutting and coagulation of body tissue, wherein the instrument is in the form of a gripping instrument having two gripping arms which are movable relative to each other and which each have at their distal end at least two respective electrodes, namely at least one coagulation electrode and at least one cutting electrode.

Abstract: A vehicle framing system for framing an automotive vehicle body from a plurality of separate body components wherein the body components each include a reference surface. The system includes an assembly station having spaced-apart frame members positioned so that, when a vehicle carrier supporting the vehicle body components is positioned at the assembly station, the frame members extend along opposite sides of the vehicle carrier. At least two docking stations are secured to each frame member at predetermined locations. A robot mounts its associated tool arm with a docking station. At least one set of reference block and framing clamp is secured to each tool arm and these framing clamps maintain the reference surfaces of the vehicle body components against the reference blocks to hold the vehicle components at a predetermined position relative to each other.

Abstract: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.

Abstract: Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes (29) are adapted to the form of the component (30) to be cleaned. The residual gas atmosphere is measured spectroscopically on the basis of the plasma. An emission spectrum is preferably recorded in order to monitor the degree of cleaning. An optical fiber cable (31) with a coupling-in optical unit (32) is advantageously used for this purpose. Moreover, in order to monitor the contamination in the gas phase within the vacuum chambers during the operation of an EUV lithography device, it is proposed to provide modules configured to initiate a gas discharge and to detect radiation emitted on account of the gas discharge. The contamination in the gas phase can be deduced from the analysis of the measured spectrum.

Abstract: A filter bag arrangement for a vacuum cleaner includes a bag body of filter material, and a stiffening element in the form of a filter mounting plate with an inlet opening of the bag therein. The vacuum cleaner includes a housing defining a chamber into which the bag may be inserted, a lid to cover the chamber, and a filling pipe stub that is insertable into the inlet opening. Plural individual mounting elements are provided at the outer edge of the stiffening element and are inserted into corresponding individual receivers of the housing so as to spatially position and fix the inlet opening of the filter bag arrangement relative to the housing of the vacuum cleaner.

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract: A vehicle framing system for framing an automotive vehicle body from a plurality of separate body components wherein the body components each include a reference surface. The system includes an assembly station having spaced-apart frame members positioned so that, when a vehicle carrier supporting the vehicle body components is positioned at the assembly station, the frame members extend along opposite sides of the vehicle carrier. At least two docking stations are secured to each frame member at predetermined locations. A robot mounts its associated tool arm with a docking station. At least one set of reference block and framing clamp is secured to each tool arm and these framing clamps maintain the reference surfaces of the vehicle body components against the reference blocks to hold the vehicle components at a predetermined position relative to each other.

Abstract: An optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract: The invention concerns a high frequency current application apparatus for the thermal sclerosing of body tissue, comprising a high frequency generator to which there are connected at least two electrodes of which at least one electrode is to be introduced into body tissue, and a measuring and calculating device which is adapted to ascertain the impedance or the ohmic resistance between the two electrodes between which a respective therapeutic high frequency current flows, and a control device connected to the measuring and calculating device for varying the output power. During a high frequency current application the measuring and calculating device forms the first derivative from the characteristic in respect of time of the impedance or ohmic resistance.

Abstract: The invention concerns a flexible application device (1) for the high-frequency therapy of biological tissue or hollow organs, including a tubular high-frequency catheter (5) with a flexible shaft tube (6) having at least one lumen passing therethrough, a head electrode (2) arranged at the distal end of the high-frequency catheter (5), an electric line (9) with a connection (20) for a high-frequency generator (11), and a connecting element (8) arranged at the proximal end of the shaft tube (6) between the shaft tube and the line (9).

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract: An arrangement with a worktop and a cooktop with a cooking surface, a mounting frame and a decorative frame, which is arranged in a recess in the worktop, with the distance elements, embodied for relative positioning of the cooktop in relation to the recess and on which the cooktop rests, being arranged between the cooktop and the worktop.

Abstract: A connection arrangement between a vacuum cleaner and a suction tool includes a pivot element pivotably connected to the suction tool and a rotation element rotatably coupled to the pivot element. A suction wand, hose, handle or other vacuum port of the vacuum cleaner is removably connected to a connection end of the rotation element. Coupling ends of the pivot and rotation elements are inserted one in the other, and respectively have circumferential grooves that form a circumferential channel therebetween. Plural partial ring segment elements are received in the circumferential channel to form a connection ring that rotatably secures the pivot and rotation elements. The ring segment elements are inserted into or removed from the channel through a selectively coverable opening in the rotation element or the pivot element. A catch cooperates with a detent to hold a vertically pivoted, rotationally centered rest position of the components.

Abstract: An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.

Abstract: The invention concerns a bipolar coagulation probe (10) having an electrode tip (14) which has an end face (16) in which a pole (17) of a first electrode (18) and a pole (19) of a second electrode (20) are integrated. In accordance with the invention the bipolar coagulation probe (10) includes a temperature control unit (26) with a temperature control medium for temperature control of the end face (16).

Abstract: An exhaust filter unit is arranged outwardly surrounding at least a major portion of a housing of a vacuum cleaner. The dirt-laden incoming airflow is filtered through a primary filter, then blown by a suction motor unit into an annular exhaust air space between the vacuum cleaner housing and the exhaust filter unit. Thereby, the filtered air is exhausted in a diffused manner through the large surface area of the exhaust filter unit. Preferably, the exhaust filter unit has a cylindrical tubular configuration that completely externally surrounds a cylindrical portion of the vacuum cleaner housing.

Abstract: A brush roller accessory for a vacuum cleaner includes a main support roller and a power-driven brush roller rotatably arranged in a housing, and a spring-biased adjusting roller that adjustably protrudes from the housing to bear some of the total contact force of the accessory against a floor, to reduce or relieve the contact force exerted by the brush roller against the floor. The adjusting roller is rotatably mounted on a pivot lever, having a first end pivotally connected to the housing and a second end connected to a spring that biases the lever to pivot the adjusting roller outwardly from the housing. A rotary knob with several stop surfaces selects an upper limit on the pivot range of the lever and the adjustment height of the adjusting roller. A coupling link pivots the adjusting roller to a maximally protruding position to lift the brush roller into a parking position.