Patents by Inventor Tian Huang

Tian Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12292387
    Abstract: A method for inspecting a transparent workpiece comprises: directing light from an illumination source onto a plurality of defects formed in the transparent workpiece, wherein the plurality of defects extends in a defect direction, wherein the transparent workpiece comprises a first surface and a second surface; detecting a scattering image signal from light scattered by the plurality of defects using an imaging system, wherein an imaging axis of the imaging system extends at a non-zero imaging angle relative to the defect direction, wherein entireties of at least a subset of the plurality of defects are within a depth of field of the imaging system; and generating a three-dimensional image of at least one of the plurality of defects based on the scattering signal.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: May 6, 2025
    Assignee: Corning Incorporated
    Inventors: Chong Pyung An, En Hong, Tian Huang, Yuhui Jin, Philip Robert LeBlanc, Garrett Andrew Piech
  • Patent number: 12180108
    Abstract: Methods of forming vias in a glass-based article by laser-damage-and-etch processes including etching solutions having positive charge organic molecules are disclosed. In some embodiments, a method of forming a via in a glass-based article includes forming a damage track through a bulk of the glass-based article extending from a first surface of the glass-based article to a second surface of the glass-based article, and applying an etching solution to the glass-based article to form the via. The etching solution includes at least one acid and a positive charge organic molecule. An etch rate at the first surface and the second surface is lower than an etch rate at the damage track.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: December 31, 2024
    Assignee: Corning Incorporated
    Inventors: Hongmei Hu, Tian Huang, Yuhui Jin
  • Publication number: 20240359316
    Abstract: Disclosed is a three-degree-of-freedom parallel mechanism, a parallel robot and a machine tool. The parallel mechanism includes a fixed frame and a moving platform, and the fixed frame includes a fixed seat and a cylindrical body fixedly connected to the fixed seat; three identical limbs are uniformly distributed in the cylindrical body in a circumferential direction, and each limb includes a prismatic joint A, a hinge A, a swing arm, a hinge B and a hinge C which are sequentially connected; an axis of the hinge A is perpendicular to an axis of movement of the prismatic joint A; an axis of the hinge B is perpendicular to, but does not intersect with the axis of the hinge A, which rotates around the axis of the hinge A; the hinge C has two rotational degrees of freedom.
    Type: Application
    Filed: July 1, 2024
    Publication date: October 31, 2024
    Inventors: Haitao LIU, Xianlei SHAN, Hongye WU, Jiale HAN, Juliang XIAO, Tian HUANG
  • Patent number: 11972993
    Abstract: Silica-containing substrates including vias with a narrow waist, electronic devices incorporating a silica-containing substrate, and methods of forming vias with narrow waist in silica-containing substrates are disclosed. In one embodiment, an article includes a silica-containing substrate including greater than or equal to 85 mol % silica, a first surface, a second surface opposite the first surface, and a via extending through the silica-containing substrate from the first surface toward the second surface. The via includes a first diameter at the first surface wherein the first diameter is less than or equal to 100 ?m, a second diameter at the second surface wherein the first diameter is less than or equal to 100 ?m, and a via waist between the first surface and the second surface. The via waist has a waist diameter that is less than the first diameter and the second diameter such that a ratio between the waist diameter and each of the first diameter and the second diameter is less than or equal to 75%.
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: April 30, 2024
    Assignee: Corning Incorporated
    Inventors: Rachel Eileen Dahlberg, Tian Huang, Yuhui Jin, Garrett Andrew Piech, Daniel Ohen Ricketts
  • Patent number: 11952310
    Abstract: Disclosed herein are glass compositions that present several advantages over glasses and other materials currently used for redistribution layers for RF, interposers, and similar applications. The glasses disclosed herein are low cost, flat glasses that have high throughput for the laser damage and etching process used to create through glass vias (TGV). TGV generated using the silicate glasses and processes described herein have large waist diameters (Dw), which is a desirable feature with respect to producing glass articles such as interposers.
    Type: Grant
    Filed: April 30, 2020
    Date of Patent: April 9, 2024
    Assignee: Corning Incorporated
    Inventors: Ling Cai, Tian Huang, Yuhui Jin, Jingshi Wu
  • Publication number: 20230221261
    Abstract: A method for inspecting a transparent workpiece comprises: directing light from an illumination source onto a plurality of defects formed in the transparent workpiece, wherein the plurality of defects extends in a defect direction, wherein the transparent workpiece comprises a first surface and a second surface; detecting a scattering image signal from light scattered by the plurality of defects using an imaging system, wherein an imaging axis of the imaging system extends at a non-zero imaging angle relative to the defect direction, wherein entireties of at least a subset of the plurality of defects are within a depth of field of the imaging system; and generating a three-dimensional image of at least one of the plurality of defects based on the scattering signal.
    Type: Application
    Filed: May 25, 2021
    Publication date: July 13, 2023
    Inventors: Chong Pyung An, En Hong, Tian Huang, Yuhui Jin, Philip Robert LeBlanc, Garrett Andrew Piech
  • Patent number: 11582541
    Abstract: An elevating speaker device for use in bathtub includes: a main body having an accommodation space formed therein and having at least one water hole and a penetrating hole; and an elevating speaker member, having a lower portion thereof disposed with an inner fastening member having a base and an inner sliding member, the inner fastening member respectively has a damping teeth and a spring, the inner sliding member has a long teeth connected to the damping teeth; the elevating speaker member has an inclined plate downwardly inclined from one end towards another end, and has two ends respectively downwardly extended with a water discharging channel and a fastening channel, at least one plastic sleeve is disposed in the fastening channel and sleeved with a tubular member allowing a power wire and a signal wire to be enclosed.
    Type: Grant
    Filed: December 12, 2021
    Date of Patent: February 14, 2023
    Assignee: TROLLING ENTERPRISES CO. LTD.
    Inventors: Huei-Ching Chou Lu, Tzeng-Tian Huang, Ta-Tsung Dan
  • Publication number: 20220078920
    Abstract: A substrate comprising: (i) a first series of blind vias into a thickness of a substrate and open to a first primary surface; and (ii) a second series of blind vias into the thickness of a substrate and open to a second primary surface. Each blind via includes an interior wall. The interior wall includes a first tapered region and a second tapered region. The first tapered region and the second tapered region have a distinct slope. Each of the blind vias of the second series of blind vias is coaxial with a different blind via of the first series of blind vias. Each blind via of the first series of blind vias has a depth that deviates from a mean depth by less than +/?10%. Each blind via of the second series of blind vias has a depth that deviates from a mean depth by less than +/?10%.
    Type: Application
    Filed: September 7, 2021
    Publication date: March 10, 2022
    Inventors: Tian Huang, Yuhui Jin, Ekaterina Aleksandrovna Kuksenkova, Heather Nicole Vanselous
  • Patent number: 11152294
    Abstract: An article includes a glass or glass-ceramic substrate having a first major surface and a second major surface opposite the first major surface, and at least one via extending through the substrate from the first major surface to the second major surface over an axial length in an axial dimension. The article also includes a metal connector disposed within the via that hermetically seals the via. The article has a helium hermeticity of less than or equal to 1.0×10?8 atm-cc/s after 1000 thermal shock cycles, each of the thermal shock cycle comprises cooling the article to a temperature of ?40° C. and heating the article to a temperature of 125° C., and the article has a helium hermeticity of less than or equal to 1.0×10?8 atm-cc/s after 100 hours of HAST at a temperature of 130° C. and a relative humidity of 85%.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: October 19, 2021
    Assignee: Corning Incorporated
    Inventors: Tian Huang, Mandakini Kanungo, Ekaterina Aleksandrovna Kuksenkova, Prantik Mazumder, Chad Byron Moore, Chukwudi Azubuike Okoro, Ah-Young Park, Scott Christopher Pollard, Rajesh Vaddi
  • Publication number: 20210269357
    Abstract: Silica-containing substrates including vias with a narrow waist, electronic devices incorporating a silica-containing substrate, and methods of forming vias with narrow waist in silica-containing substrates are disclosed. In one embodiment, an article includes a silica-containing substrate including greater than or equal to 85 mol % silica, a first surface, a second surface opposite the first surface, and a via extending through the silica-containing substrate from the first surface toward the second surface. The via includes a first diameter at the first surface wherein the first diameter is less than or equal to 100 ?m, a second diameter at the second surface wherein the first diameter is less than or equal to 100 ?m, and a via waist between the first surface and the second surface. The via waist has a waist diameter that is less than the first diameter and the second diameter such that a ratio between the waist diameter and each of the first diameter and the second diameter is less than or equal to 75%.
    Type: Application
    Filed: May 14, 2021
    Publication date: September 2, 2021
    Inventors: Rachel Eileen Dahlberg, Tian Huang, Yuhui Jin, Garrett Andrew Piech, Daniel Ohen Ricketts
  • Patent number: 11078112
    Abstract: Silica-containing substrates including vias with a narrow waist, electronic devices incorporating a silica-containing substrate, and methods of forming vias with narrow waist in silica-containing substrates are disclosed. In one embodiment, an article includes a silica-containing substrate including greater than or equal to 85 mol % silica, a first surface, a second surface opposite the first surface, and a via extending through the silica-containing substrate from the first surface toward the second surface. The via includes a first diameter at the first surface wherein the first diameter is less than or equal to 100 ?m, a second diameter at the second surface wherein the first diameter is less than or equal to 100 ?m, and a via waist between the first surface and the second surface. The via waist has a waist diameter that is less than the first diameter and the second diameter such that a ratio between the waist diameter and each of the first diameter and the second diameter is less than or equal to 75%.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: August 3, 2021
    Assignee: CORNING INCORPORATED
    Inventors: Rachel Eileen Dahlberg, Tian Huang, Yuhui Jin, Garrett Andrew Piech, Daniel Ohen Ricketts
  • Patent number: 11062986
    Abstract: Articles and semiconductor packages that incorporate glass-based substrates are disclosed, as well as methods of forming thereof. An article includes a glass-based substrate comprising first and second major surfaces spaced a distance from and parallel to each other, and a tapered via extending through the substrate. The tapered via includes a cross section that is symmetrical about a plane that is between and equidistant to the first and second major surfaces of the glass-based substrate and an interior wall with a first tapered region and a second tapered region positioned between the first major surface and the plane. The respective slopes of the first and second tapered regions are constant and the slope of the first tapered region is not equal to the slope of the second tapered region.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: July 13, 2021
    Assignee: Corning Incorporated
    Inventors: Tian Huang, Yuhui Jin, Matthew Evan Wilhelm
  • Patent number: 10879182
    Abstract: Various embodiments are related to substrates having one or more well structures with a trapezoidal cylinder shaped through hole via extending from the bottom of the well structure though the substrate.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: December 29, 2020
    Assignee: Corning Incorporated
    Inventors: Sean Matthew Garner, Tian Huang, Tammy Lynn Petriwsky
  • Publication number: 20200354262
    Abstract: Disclosed herein are glass compositions with high silica content that present several advantages over glasses and other materials currently used for redistribution layers for RF, interposers, and similar applications. The glasses disclosed herein are low cost, flat glasses that have high throughput for the laser damage and etching process used to create through glass vias (TGVs). TGVs generated using the silicate glasses and processes described herein have large waist diameters, which is a desirable feature with respect to producing glass articles such as interposers.
    Type: Application
    Filed: April 30, 2020
    Publication date: November 12, 2020
    Inventors: Xiaoju Guo, Tian Huang, Yuhui Jin, Tammy Lynn Petriwsky, Liying Zhang
  • Publication number: 20200354267
    Abstract: Disclosed herein are glass compositions that present several advantages over glasses and other materials currently used for redistribution layers for RF, interposers, and similar applications. The glasses disclosed herein are low cost, flat glasses that have high throughput for the laser damage and etching process used to create through glass vias (TGV). TGV generated using the silicate glasses and processes described herein have large waist diameters (Dw), which is a desirable feature with respect to producing glass articles such as interposers.
    Type: Application
    Filed: April 30, 2020
    Publication date: November 12, 2020
    Inventors: Ling Cai, Tian Huang, Yuhui Jin, Jingshi Wu
  • Publication number: 20200161232
    Abstract: Articles and semiconductor packages that incorporate glass-based substrates are disclosed, as well as methods of forming thereof. An article includes a glass-based substrate comprising first and second major surfaces spaced a distance from and parallel to each other, and a tapered via extending through the substrate. The tapered via includes a cross section that is symmetrical about a plane that is between and equidistant to the first and second major surfaces of the glass-based substrate and an interior wall with a first tapered region and a second tapered region positioned between the first major surface and the plane. The respective slopes of the first and second tapered regions are constant and the slope of the first tapered region is not equal to the slope of the second tapered region.
    Type: Application
    Filed: January 22, 2020
    Publication date: May 21, 2020
    Inventors: Tian Huang, Yuhui Jin, Matthew Evan Wilhelm
  • Publication number: 20200118931
    Abstract: Various embodiments are related to substrates having one or more well structures with a trapezoidal cylinder shaped through hole via extending from the bottom of the well structure though the substrate.
    Type: Application
    Filed: May 31, 2018
    Publication date: April 16, 2020
    Inventors: Sean Matthew Garner, Tian Huang, Tammy Lynn Petriwsky
  • Patent number: 10580725
    Abstract: Articles and semiconductor packages that incorporate glass-based substrates are disclosed, as well as methods of forming thereof. An article includes a glass-based substrate comprising first and second major surfaces spaced a distance from and parallel to each other, and a tapered via extending through the substrate. The tapered via includes a cross section that is symmetrical about a plane that is between and equidistant to the first and second major surfaces of the glass-based substrate and an interior wall with a first tapered region and a second tapered region positioned between the first major surface and the plane. The respective slopes of the first and second tapered regions are constant and the slope of the first tapered region is not equal to the slope of the second tapered region.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: March 3, 2020
    Assignee: Corning Incorporated
    Inventors: Tian Huang, Yuhui Jin, Matthew Evan Wilhelm
  • Patent number: 10495055
    Abstract: A low-energy and high pressure, hydraulic, pneumatic engine contains: a casing device, two main-cylinder devices, a holder device, two main-crankshaft devices, two recycle-valve devices, two swing-arm devices, two movable-valve devices, two recycle-cylinder devices, two recycle-crankshaft devices, and two umbrella-shaped gear devices. The engine operates without using gasoline or diesel, thus avoiding discharge of harmful substance or gas and pollution. The high pressure gas forces the hydraulic oil without using gasoline or diesel so as to start the engine, and the hydraulic oil recycles and reuses repeatedly, thus obtaining environmental protection. And the high pressure gas forces the hydraulic oil so as to circulate the hydraulic oil, and the communication of the low-energy and high pressure and the low pressure matches with the circulation space of the fluid operation to produce the torque, hence four strokes cycle of intake, compression, combustion and exhaust are not required.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: December 3, 2019
    Inventor: Jin-Tian Huang
  • Patent number: D1030704
    Type: Grant
    Filed: December 11, 2021
    Date of Patent: June 11, 2024
    Assignee: TROLLING ENTERPRISES CO., LTD.
    Inventors: Huei-Ching Chou Lu, Tzeng-Tian Huang, Ta-Tsung Dan